Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
146 words
Device for plasma treatment of a substrate in a high frequency excited plasma discharge between two electrodes which face each other supplied by a high frequency source, said device comprising: (a) a first electrode constructed as a hollow anode, said first electrode containing a wall area and at least one edge, said edge drawn in the direction of a second electrode, wherein said edge and said wall area define a hollow space of said first electrode, said edge and said hollow anode having the same potential, said wall area having disposed thereon a plurality of projections which extend into said hollow space to increase its internal surface area, and (b) a second electrode for carrying said substrate, said second electrode facing said first electrode and in front of said hollow space, wherein said edge and said second electrode form a gap of maximum width 10 mm.
Claim 2
Dependent Claim
146 words
Device for plasma treatment of a substrate in a high frequency excited plasma discharge between two electrodes which face each other supplied by a high frequency source, said device comprising: (a) a first electrode constructed as a hollow anode, said first electrode containing a wall area and at least one edge, said edge drawn in the direction of a second electrode, wherein said edge and said wall area define a hollow space of said first electrode, said edge and said hollow anode having the same potential, said wall area having disposed thereon a plurality of projections which extend into said hollow space to increase its internal surface area, and (b) a second electrode for carrying said substrate, said second electrode facing said first electrode and in front of said hollow space, wherein said edge and said second electrode form a gap of maximum width 10 mm.
Claim 3
Dependent Claim
10 words
Device of claim 1, wherein said projections are rib shaped.
Claim 4
Dependent Claim
12 words
Device of claim 2, wherein said rib shaped projections cross each other.
Claim 5
Dependent Claim
55 words
Device of claim 1, wherein said first electrode is surrounded by a dark space shielding, said dark space shielding comprising a wall area and an edge projecting therefrom, wherein said dark space shielding edge has the same potential as said shielding, and forms a gap with said second electrode with maximum width of 10 mm.
Claim 6
Dependent Claim
31 words
Device of claim 4, wherein at least one electrical coupling element is disposed on the periphery of said dark space shielding and runs parallel to the surface of said second electrode.
Claim 7
Dependent Claim
16 words
Device of claim 1, comprising at least one gas pipe which leads into said hollow space.
Claim 8
Dependent Claim
41 words
Device of claim 6, comprising a plurality of openings for passage of gas, said openings comprising grids impermeable to a plasma produced in said device which are disposed in said wall areas of said first electrode and said dark space shielding.
Claim 9
Dependent Claim
14 words
Device of claim 7 further comprising shielding elements positioned in front of said grids.
Claim 10
Dependent Claim
62 words
Device of claim 1, further comprising a second hollow anode wherein said first and second anode are placed in a mirror-like symmetrical array, in an essentially closed chamber wherein said anodes are complementary to each other and are positioned so that said second electrode or a substrate positioned on said second electrode passes through a symmetrical plane formed between said hollow anodes.
Claim 11
Dependent Claim
54 words
Device of claim 9, wherein said device further comprises a pair of coupling elements disposed parallel to each other and connected to a chime so as to connect said first and second anode, and to at least one of said second electrode or a substrate positioned thereupon, on both sides of said second electrode.
Claim 12
Dependent Claim
54 words
Method for plasma treatment of a substrate in a high frequency excited plasma discharge between two electrodes supplied by a high frequency source, comprising placing a substrate on the second electrode of the device of claim 1 and supplying a reactive gas to said device to produce a layer for deposit on said substrate.