Patent US2524660A successfully refreshed from Google Patents.
Patent US4648206A successfully refreshed from Google Patents.
Patent US7193893B2 successfully refreshed from Google Patents.
← Back to Patent Explorer
US7193893B2 Expired / Lapsed US ⏱️ 0.0 years remaining

Write once read only memory employing floating gates

Assignee: Micron Technology Inc
•
Filing: 2002-06-21
•
Granted: 2007-03-20
•
Expires: 2022-06-21
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic random access memory (DRAM) fabrication process. The floating gate transistor has a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric. A plug couples the first source/drain region to an array plate. A bitline is coupled to the second source/drain region. The floating gate transistor can be programmed by trapping charge on the floating gate.

Inventors

  • 👤 Leonard Forbes

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 08:42
CPC Classifications
G; G11; G11C; G11C16/00; G11C16/02; G11C16/04; G11C16/0408; G11C16/0441; G11C16/06; G11C16/26; G11C16/28

Claims Analysis

Total Claims: 28
Claim 1
Independent Claim 123 words
A write once read only memory cell, comprising: a floating gate transistor, the floating gate transistor having a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a plug coupled to the first source/drain region, wherein the plug couples the first source/drain region to an array plate; a transmission line coupled to the second source/drain region; and wherein the floating gate transistor is a programmed floating gate transistor having a charge trapped in the floating gate such that the programmed floating gate transistor operates at reduced drain source current.
Claim 2
Dependent Claim 123 words
A write once read only memory cell, comprising: a floating gate transistor, the floating gate transistor having a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a plug coupled to the first source/drain region, wherein the plug couples the first source/drain region to an array plate; a transmission line coupled to the second source/drain region; and wherein the floating gate transistor is a programmed floating gate transistor having a charge trapped in the floating gate such that the programmed floating gate transistor operates at reduced drain source current.
Claim 3
Dependent Claim 39 words
The write once read only memory cell of claim 1 , wherein the first source/drain region of the floating gate transistor includes a source region and the second source/drain region of the floating gate transistor includes a drain region.
Claim 4
Dependent Claim 19 words
The write once read only memory cell of claim 1 , wherein the transmission line includes a bit line.
Claim 5
Dependent Claim 24 words
The write once read only memory cell of claim 1 , wherein the charge trapped in the floating gate includes a trapped electron charge.
Claim 6
Dependent Claim 32 words
The write once read only memory cell of claim 1 , wherein the write once read only memory (WOROM) cell is formed in a modified dynamic random access memory (DRAM) fabrication process.
Claim 7
Dependent Claim 24 words
The write once read only memory cell of claim 1 , wherein the gate insulator has a thickness of at least 10 nanometers (nm).
Claim 8
Dependent Claim 112 words
A write once read only memory cell, comprising: a floating gate transistor formed according to a modified DRAM fabrication process, the floating gate transistor having a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a wordline coupled to the control gate; an array plate coupled to the source region; a bit line coupled to the drain region; and wherein the floating gate transistor is a programmed floating gate transistor having a charge trapped in the floating gate.
Claim 9
Dependent Claim 112 words
A write once read only memory cell, comprising: a floating gate transistor formed according to a modified DRAM fabrication process, the floating gate transistor having a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a wordline coupled to the control gate; an array plate coupled to the source region; a bit line coupled to the drain region; and wherein the floating gate transistor is a programmed floating gate transistor having a charge trapped in the floating gate.
Claim 10
Dependent Claim 24 words
The write once read only memory cell of claim 7 , wherein the gate insulator has a thickness of at least 10 nanometers (nm).
Claim 11
Dependent Claim 192 words
A memory array, comprising: a number of write once read only floating gate memory cells, wherein each write once read only floating gate memory cell includes a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a number of bit lines coupled to the second source/drain region of each write once read only floating gate memory cell along rows of the memory array; a number of word lines coupled to the control gate of each write once read only floating gate memory cell along columns of the memory array; an array plate, wherein the first source/drain region of each write once read only floating gate memory cell is coupled to the array plate by a conductive plug; and wherein at least one of write once read only floating gate memory cells is a programmed floating gate transistor having a charge trapped in the floating gate such that the programmed floating gate transistor operates at reduced drain source current.
Claim 12
Dependent Claim 192 words
A memory array, comprising: a number of write once read only floating gate memory cells, wherein each write once read only floating gate memory cell includes a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a number of bit lines coupled to the second source/drain region of each write once read only floating gate memory cell along rows of the memory array; a number of word lines coupled to the control gate of each write once read only floating gate memory cell along columns of the memory array; an array plate, wherein the first source/drain region of each write once read only floating gate memory cell is coupled to the array plate by a conductive plug; and wherein at least one of write once read only floating gate memory cells is a programmed floating gate transistor having a charge trapped in the floating gate such that the programmed floating gate transistor operates at reduced drain source current.
Claim 13
Dependent Claim 22 words
The memory array of claim 9 , wherein the charge trapped in the floating gate includes a charge of approximately 100 electrons.
Claim 14
Dependent Claim 35 words
The memory array of claim 9 , wherein the first source/drain region of the floating gate cell includes a source region and the second source/drain region of the floating gate cell includes a drain region.
Claim 15
Dependent Claim 30 words
The memory array of claim 9 , wherein the number of write once read only memory (WOROM) cell are formed in a modified dynamic random access memory (DRAM) fabrication process.
Claim 16
Dependent Claim 30 words
The memory array of claim 9 , wherein the gate insulator of each write once read only floating gate memory cell has a thickness of at least 10 nanometers (nm).
Claim 17
Dependent Claim 219 words
A memory device, comprising: a memory array, wherein the memory array includes a number of write once read only floating gate memory cells, wherein each write once read only floating gate memory cell includes a source region, a drain region, a channel region between the source and the drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a number of bitlines coupled to the drain region of each write once read only floating gate memory cell along rows of the memory array; a number of wordlines coupled to the control gate of each write once read only floating gate memory cell along columns of the memory array; an array plate, wherein the source region of each write once read only floating gate memory cell is coupled to the array plate by a conductive plug; a wordline address decoder coupled to the number of wordlines; a bitline address decoder coupled to the number of bitlines; a sense amplifier coupled to the number of bitlines; and wherein at least one of write once read only floating gate memory cells is a programmed flash cell having a charge trapped in the floating gate such that the programmed flash cell operates at reduced drain/source current.
Claim 18
Dependent Claim 219 words
A memory device, comprising: a memory array, wherein the memory array includes a number of write once read only floating gate memory cells, wherein each write once read only floating gate memory cell includes a source region, a drain region, a channel region between the source and the drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a number of bitlines coupled to the drain region of each write once read only floating gate memory cell along rows of the memory array; a number of wordlines coupled to the control gate of each write once read only floating gate memory cell along columns of the memory array; an array plate, wherein the source region of each write once read only floating gate memory cell is coupled to the array plate by a conductive plug; a wordline address decoder coupled to the number of wordlines; a bitline address decoder coupled to the number of bitlines; a sense amplifier coupled to the number of bitlines; and wherein at least one of write once read only floating gate memory cells is a programmed flash cell having a charge trapped in the floating gate such that the programmed flash cell operates at reduced drain/source current.
Claim 19
Dependent Claim 22 words
The memory device of claim 14 , wherein the charge trapped in the floating gate includes a charge of approximately 100 electrons.
Claim 20
Dependent Claim 30 words
The memory device of claim 14 , wherein the number of write once read only memory (WOROM) cell is formed in a modified dynamic random access memory (DRAM) fabrication process.
Claim 21
Dependent Claim 30 words
The memory device of claim 14 , wherein the gate insulator of each write once read only floating gate memory cell has a thickness of at least 10 nanometers (nm).
Claim 22
Dependent Claim 33 words
The memory device of claim 14 , wherein the wordline address decoder and the bitline address decoder each include conventionally fabricated transistors having thin gate insulators formed of silicon dioxide (SiO 2 ).
Claim 23
Dependent Claim 26 words
The memory device of claim 14 , wherein the sense amplifier includes conventionally fabricated transistors having thin gate insulators formed of silicon dioxide (SiO 2 ).
Claim 24
Dependent Claim 234 words
An electronic system, comprising: a processor; and a memory device coupled to the processor, wherein the memory device includes; a memory array, wherein the memory array includes a number of write once read only floating gate memory cells, wherein each write once read only floating gate memory cell includes a source region, a drain region, a channel region between the source and the drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a number of bitlines coupled to the drain region of each write once read only floating gate memory cell along rows of the memory array; a number of wordlines coupled to the control gate of each write once read only floating gate memory cell along columns of the memory array; an array plate, wherein the source region of each write once read only floating gate memory cell is coupled to the array plate by a conductive plug; a wordline address decoder coupled to the number of wordlines; a bitline address decoder coupled to the number of bitlines; a sense amplifier coupled to the number of bitlines; and wherein at least one of write once read only floating gate memory cells is a programmed flash cell having a charge trapped in the floating gate such that the programmed flash cell operates at reduced drain/source current.
Claim 25
Dependent Claim 234 words
An electronic system, comprising: a processor; and a memory device coupled to the processor, wherein the memory device includes; a memory array, wherein the memory array includes a number of write once read only floating gate memory cells, wherein each write once read only floating gate memory cell includes a source region, a drain region, a channel region between the source and the drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric; a number of bitlines coupled to the drain region of each write once read only floating gate memory cell along rows of the memory array; a number of wordlines coupled to the control gate of each write once read only floating gate memory cell along columns of the memory array; an array plate, wherein the source region of each write once read only floating gate memory cell is coupled to the array plate by a conductive plug; a wordline address decoder coupled to the number of wordlines; a bitline address decoder coupled to the number of bitlines; a sense amplifier coupled to the number of bitlines; and wherein at least one of write once read only floating gate memory cells is a programmed flash cell having a charge trapped in the floating gate such that the programmed flash cell operates at reduced drain/source current.
Claim 26
Dependent Claim 22 words
The electronic system of claim 20 , wherein the charge trapped in the floating gate includes a charge of approximately 100 electrons.
Claim 27
Dependent Claim 53 words
The electronic system of claim 20 , wherein, in a read operation, the array plate is coupled to a ground potential, the drain region of an addressed write once read only floating gate memory cell is precharged to a fractional voltage of VDD, and the memory cell is selected by a wordline address.
Claim 28
Dependent Claim 50 words
The electronic system of claim 20 , wherein, in a write operation, the array plate is biased to a voltage higher than VDD, the drain region of an addressed write once read only memory cell is couple to a ground, and the memory cell is selected by a wordline address.

References Cited (Backward Citations)

US3381114A Cited
US3665423A Cited
US3641516A Cited
US3877054A Cited
JPS5090169U Cited
US3964085A Cited
US4152627A Cited
US4215156A Cited
US4217601A Cited
US4413022A Cited
US4507673A Cited
US4333808A Cited
US4399424A Cited
US4939559A Cited
US4647947A Cited
US4661833A Cited
US4590042A Cited
US4920071A Cited
US4767641A Cited
JPS62199019U Cited
US5021999A Cited
US5293560A Cited
US5006192A Cited
US4888733A Cited
US5042011A Cited
US5111430A Cited
US4993358A Cited
US5198029A Cited
US5027171A Cited
US6057271A Cited
JPH03222367A Cited
US6110529A Cited
US5840897A Cited
US5080928A Cited
US5253196A Cited
US5141260A Cited
US5449941A Cited
US5399516A Cited
US5388069A Cited
US5280205A Cited
US5317535A Cited
US5550770A Cited
JPH06224431A Cited
US5438544A Cited
JPH06302828A Cited
US5539279A Cited
US6521950B1 Cited
US5493140A Cited
US5298447A Cited
US5467306A Cited
US5430670A Cited
US5424993A Cited
US5541872A Cited
US5541871A Cited
US5434815A Cited
US5508543A Cited
US5410504A Cited
US5485422A Cited
US5810923A Cited
US5828080A Cited
US5457649A Cited
US5822256A Cited
US5572459A Cited
US5627781A Cited
US5600587A Cited
US5477485A Cited
JPH08255878A Cited
US5530668A Cited
US5595606A Cited
US5530581A Cited
US5801105A Cited
US5670790A Cited
US5714766A Cited
US5795808A Cited
US5627785A Cited
US5735960A Cited
US6387712B1 Cited
US5768192A Cited
US5912488A Cited
US5698022A Cited
US5916365A Cited
US5950925A Cited
US6059885A Cited
US6166401A Cited
US5852306A Cited
US5801401A Cited
US5754477A Cited
US5959896A Cited
US5740104A Cited
US5989958A Cited
US5856688A Cited
US6115281A Cited
US6238976B1 Cited
US5973356A Cited
US5936274A Cited
US6072209A Cited
US6143636A Cited
US6150687A Cited
US6013553A Cited
US6249020B1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2010-03-19 2010-09-18 2011-03-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2014-03-19 2014-09-18 2015-03-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2018-03-19 2018-09-18 2019-03-20 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag