US6653026B2 — Structure and method of correcting proximity effe…

Claim 1

Independent Claim 97 words

A photolithographic mask comprising: a plurality of structures, including all structures on the mask for implementing a logic circuit; wherein a subset of the structures include a transparent region, an opaque region, and an attenuated region, the subset of the plurality of structures including all structures in the plurality of structures defined using tri-tone phase shifting, wherein the subset of the structures are corrected for proximity effects, wherein the opaque region and the attenuated region form an attenuated rim having a predetermined width, and wherein the predetermined width is substantially the same in the subset of structures.

Claim 2

Dependent Claim 97 words

A photolithographic mask comprising: a plurality of structures, including all structures on the mask for implementing a logic circuit; wherein a subset of the structures include a transparent region, an opaque region, and an attenuated region, the subset of the plurality of structures including all structures in the plurality of structures defined using tri-tone phase shifting, wherein the subset of the structures are corrected for proximity effects, wherein the opaque region and the attenuated region form an attenuated rim having a predetermined width, and wherein the predetermined width is substantially the same in the subset of structures.

Claim 3

Dependent Claim 18 words

The photolithographic mask of claim 1 , wherein the transparent region has approximately a 0 degree phase shift.

Claim 4

Dependent Claim 18 words

The photolithographic mask of claim 2 , wherein the attenuated region has approximately a 180 degree phase shift.

Claim 5

Dependent Claim 20 words

The photolithographic mask of claim 1 , wherein the transparent region has an optical intensity transmission coefficient greater than 0.9.

Claim 6

Dependent Claim 23 words

The photolithographic mask of claim 1 , wherein the attenuated region has an optical intensity transmission coefficient between approximately 0.3 and approximately 1.0.

Claim 7

Dependent Claim 22 words

The photolithographic mask of claim 1 , wherein the opaque region has an optical intensity transmission coefficient of less than approximately 0.01.

Claim 8

Independent Claim 115 words

A method of forming a plurality of structures in a tri-tone attenuated phase-shifting mask, wherein a subset of the structures are formed by a first region and a second region, wherein the first region has a phase shift relative to the second region of 180 degrees, the method comprising: positioning a third region within a boundary for the second region, thereby forming a rim of the second region, wherein the third region prevents the second region from printing, the rim having an associated width; performing optical proximity correction on the subset of structures; and providing a predetermined rim width that is substantially the same for the rim of all structures in the subset of structures.

Claim 9

Independent Claim 115 words

A method of forming a plurality of structures in a tri-tone attenuated phase-shifting mask, wherein a subset of the structures are formed by a first region and a second region, wherein the first region has a phase shift relative to the second region of 180 degrees, the method comprising: positioning a third region within a boundary for the second region, thereby forming a rim of the second region, wherein the third region prevents the second region from printing, the rim having an associated width; performing optical proximity correction on the subset of structures; and providing a predetermined rim width that is substantially the same for the rim of all structures in the subset of structures.

Claim 10

Dependent Claim 14 words

The method of claim 7 , wherein the first region includes a transparent region.

Claim 11

Dependent Claim 14 words

The method of claim 8 , wherein the second region includes an attenuated region.

Claim 12

Dependent Claim 14 words

The method of claim 9 , wherein the third region includes an opaque region.

Claim 13

Dependent Claim 28 words

The method of claim 10 , further including dividing the border for the second region into a plurality of first segments, each first segment including two dissection points.

Claim 14

Dependent Claim 29 words

The method of claim 11 , further including projecting a subset of the dissection points onto a border for the third region, thereby forming a plurality of second segments.

Claim 15

Dependent Claim 22 words

The method of claim 12 , wherein if the optical proximity correction moves a first segment, then a corresponding second segment moves.

Claim 16

Dependent Claim 33 words

The method of claim 13 , wherein providing a predetermined rim width includes determining a modified border for the third region based on a modified second region formed after the optical proximity correction.

Claim 17

Dependent Claim 28 words

The method of claim 14 , wherein determining the modified border for the third region includes downsizing the modified second region and then upsizing the downsized second region.

Claim 18

Dependent Claim 44 words

The method of claim 15 , wherein determining the modified border for the third region includes downsizing the modified second region by N times the predetermined rim width and then upsizing the downsized second region by M times the predetermined rim width, wherein N>M.

Claim 19

Dependent Claim 37 words

The method of claim 14 , wherein determining the modified border for the third region includes downsizing the modified second region by the predetermined rim width and then eliminating any resulting mousebites in the downsized second region.

Claim 20

Dependent Claim 18 words

The method of claim 15 , wherein downsizing and upsizing is a function of the optical proximity correction.

Claim 21

Dependent Claim 27 words

The method of claim 14 , wherein determining the modified border for the third region includes adjusting the modified border to minimize any internal side lobe printing.

Claim 22

Dependent Claim 25 words

The method of claim 11 , wherein the optical proximity correction moves at least one first segment while maintaining a border for the third region.

Claim 23

Dependent Claim 33 words

The method of claim 20 , wherein providing a predetermined rim width includes determining a modified border for the third region based on a modified second region formed after the optical proximity correction.

Claim 24

Dependent Claim 28 words

The method of claim 21 , wherein determining the modified border for the third region includes downsizing the modified second region and then upsizing the downsized second region.

Claim 25

Dependent Claim 44 words

The method of claim 22 , wherein determining the modified border for the third region includes downsizing the modified second region by N times the predetermined rim width and then upsizing the downsized second region by M times the predetermined rim width, wherein N>M.

Claim 26

Dependent Claim 18 words

The method of claim 22 , wherein downsizing and upsizing is a function of the optical proximity correction.

Claim 27

Dependent Claim 37 words

The method of claim 21 , wherein determining the modified border for the third region includes downsizing the modified second region by the predetermined rim width and then eliminating any resulting mousebites in the downsized second region.

Claim 28

Dependent Claim 27 words

The method of claim 21 , wherein determining the modified border for the third region includes adjusting the modified border to minimize any internal side lobe printing.

Claim 29

Independent Claim 114 words

A method of fabricating a tri-tone attenuated phase-shifting mask, the method comprising: forming a transparent layer; forming an attenuated layer, wherein a phase shift of the attenuated layer relative to the transparent layer is approximately 180 degrees; simulating optical proximity correction for structures on the mask; patterning the attenuated layer based on the simulating, wherein a transition from a transparent portion of the transparent layer to an attenuated portion of the attenuated layer defines an edge of a structure on the mask; forming an opaque layer; patterning the opaque layer, wherein for each type of structure including an opaque portion, the opaque portion is located a predetermined distance from the edge of the structure.

Claim 30

Independent Claim 114 words

A method of fabricating a tri-tone attenuated phase-shifting mask, the method comprising: forming a transparent layer; forming an attenuated layer, wherein a phase shift of the attenuated layer relative to the transparent layer is approximately 180 degrees; simulating optical proximity correction for structures on the mask; patterning the attenuated layer based on the simulating, wherein a transition from a transparent portion of the transparent layer to an attenuated portion of the attenuated layer defines an edge of a structure on the mask; forming an opaque layer; patterning the opaque layer, wherein for each type of structure including an opaque portion, the opaque portion is located a predetermined distance from the edge of the structure.

Claim 31

Dependent Claim 47 words

The method of claim 27 , wherein a transition from the opaque portion to the attenuated portion defines an edge of a rim, wherein simulating optical proximity correction includes moving segments of the edge of the rim if corresponding segments of the edge of the structure move.

Claim 32

Dependent Claim 25 words

The method of claim 28 , further including downsizing the attenuated portion and then upsizing the attenuated portion, the downsizing and upsizing performed after simulating.

Claim 33

Dependent Claim 18 words

The method of claim 29 , wherein downsizing and upsizing is a function of the optical proximity correction.

Claim 34

Dependent Claim 21 words

The method of claim 29 , wherein downsizing and upsizing include minimizing any internal side lobe printing of the attenuated portion.

Claim 35

Dependent Claim 39 words

The method of claim 28 , further including downsizing the attenuated portion by N times the predetermined distance and then upsizing the attenuated portion by M times the predetermined distance, the downsizing and upsizing performed after simulating, wherein N>M.

Claim 36

Dependent Claim 18 words

The method of claim 28 , further including downsizing the attenuated portion by the predetermined distance after simulating.

Claim 37

Dependent Claim 17 words

The method of claim 33 , further including eliminating any mousebites from the attenuated portion after downsizing.

Claim 38

Dependent Claim 44 words

The method of claim 27 , wherein a transition from the opaque portion to the attenuated portion defines an edge of a rim, wherein simulating optical proximity correction includes moving segments of the edge of the structure while fixing the edge of the rim.

Claim 39

Dependent Claim 25 words

The method of claim 35 , further including downsizing the attenuated portion and then upsizing the attenuated portion, the downsizing and upsizing performed after simulating.

Claim 40

Dependent Claim 18 words

The method of claim 36 , wherein downsizing and upsizing is a function of the optical proximity correction.

Claim 41

Dependent Claim 21 words

The method of claim 36 , wherein downsizing and upsizing include minimizing any internal side lobe printing of the attenuated portion.

Claim 42

Dependent Claim 39 words

The method of claim 35 , further including downsizing the attenuated portion by N times the predetermined distance and then upsizing the attenuated portion by M times the predetermined distance, the downsizing and upsizing performed after simulating, wherein N>M.

Claim 43

Dependent Claim 18 words

The method of claim 35 , further including downsizing the attenuated portion by the predetermined distance after simulating.

Claim 44

Dependent Claim 17 words

The method of claim 40 , further including eliminating any mousebites from the attenuated portion after downsizing.

Claim 45

Dependent Claim 20 words

The method of claim 27 , wherein simulating optical proximity correction includes adding optical proximity correction features to the structures.

Claim 46

Dependent Claim 97 words

A semiconductor mask comprising: a plurality of structures, wherein a subset of the structures include a first region having an optical intensity transmission coefficient greater than 0.9, a second region having an optical intensity transmission coefficient of less than approximately 0.01, and a third region having an optical intensity transmission coefficient between approximately 0.3 and approximately 1.0, wherein the subset of the structures are corrected for proximity effects, wherein the second region and the third region form a rim having a predetermined width, and wherein the predetermined width is substantially the same in the subset of structures.

Claim 47

Dependent Claim 97 words

A semiconductor mask comprising: a plurality of structures, wherein a subset of the structures include a first region having an optical intensity transmission coefficient greater than 0.9, a second region having an optical intensity transmission coefficient of less than approximately 0.01, and a third region having an optical intensity transmission coefficient between approximately 0.3 and approximately 1.0, wherein the subset of the structures are corrected for proximity effects, wherein the second region and the third region form a rim having a predetermined width, and wherein the predetermined width is substantially the same in the subset of structures.

Claim 48

Dependent Claim 18 words

The semiconductor mask of claim 43 , wherein the first region has approximately a 0 degree phase shift.

Claim 49

Dependent Claim 18 words

The semiconductor mask of claim 43 , wherein the third region has approximately a 180 degree phase shift.

Claim 50

Dependent Claim 23 words

The semiconductor mask of claim 43 , wherein the third region relative to the first region has approximately a 180 degree phase shift.

Claim 51

Independent Claim 111 words

A method of fabricating an integrated circuit, the method comprising: illuminating a plurality of photolithographic masks, at least one mask comprising: a plurality of structures, wherein a subset of the structures include a transparent region, an opaque region, and an attenuated region, wherein the subset of the structures are corrected for proximity effects, wherein the opaque region and the attenuated region form an attenuated rim having a predetermined width, and wherein the predetermined width is substantially the same in the subset of structures; focusing an emanating light from the at least one mask onto a photoresist layer provided on a wafer; and developing the photoresist layer to form the integrated circuit.

Claim 52

Independent Claim 111 words

A method of fabricating an integrated circuit, the method comprising: illuminating a plurality of photolithographic masks, at least one mask comprising: a plurality of structures, wherein a subset of the structures include a transparent region, an opaque region, and an attenuated region, wherein the subset of the structures are corrected for proximity effects, wherein the opaque region and the attenuated region form an attenuated rim having a predetermined width, and wherein the predetermined width is substantially the same in the subset of structures; focusing an emanating light from the at least one mask onto a photoresist layer provided on a wafer; and developing the photoresist layer to form the integrated circuit.

Claim 53

Dependent Claim 16 words

The method of claim 47 wherein the transparent region has approximately a 0 degree phase shift.

Claim 54

Dependent Claim 17 words

The method of claim 47 , wherein the attenuated region has approximately a 180 degree phase shift.

Claim 55

Dependent Claim 19 words

The method of claim 47 , wherein the transparent region has an optical intensity transmission coefficient greater than 0.9.

Claim 56

Dependent Claim 22 words

The method of claim 47 , wherein the attenuated region has an optical intensity transmission coefficient between approximately 0.3 and approximately 1.0.

Claim 57

Dependent Claim 21 words

The method of claim 47 , wherein the opaque region has an optical intensity transmission coefficient of less than approximately 0.01.

Claim 58

Dependent Claim 12 words

The method of claim 47 , wherein illuminating includes transmitting hard X-rays.

Claim 59

Dependent Claim 12 words

The method of claim 47 , wherein illuminating includes transmitting soft X-rays.

Claim 60

Dependent Claim 28 words

The method of claim 47 , wherein illuminating includes transmitting one of the following wavelengths: 436 nanometers, 365 nanometers, 248 nanometers, 193 nanometers, 157 nanometers, and 126 nanometers.

Claim 61

Dependent Claim 22 words

The method of claim 47 , wherein illuminating includes using on-axis illumination for isolated structures and off-axis illumination for densely patterned structures.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	2006-11-24	2007-05-26	2007-11-25	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2010-11-24	2011-05-26	2011-11-25	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2014-11-24	2015-05-26	2015-11-25	$7700.00	Window Closed / Lapsed

Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask

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