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US6284655B1
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Method for producing low carbon/oxygen conductive layers
Assignee: Micron Technology Inc
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Filing: 1998-09-03
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Granted: 2001-09-04
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Expires: 2018-09-03
Abstract
Abstract The present invention provides a method for forming a substantially carbon- and oxygen-free conductive layer, wherein the layer can contain a metal and/or a metalloid material. According to the present invention, a substantially carbon- and oxygen-free conductive layer is formed in an oxidizing atmosphere in the presence of an organometallic catalyst using, for example, a chemical vapor deposition process. Such layers are particularly advantageous for use in memory devices, such as dynamic random access memory (DRAM) devices.
Inventors
- 👤 Eugene P. Marsh
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 09:42
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/032; H10W20/046; C; C23; C23C; C23C16/00; C23C16/06; C23C16/18; C23C16/44; H10P; H10P14/00; H10P14/40; H10P14/418; H10P14/42; H10P14/43; H10W20/033; H10W20/037; H10D; H10D1/00; H10D1/60; H10D1/68; H10D1/682; H10D1/692; H10D1/696; Y; Y10; Y10S; Y10S438/00; Y10S438/903
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
76 words
A method for use in fabrication of integrated circuits comprising: providing a substrate assembly having a surface; and forming, on a surface, a substantially carbon- and oxygen-free layer comprising a conductive material from a precursor in an oxidizing atmosphere and in the presence of an organometallic catalyst, wherein the precursor comprises at least one of a metal and a metalloid, wherein a metal portion of the organometallic catalyst is different than the metal of the precursor.
Claim 2
Independent Claim
76 words
A method for use in fabrication of integrated circuits comprising: providing a substrate assembly having a surface; and forming, on a surface, a substantially carbon- and oxygen-free layer comprising a conductive material from a precursor in an oxidizing atmosphere and in the presence of an organometallic catalyst, wherein the precursor comprises at least one of a metal and a metalloid, wherein a metal portion of the organometallic catalyst is different than the metal of the precursor.
Claim 3
Dependent Claim
27 words
The method of claim 1 , wherein the metal portion of the organometallic catalyst is selected from the group consisting essentially of platinum, palladium, rhodium, and iridium.
Claim 4
Dependent Claim
22 words
The method of claim 1 , wherein the conductive material comprises at least one of a metal, a metalloid, and mixtures thereof.
Claim 5
Dependent Claim
31 words
The method of claim 3 , wherein the metal and metalloid each can be in the form of a sulfide, a selenide, a telluride, a nitride, a silicide, and mixtures thereof.
Claim 6
Dependent Claim
38 words
The method of claim 3 , wherein the conductive material comprises at least one metal selected from the group consisting essentially of titanium, tantalum, ruthenium, osmium, iron, rhodium, cobalt, nickel, iridium, cerium, tungsten, aluminum, copper, and mixtures thereof.
Claim 7
Dependent Claim
29 words
The method of claim 5 , wherein the substantially carbon- and oxygen-free layer further comprises a metal selected from the group consisting essentially of platinum, palladium, rhodium, and iridium.
Claim 8
Dependent Claim
31 words
The method of claim 1 , wherein the substantially carbon- and oxygen-free layer comprises the metal portion from the organometallic catalyst in an amount no greater than about 20 atomic percent.
Claim 9
Dependent Claim
59 words
The method of claim 1 , wherein forming the substantially carbon- and oxygen-free layer comprises depositing the layer from the precursor comprising at least one metal selected from the group consisting essentially of titanium, tantalum, ruthenium, osmium, iron, rhodium, cobalt, nickel, iridium, cerium, tungsten, aluminum, and copper, by chemical vapor deposition in the presence of a platinum-containing organometallic catalyst.
Claim 10
Independent Claim
62 words
A method for forming a substantially carbon- and oxygen-free conductive layer comprising the steps of: providing a substrate including a heated surface in a reactor chamber; providing an oxidizing atmosphere within the chamber; supplying a precursor to the reactor chamber; and supplying an organometallic catalyst to the reactor chamber, wherein the substantially carbon- and oxygen-free conductive layer forms on the heated surface.
Claim 11
Independent Claim
62 words
A method for forming a substantially carbon- and oxygen-free conductive layer comprising the steps of: providing a substrate including a heated surface in a reactor chamber; providing an oxidizing atmosphere within the chamber; supplying a precursor to the reactor chamber; and supplying an organometallic catalyst to the reactor chamber, wherein the substantially carbon- and oxygen-free conductive layer forms on the heated surface.
Claim 12
Dependent Claim
24 words
The method of claim 9 , wherein the organometallic catalyst comprises a metal portion selected from the group consisting essentially of platinum and palladium.
Claim 13
Dependent Claim
35 words
The method of claim 9 , wherein the precursor comprises at least one metal selected from the group consisting essentially of titanium, tantalum, ruthenium, osmium, iron, rhodium, cobalt, nickel, iridium, cerium, tungsten, aluminum, and copper.
Claim 14
Dependent Claim
63 words
The method of claim 9 , wherein the oxidizing atmosphere comprises at least one compound selected from the group consisting essentially of oxygen, ozone, nitrous oxide, hydrogen peroxide, and R 2 O 2 , wherein R is selected from the group consisting of a saturated or unsaturated linear, branched or cyclic hydrocarbon group having about 1 carbon atom to about 20 carbon atoms.
Claim 15
Dependent Claim
38 words
The method of claim 9 , wherein the method further comprises supplying a reactive gas to the reactor chamber, wherein the reactive gas is selected from the group consisting essentially of ammonia, silane, hydrogen sulfide, and mixtures thereof.
Claim 16
Dependent Claim
22 words
The method of claim 9 , wherein the reaction chamber is at a pressure of about 0.5 torr to about 50 torr.
Claim 17
Dependent Claim
34 words
The method of claim 12 , wherein R is selected from the group consisting of a saturated or unsaturated linear, branched or cyclic hydrocarbon group having about 2 carbon atoms to about 12 atoms.
References Cited (Backward Citations)
US3839164A
Cited
US4830982A
Cited
EP0301725A2
Cited
US4992305A
Cited
US5130172A
Cited
US5149596A
Cited
US5220044A
Cited
US5096737A
Cited
US5487923A
Cited
US5252518A
Cited
US5270241A
Cited
US5520992A
Cited
US5198386A
Cited
US5561307A
Cited
US5187638A
Cited
US5372849A
Cited
US5403620A
Cited
US5232873A
Cited
US5354712A
Cited
US5605857A
Cited
US5639698A
Cited
US5506166A
Cited
US5478772A
Cited
US5392189A
Cited
US5498562A
Cited
US5510651A
Cited
US5341016A
Cited
US5728626A
Cited
US6127257A
Cited
US5566045A
Cited
US5581436A
Cited
US5717250A
Cited
US5480684A
Cited
US5972105A
Cited
US5654224A
Cited
US5464786A
Cited
US5661115A
Cited
US5691009A
Cited
US5696384A
Cited
US5555486A
Cited
EP0770862A1
Cited
US5654222A
Cited
US5663088A
Cited
US5618746A
Cited
JPH09162372A
Cited
US5760474A
Cited
US5970378A
Cited
US5990559A
Cited
US6074945A
Cited
US6133159A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-09-03 | 2005-03-05 | 2005-09-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-09-03 | 2009-03-05 | 2009-09-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-09-03 | 2013-03-05 | 2013-09-04 | $7700.00 | Window Closed / Lapsed |