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US5725969A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing phase-shifting mask comprising a light shield pattern on a phase-shifting attenuatting layer

Assignee: SK Hynix Inc
•
Filing: 1995-12-22
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Granted: 1998-03-10
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Expires: 2015-12-22
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Abstract

Abstract A phase-shifting mask which has a supplementary pattern arranged for preventing unwanted constructive interference of light caused when isolated patterns (transparent regions) are arranged adjacently. Also, a method for manufacturing such a phase-shifting mask, including the steps of providing a transparent substrate, a phase-shifting layer having transparent regions formed on the transparent substrate, and a supplementary light shielding patterns formed on the phase-shifting layer between the transparent regions.

Inventors

  • 👤 Jun Seok Lee

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 22:21
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/32; G03F1/36; H; H10; H10P; H10P76/00

Claims Analysis

Total Claims: 36
Claim 1
Independent Claim 63 words
A method of manufacturing a phase-shifting and attenuating mask comprising the steps of: providing a transparent substrate; forming a phase-shifting and attenuating layer on said transparent substrate; selectively removing said phase-shifting and attenuating layer to form a half-tone mask having a plurality of transparent regions; and, forming at least one light shielding pattern on said phase-shifting and attenuating layer between said transparent regions.
Claim 2
Independent Claim 63 words
A method of manufacturing a phase-shifting and attenuating mask comprising the steps of: providing a transparent substrate; forming a phase-shifting and attenuating layer on said transparent substrate; selectively removing said phase-shifting and attenuating layer to form a half-tone mask having a plurality of transparent regions; and, forming at least one light shielding pattern on said phase-shifting and attenuating layer between said transparent regions.
Claim 3
Dependent Claim 15 words
The method as claimed in claim 1, wherein said transparent substrate is formed of glass.
Claim 4
Dependent Claim 19 words
The method as claimed in claim 1, wherein said phase-shifting and attenuating layer has a light transmissivity of 6-30%.
Claim 5
Dependent Claim 19 words
The method as claimed in claim 3, wherein said phase-shifting and attenuating layer has a light transmissivity of 6-15%.
Claim 6
Dependent Claim 19 words
The method as claimed in claim 1, wherein said at least one light shielding pattern is formed of chrome.
Claim 7
Dependent Claim 32 words
The method as claimed in claim 1, wherein said at least one light shielding pattern is formed at a position equally spaced from the centers of at least two adjacent transparent regions.
Claim 8
Dependent Claim 29 words
The method as claimed in claim 6, wherein a shape of said at least one light shielding pattern is circular, rectangular, a cross or a grouping of plural dots.
Claim 9
Dependent Claim 30 words
The method as claimed in claim 6, wherein said at least one light shielding pattern is formed at a position equally spaced from the centers of four adjacent transparent regions.
Claim 10
Dependent Claim 34 words
The method as claimed in claim 1, wherein the center of said supplementary light shielding pattern is located halfway between said transparent regions, with a linewidth which divides a light intensity peak into two.
Claim 11
Dependent Claim 35 words
The method as claimed in claim 1, wherein distances between said transparent regions fall in the range of about 0.5(lambda/NA) to 1.1(lambda/NA), where lambda represents a wavelength of light and NA represents a numerical aperture.
Claim 12
Dependent Claim 22 words
The method as claimed in claim 1, wherein said transparent regions are substantially larger than said at least one light shielding pattern.
Claim 13
Independent Claim 93 words
A method of manufacturing a phase-shifting and attenuating mask comprising the steps of: providing a transparent substrate; forming a phase-shifting and attenuating layer on said transparent substrate; and, selectively removing said phase-shifting and attenuating layer for a simultaneous formation of at least two primary transparent regions and at least one supplementary transparent region located in a main area defined by said primary transparent regions, said at least one supplementary transparent region preventing unwanted constructive interference in areas between the transparent regions, said primary transparent regions being substantially larger than said supplementary transparent regions.
Claim 14
Independent Claim 93 words
A method of manufacturing a phase-shifting and attenuating mask comprising the steps of: providing a transparent substrate; forming a phase-shifting and attenuating layer on said transparent substrate; and, selectively removing said phase-shifting and attenuating layer for a simultaneous formation of at least two primary transparent regions and at least one supplementary transparent region located in a main area defined by said primary transparent regions, said at least one supplementary transparent region preventing unwanted constructive interference in areas between the transparent regions, said primary transparent regions being substantially larger than said supplementary transparent regions.
Claim 15
Dependent Claim 15 words
The method as claimed in claim 12, wherein said transparent substrate is formed of glass.
Claim 16
Dependent Claim 19 words
The method as claimed in claim 12, wherein said phase-shifting and attenuating layer has a light transmissivity of 6-30%.
Claim 17
Dependent Claim 29 words
The method as claimed in claim 12, wherein a shape of said at least one supplementary transparent region is elliptic, rectangular, a cross or a grouping of plural dots.
Claim 18
Dependent Claim 33 words
The method as claimed in claim 12, wherein said at least one supplementary transparent region is formed at a position substantially equally spaced between the centers of at least two primary transparent regions.
Claim 19
Dependent Claim 31 words
The method as claimed in claim 16, wherein said at least one supplementary transparent region is formed at a position substantially equally spaced between the centers of four primary transparent regions.
Claim 20
Dependent Claim 45 words
A phase-shifting and attenuating mask, including: a transparent substrate; a phase-shifting and attenuating layer having a plurality of primary transparent regions formed on the transparent substrate; and a plurality of supplementary light shielding patterns formed on the phase-shifting and attenuating layer between the transparent regions.
Claim 21
Dependent Claim 45 words
A phase-shifting and attenuating mask, including: a transparent substrate; a phase-shifting and attenuating layer having a plurality of primary transparent regions formed on the transparent substrate; and a plurality of supplementary light shielding patterns formed on the phase-shifting and attenuating layer between the transparent regions.
Claim 22
Dependent Claim 32 words
The mask as claimed in claim 18, wherein the at least one supplementary light shielding pattern is formed at a position equally distanced to at least two adjacent said primary transparent regions.
Claim 23
Dependent Claim 28 words
The mask as claimed in claim 19, wherein said light shielding patterns are formed at a position equally spaced from the centers of four adjacent primary transparent regions.
Claim 24
Dependent Claim 26 words
The mask as claimed in claim 18, wherein a shape of a supplementary light shielding pattern is circular, rectangular, a cross or a grouping of dots.
Claim 25
Dependent Claim 46 words
The mask as claimed in claim 18, wherein the supplementary light shielding pattern is formed so that a length along the X-axis is greater than a length along the Y-axis where an X-axis distance is smaller than a Y-axis distance with respect to adjacent transparent regions.
Claim 26
Dependent Claim 18 words
The mask as claimed in claim 22, wherein a shape of the supplementary light shielding pattern is rectangular.
Claim 27
Dependent Claim 20 words
The mask as claimed in claim 22, wherein a shape of the supplementary light shielding pattern is a rectangular cross.
Claim 28
Dependent Claim 36 words
The mask as claimed in claim 18, wherein distances between said primary transparent regions fall in the range of about 0.5(lambda/NA) to 1.1(lambda/NA), where lambda represents a wavelength of light and NA represents a numerical aperture.
Claim 29
Dependent Claim 78 words
A phase-shifting and attenuating mask, including: a transparent substrate; and a phase-shifting and attenuating layer, formed on the transparent substrate, having a plurality of primary transparent regions and at least one supplementary transparent region located in a main area defined by said primary transparent regions, said supplementary transparent region being for prevention of unwanted constructive interference in areas between the plurality of primary transparent regions, respectively, said primary transparent regions being substantially larger than said supplementary transparent regions.
Claim 30
Dependent Claim 78 words
A phase-shifting and attenuating mask, including: a transparent substrate; and a phase-shifting and attenuating layer, formed on the transparent substrate, having a plurality of primary transparent regions and at least one supplementary transparent region located in a main area defined by said primary transparent regions, said supplementary transparent region being for prevention of unwanted constructive interference in areas between the plurality of primary transparent regions, respectively, said primary transparent regions being substantially larger than said supplementary transparent regions.
Claim 31
Dependent Claim 28 words
The mask as claimed in claim 26, wherein a shape of the at least one supplementary transparent region is elliptic, rectangular, a cross or a grouping of dots.
Claim 32
Dependent Claim 48 words
The mask as claimed in claim 26, wherein the at least one supplementary transparent region is formed so that a length alone the X-axis is greater than a length along the Y-axis where an X-axis distance is smaller than a Y-axis distance with respect to adjacent transparent regions.
Claim 33
Dependent Claim 20 words
The mask as claimed in claim 28, wherein a shape of the at least one supplementary transparent region is rectangular.
Claim 34
Dependent Claim 23 words
The mask as claimed in claim 28, wherein a shape of the at least one supplementary transparent region is a group of dots.
Claim 35
Dependent Claim 33 words
The mask as claimed in claim 26, wherein said at least on supplementary transparent region is formed at a position substantially equally spaced between the centers of at least two primary transparent regions.
Claim 36
Dependent Claim 31 words
The mask as claimed in claim 31, wherein said at least one supplementary transparent region is formed at a position substantially equally spaced between the centers of four primary transparent regions.

References Cited (Backward Citations)

US5358807A Cited
US5286581A Cited
US5429897A Cited
US5565286A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-03-09 2001-09-08 2002-03-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-03-09 2005-09-08 2006-03-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-03-09 2009-09-08 2010-03-10 $7700.00 Window Closed / Lapsed

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