Patent US7712056B2 successfully refreshed from Google Patents.
US7712056B2
Active / In Force
US
⏱️ 0.3 years remaining
Characterization and verification for integrated circuit designs
Assignee: Cadence Design Systems Inc
•
Filing: 2007-02-06
•
Granted: 2010-05-04
•
Expires: 2027-02-06
Abstract
Abstract Variations are characterized in feature dimensions of an integrated circuit that is to be fabricated in accordance with a design by a process that produces topographical variation in the integrated circuit, the variations in feature dimension being caused by the topographical variations. The process includes lithography or etch. Predicted characteristics are verified to conform to the design, the characteristics including feature dimensions or electrical characteristics. A process is selected for use in fabricating the integrated circuit based on the relative predicted variations. Chip-level features of a design of an integrated circuit are verified for manufacture within focus limitations of a lithographic tool. Whether a design of a level of an integrated circuit can be lithographically imaged in accordance with the design is predicted, and if it cannot be, the design or processing parameters are adjusted so that it can be.
Inventors
- 👤 David White
- 👤 Taber H. Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 04:04
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/36; G03F1/68; G03F1/70
Claims Analysis
Total Claims: 42
Claim 1
Independent Claim
103 words
A computer implemented method, comprising using at least a processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to verify that a chip-level feature of a design of the integrated circuit is to be manufactured within focus limitations of a lithographic tool, wherein the first manufacturing process comprises a lithographic process or an etching process; and using a computer readable storage medium or a storage device configured for storing the pattern-dependent model or using a display apparatus configured for displaying the pattern-dependent model.
Claim 2
Dependent Claim
103 words
A computer implemented method, comprising using at least a processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to verify that a chip-level feature of a design of the integrated circuit is to be manufactured within focus limitations of a lithographic tool, wherein the first manufacturing process comprises a lithographic process or an etching process; and using a computer readable storage medium or a storage device configured for storing the pattern-dependent model or using a display apparatus configured for displaying the pattern-dependent model.
Claim 3
Dependent Claim
19 words
The method of claim 1 in which the act of verifying is provided as a service in a network.
Claim 4
Dependent Claim
123 words
A computer implemented method, comprising using at least a processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to predict whether a design of a level of an integrated circuit is to be lithographically imaged in accordance with a design of the integrated circuit, wherein the first manufacturing process comprises a lithographic process or an etching process; and adjusting one or more design or processing parameters so that the design is to be lithographically imaged in accordance with the design using a display apparatus configured for displaying the pattern-dependent model or using a computer readable storage media configured for storing the pattern-dependent model.
Claim 5
Dependent Claim
123 words
A computer implemented method, comprising using at least a processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to predict whether a design of a level of an integrated circuit is to be lithographically imaged in accordance with a design of the integrated circuit, wherein the first manufacturing process comprises a lithographic process or an etching process; and adjusting one or more design or processing parameters so that the design is to be lithographically imaged in accordance with the design using a display apparatus configured for displaying the pattern-dependent model or using a computer readable storage media configured for storing the pattern-dependent model.
Claim 6
Dependent Claim
20 words
The method of claim 3 in which the act of adjusting includes selecting optimal tool settings of a lithography tool.
Claim 7
Dependent Claim
16 words
The method of claim 3 in which the act of adjusting includes selecting optimal photoresist materials.
Claim 8
Dependent Claim
17 words
The method of claim 3 in which the act of adjusting includes selecting optimal photoresist deposition recipes.
Claim 9
Dependent Claim
18 words
The method of claim 3 in which the act of adjusting includes adjusting tool settings for a tool.
Claim 10
Dependent Claim
15 words
The method of claim 3 in which the act of adjusting includes adjusting power settings.
Claim 11
Dependent Claim
15 words
The method of claim 3 in which the act of adjusting includes adjusting etch times.
Claim 12
Dependent Claim
15 words
The method of claim 3 in which the act of adjusting includes adjusting polish times.
Claim 13
Dependent Claim
15 words
The method of claim 3 in which the act of adjusting includes adjusting deposition times.
Claim 14
Dependent Claim
14 words
The method of claim 3 in which the act of adjusting includes adjusting pressures.
Claim 15
Dependent Claim
101 words
A systems comprising: at least a processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to verify that one or more chip-level of a design of an integrated circuit can be manufactured within focus limitations of a lithographic tool, wherein the first manufacturing process comprises a lithographic process or an etching process; and at least a computer storage device or a computer readable storage medium configured for storing the pattern-dependent model or a display apparatus configured for displaying the pattern-dependent model.
Claim 16
Dependent Claim
101 words
A systems comprising: at least a processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to verify that one or more chip-level of a design of an integrated circuit can be manufactured within focus limitations of a lithographic tool, wherein the first manufacturing process comprises a lithographic process or an etching process; and at least a computer storage device or a computer readable storage medium configured for storing the pattern-dependent model or a display apparatus configured for displaying the pattern-dependent model.
Claim 17
Dependent Claim
22 words
The system of claim 13 in which the using the pattern-dependent model to verify is provided as a component in a network.
Claim 18
Dependent Claim
129 words
A computer program product that includes a computer readable storage medium, the computer readable medium comprising a plurality of computer instructions which, when executed by a processor, cause the processor to execute performing a process, the process comprising: using at least the processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to predict whether a design of a level of an integrated circuit is to be lithographically imaged in accordance with the design, wherein the first manufacturing process comprises a lithographic process or an etching process; and adjusting one or more design or processing parameters so that the design is to be lithographically imaged in accordance with the design.
Claim 19
Dependent Claim
129 words
A computer program product that includes a computer readable storage medium, the computer readable medium comprising a plurality of computer instructions which, when executed by a processor, cause the processor to execute performing a process, the process comprising: using at least the processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to predict whether a design of a level of an integrated circuit is to be lithographically imaged in accordance with the design, wherein the first manufacturing process comprises a lithographic process or an etching process; and adjusting one or more design or processing parameters so that the design is to be lithographically imaged in accordance with the design.
Claim 20
Dependent Claim
22 words
The computer program product of claim 15 in which the act of adjusting includes selecting optimal tool settings of a lithography tool.
Claim 21
Dependent Claim
18 words
The computer program product of claim 15 in which the act of adjusting includes selecting optimal photoresist materials.
Claim 22
Dependent Claim
19 words
The computer program product of claim 15 in which the act of adjusting includes selecting optimal photoresist deposition recipes.
Claim 23
Dependent Claim
20 words
The computer program product of claim 15 in which the act of adjusting includes adjusting tool settings for a tool.
Claim 24
Dependent Claim
17 words
The computer program product of claim 15 in which the act of adjusting includes adjusting power settings.
Claim 25
Dependent Claim
17 words
The computer program product of claim 15 in which the act of adjusting includes adjusting etch times.
Claim 26
Dependent Claim
17 words
The computer program product of claim 15 in which the act of adjusting includes adjusting polish times.
Claim 27
Dependent Claim
17 words
The computer program product of claim 15 in which the act of adjusting includes adjusting deposition times.
Claim 28
Dependent Claim
17 words
The computer program product of claim 15 in which the act of adjusting includes adjusting include pressures.
Claim 29
Dependent Claim
117 words
A systems comprising: at least one processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to predict whether a design of a level of an integrated circuit can be lithographically imaged in accordance with the design, wherein the first manufacturing process comprises a lithographic process or an etching process; and adjusting one or more design or processing parameters so that the design is to be lithographically imaged in accordance with the design, a computer readable storage medium or a storage device configured for storing the pattern-dependent model or a display apparatus configured for displaying the pattern-dependent model.
Claim 30
Dependent Claim
117 words
A systems comprising: at least one processor configured for: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to predict whether a design of a level of an integrated circuit can be lithographically imaged in accordance with the design, wherein the first manufacturing process comprises a lithographic process or an etching process; and adjusting one or more design or processing parameters so that the design is to be lithographically imaged in accordance with the design, a computer readable storage medium or a storage device configured for storing the pattern-dependent model or a display apparatus configured for displaying the pattern-dependent model.
Claim 31
Dependent Claim
20 words
The system of claim 25 in which the adjusting includes means for selecting optimal tool settings of a lithography tool.
Claim 32
Dependent Claim
16 words
The system of claim 25 in which the adjusting includes means for selecting optimal photoresist materials.
Claim 33
Dependent Claim
17 words
The system of claim 25 in which the adjusting includes means for selecting optimal photoresist deposition recipes.
Claim 34
Dependent Claim
18 words
The system of claim 25 in which the adjusting includes means for adjusting tool settings for a tool.
Claim 35
Dependent Claim
15 words
The system of claim 25 in which the adjusting includes means for adjusting power settings.
Claim 36
Dependent Claim
15 words
The system of claim 25 in which the adjusting includes means for adjusting etch times.
Claim 37
Dependent Claim
15 words
The system of claim 25 in which the adjusting includes means for adjusting polish times.
Claim 38
Dependent Claim
15 words
The system of claim 25 in which the adjusting includes means for adjusting deposition times.
Claim 39
Dependent Claim
14 words
The system of claim 25 in which the adjusting includes means for adjusting pressures.
Claim 40
Dependent Claim
109 words
A computer program product that includes a computer readable storage medium, the computer readable medium comprising a plurality of computer instructions which, when executed by a processor, cause the processor to execute performing a process, the process comprising: using at least the processor configured for performing: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to verify that a chip-level feature of a design of the integrated circuit is to be manufactured within focus limitations of a lithographic tool, wherein the first manufacturing process comprises a lithographic process or an etching process.
Claim 41
Dependent Claim
109 words
A computer program product that includes a computer readable storage medium, the computer readable medium comprising a plurality of computer instructions which, when executed by a processor, cause the processor to execute performing a process, the process comprising: using at least the processor configured for performing: using a pattern-dependent model, which models a first manufacturing process that is used for fabrication of an integrated circuit and produces topographical variations during the fabrication, to verify that a chip-level feature of a design of the integrated circuit is to be manufactured within focus limitations of a lithographic tool, wherein the first manufacturing process comprises a lithographic process or an etching process.
Claim 42
Dependent Claim
21 words
The computer program product of claim 35 in which the act of verifying is provided as a service in a network.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2013-05-03 | 2013-11-02 | 2014-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2017-05-03 | 2017-11-02 | 2018-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2021-05-03 | 2021-11-02 | 2022-05-04 | $7700.00 | Window Closed / Lapsed |