US5935736A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Mask and method to eliminate side-lobe effects in attenuated phase shifting masks
Assignee: Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Filing: 1997-10-24
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Granted: 1999-08-10
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Expires: 2017-10-24
Abstract
Abstract A mask, method of forming the mask, and method of using the mask to form images in a layer of resist layer on an integrated circuit wafer are described. The mask has a first pattern formed in a layer of attenuating phase shifting material. A second pattern formed in a layer of opaque material is formed on the layer of attenuating phase shifting material such that the pattern edges of the first pattern formed in attenuating phase shifting material are exposed, thereby forming a rim type attenuating phase shifting mask. Using this mask to expose a resist layer formed in an integrated circuit wafer achieves the advantages of attenuating phase shifting masks while avoiding problems due to side-lobe effect.
Inventors
- 👤 San-De Tzu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:13
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/29
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
162 words
A method of forming photolithographic patterns, comprising the steps of: providing an integrated circuit wafer; providing a mask formed on a transparent mask substrate; wherein said mask comprises a first pattern having first pattern edges and formed in a layer of attenuating phase shifting material on said transparent mask substrate so that said first pattern exposes a part of said transparent mask substrate, wherein said attenuating phase shifting material is MoSiON, and a second pattern, formed in a layer of opaque material on said layer of attenuating phase shifting material, wherein said second pattern exposes that part of said attenuating phase shifting material within a gap width of said first patterned edges and that part of said transparent mask substrate exposed by said first pattern; forming a layer of photoresist on said integrated circuit wafer; passing light having a characteristic wavelength through said mask; focussing said light passing through said mask on said layer of photoresist; and developing said layer of photoresist.
Claim 2
Independent Claim
162 words
A method of forming photolithographic patterns, comprising the steps of: providing an integrated circuit wafer; providing a mask formed on a transparent mask substrate; wherein said mask comprises a first pattern having first pattern edges and formed in a layer of attenuating phase shifting material on said transparent mask substrate so that said first pattern exposes a part of said transparent mask substrate, wherein said attenuating phase shifting material is MoSiON, and a second pattern, formed in a layer of opaque material on said layer of attenuating phase shifting material, wherein said second pattern exposes that part of said attenuating phase shifting material within a gap width of said first patterned edges and that part of said transparent mask substrate exposed by said first pattern; forming a layer of photoresist on said integrated circuit wafer; passing light having a characteristic wavelength through said mask; focussing said light passing through said mask on said layer of photoresist; and developing said layer of photoresist.
Claim 3
Dependent Claim
20 words
The method of claim 1 wherein said layer of MoSiON has a thickness of between about 100 and 140 nanometers.
Claim 4
Dependent Claim
23 words
The method of claim 1 wherein said layer of opaque material is chrome having a thickness of between about 80 and 120 nanometers.
Claim 5
Dependent Claim
16 words
The method of claim 1 wherein said gap width is between about 0.35 and 0.45 micrometers.
Claim 6
Dependent Claim
26 words
The method of claim 1 wherein said layer of attenuating phase shifting material provides a phase shift of about 180° for light having said characteristic wavelength.
Claim 7
Dependent Claim
12 words
The method of claim 1 wherein said characteristic wavelength is 365 nanometers.
Claim 8
Dependent Claim
22 words
The method of claim 1 wherein said transparent mask substrate is quartz having a thickness of between about 0.2 and 0.3 inches.
Claim 9
Dependent Claim
109 words
A mask, comprising: a transparent mask substrate; a patterned layer of attenuating phase shifting material, wherein said attenuating phase shifting material is MoSiON, having a first pattern formed on said transparent mask substrate, wherein said first pattern has first pattern edges and exposes a part of said transparent mask substrate; and a patterned layer of opaque material having a second pattern formed on said layer of attenuating phase shifting material, wherein said second pattern exposes that part of said attenuating phase shifting material within a gap width of said first pattern edges and said second pattern exposes that part of said transparent mask substrate exposed by said first pattern.
Claim 10
Dependent Claim
109 words
A mask, comprising: a transparent mask substrate; a patterned layer of attenuating phase shifting material, wherein said attenuating phase shifting material is MoSiON, having a first pattern formed on said transparent mask substrate, wherein said first pattern has first pattern edges and exposes a part of said transparent mask substrate; and a patterned layer of opaque material having a second pattern formed on said layer of attenuating phase shifting material, wherein said second pattern exposes that part of said attenuating phase shifting material within a gap width of said first pattern edges and said second pattern exposes that part of said transparent mask substrate exposed by said first pattern.
Claim 11
Dependent Claim
21 words
The mask of claim 8 wherein said patterned layer of MoSiON has a thickness of between about 100 and 140 nanometers.
Claim 12
Dependent Claim
24 words
The mask of claim 8 wherein said patterned layer of opaque material is chrome having a thickness of between about 80 and 120 nanometers.
Claim 13
Dependent Claim
16 words
The mask of claim 8 wherein said gap width is between about 0.35 and 0.45 micrometers.
Claim 14
Dependent Claim
28 words
The mask of claim 8 wherein said layer of attenuating phase shifting material provides a phase shift of about 180° for light having a wavelength of 365 nanometers.
Claim 15
Dependent Claim
20 words
The mask of claim 8 wherein said transparent mask substrate has a thickness of between about 0.2 and 0.3 inches.
Claim 16
Independent Claim
144 words
A method of forming a mask, comprising the steps of: providing a transparent mask substrate; depositing a layer of attenuating phase shifting material on said transparent mask substrate; patterning said layer of attenuating phase shifting material using photolithographic techniques thereby forming a first pattern having first pattern edges in said layer of attenuating phase shifting material and exposing a part of said transparent mask substrate; depositing a layer of opaque material on said transparent mask substrate covering said patterned layer of attenuating phase shifting material; patterning said layer of opaque material using photolithographic techniques thereby forming a second pattern in said layer of opaque material, wherein said second pattern exposes that part of said attenuating phase shifting material within a gap width of said first pattern edges, and said second pattern exposes that part of said transparent mask substrate exposed by said first pattern.
Claim 17
Independent Claim
144 words
A method of forming a mask, comprising the steps of: providing a transparent mask substrate; depositing a layer of attenuating phase shifting material on said transparent mask substrate; patterning said layer of attenuating phase shifting material using photolithographic techniques thereby forming a first pattern having first pattern edges in said layer of attenuating phase shifting material and exposing a part of said transparent mask substrate; depositing a layer of opaque material on said transparent mask substrate covering said patterned layer of attenuating phase shifting material; patterning said layer of opaque material using photolithographic techniques thereby forming a second pattern in said layer of opaque material, wherein said second pattern exposes that part of said attenuating phase shifting material within a gap width of said first pattern edges, and said second pattern exposes that part of said transparent mask substrate exposed by said first pattern.
Claim 18
Dependent Claim
25 words
The method of claim 14 wherein said layer of attenuating phase shifting material is MoSiON having a thickness of between about 100 and 140 nanometers.
Claim 19
Dependent Claim
22 words
The method of claim 14 wherein said layer of opaque material is chrome having a thickness of between about 80and 120 nanometers.
Claim 20
Dependent Claim
16 words
The method of claim 14 wherein said gap width is between about 0.35 and 0.45 micrometers.
Claim 21
Dependent Claim
28 words
The method of claim 14 wherein said layer of attenuating phase shifting material provides a phase shift of about 180° for light having a wavelength of 365 nanometers.
Claim 22
Dependent Claim
20 words
The method of claim 14 wherein said transparent mask substrate has a thickness of between about 0.2 and 0.3 inches.
Claim 23
Dependent Claim
39 words
The method of claim 14 where said patterning said layer of attenuating phase shifting material using photolithographic techniques and said patterning said layer of opaque material using photolithographic techniques comprises exposing a layer of resist with an electron beam.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-08-09 | 2003-02-08 | 2003-08-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-08-09 | 2007-02-08 | 2007-08-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-08-09 | 2011-02-08 | 2011-08-10 | $7700.00 | Window Closed / Lapsed |