Area feature sorting mechanism for neighborhood-based proximity correction in lithography processing of integrated circuit patterns

Claim 2

For use with proximity correction of dosage in lithography processing of a pattern of area features to form an integrated circuit device, a method of locating those area features which lie within a prescribed proximity correction neighborhood of a respective area feature, comprising the steps of: (a) for each of a plurality of distance increments extending in a first direction across said pattern, examining said pattern to identify those area features which are located within a respective area window extending in a second direction from a respective distance increment, and generating and storing information representative of characteristics of each identified area feature in a group that is associated with that respective area window; (b) for each of the area features whose identities have been stored in respective groups in step (a), defining a boundary window which delineates said prescribed proximity correction neighborhood relative to that respective area feature; and (c) for a respective area feature, identifying those area features that have been stored in step (a) and characteristics of which are contained within the boundary window for said respective area feature as lying within said prescribed proximity correction neighborhood of said respective area feature.

Claim 3

A method according to claim 1, wherein said characteristics correspond to the location and size of said area features.

Claim 4

A method according to claim 2, wherein said area features include rectangular shaped features.

Claim 5

A method according to claim 1, wherein said boundary window has a first boundary line which extends in said first direction a distance to one side of the location of the respective area feature corresponding to the sum of the maximum possible dimension of the respective area feature in the second direction and a predefined distance between adjacent area features, and a second boundary line, parallel with said first boundary line, which extends in said first direction a distance to a second side of the location of the respective area feature corresponding to the sum of the length of the area feature in the second direction and said predefined separation distance.

Claim 6

A method according to claim 4, wherein said boundary window has a third boundary line which extends in said second direction to a first side of the location of the respective area feature of interest a distance corresponding to the sum of the dimension of the respective area feature in the first direction and said predefined separation distance, and a fourth boundary line which extends in said second direction a distance to a second side of the location of the respective area feature corresponding to the sum of the maximum possible dimension of the area feature in the first direction and said predefined separation distance.

Claim 7

For use with a pattern of area features, a method of locating those area features which lie within a prescribed neighborhood of a respective area feature, comprising the steps of: (a) for each of a plurality of distance increments extending in a first direction across said pattern, examining said pattern to identify those area features which are located within a respective area window extending in a second direction from a respective distance increment, and generating and storing information representative of characteristics of each identified area feature in a group that is associated with that respective area window; (b) for each of the area features whose identities have been stored in respective groups in step (a), defining a boundary window which delineates said prescribed neighborhood relative to that respective area feature; and (c) for a respective area feature, identifying those area features that have been stored in step (a) and characteristics of which are contained within the boundary window for said respective area feature as lying within said prescribed neighborhood of said respective area feature.

Claim 8

For use with a pattern of area features, a method of locating those area features which lie within a prescribed neighborhood of a respective area feature, comprising the steps of: (a) for each of a plurality of distance increments extending in a first direction across said pattern, examining said pattern to identify those area features which are located within a respective area window extending in a second direction from a respective distance increment, and generating and storing information representative of characteristics of each identified area feature in a group that is associated with that respective area window; (b) for each of the area features whose identities have been stored in respective groups in step (a), defining a boundary window which delineates said prescribed neighborhood relative to that respective area feature; and (c) for a respective area feature, identifying those area features that have been stored in step (a) and characteristics of which are contained within the boundary window for said respective area feature as lying within said prescribed neighborhood of said respective area feature.

Claim 9

A method according to claim 6, wherein said boundary window has a first boundary line which extends in said first direction a distance to one side of the location of the respective area feature corresponding to the sum of the maximum possible dimension of the respective area feature in the second direction and a predefined distance between adjacent area features, and a second boundary line, parallel with said first boundary line, which extends in said first direction a distance to a second side of the location of the respective area feature corresponding to the sum of the length of the area feature in the second direction and said predefined separation distance.

Claim 10

A method according to claim 7, wherein said boundary window has a third boundary line which extends in said second direction to a first side of the location of the respective area feature of interest a distance corresponding to the sum of the dimension of the respective area feature in the first direction and said predefined separation distance, and a fourth boundary line which extends in said second direction a distance to a second side of the location of the respective area feature corresponding to the sum of the maximum possible dimension of the area feature in the first direction and said predefined separation distance.

Claim 11

A method according to claim 6, wherein said characteristics correspond to the location and size of said area features.

Claim 12

A method according to claim 9, wherein said area features include rectangular shaped features.

Claim 13

For use with proximity correction of dosage in lithography processing of a pattern of area features, the sizes and locations of which within said pattern are representable by first data, onto an integrated circuit device, a method of locating those area features which lie within a prescribed proximity correction neighborhood of a respective area feature, comprising the steps of: (a) for each of successive distance increments extending in a first direction across said pattern, storing second data identifying those area features first data for which are representative of their locations lying within a respective area window extending from a respective distance increment in a second direction across said pattern; (b) for a respective area feature second data for which has been stored in step (a), defining a boundary window a first dimension of which extends in said first direction a distance to a first side of the location of said respective area feature corresponding to the sum of the maximum possible dimension of said respective area feature in said first direction and a predefined separation distance between adjacent area features, and which extends in said first direction a distance to a second side of the location of said respective area feature corresponding to the sum of the length of the area feature in the first direction and said predefined separation distance. (c) for a respective area feature that lies within the dimension of the boundary window defined in step (b), identifying each remaining area feature within said dimension on a first side of the location of said respective area feature the distance between the location of which and the location of said respective area feature in a second direction is less than or equal to the sum of the dimension of said respective area feature in said second direction and said predefined separation distance between adjacent area features, and each remaining area feature within said dimension of said boundary window on a second side of the location of said respective area feature the distance between the location of which and the location of said respective area feature in said second direction is less than or equal to the sum of the maximum dimension of an area feature in said second direction and said predefined separation distance.

Claim 14

For use with proximity correction of dosage in lithography processing of a pattern of area features, the sizes and locations of which within said pattern are representable by first data, onto an integrated circuit device, a method of locating those area features which lie within a prescribed proximity correction neighborhood of a respective area feature, comprising the steps of: (a) for each of successive distance increments extending in a first direction across said pattern, storing second data identifying those area features first data for which are representative of their locations lying within a respective area window extending from a respective distance increment in a second direction across said pattern; (b) for a respective area feature second data for which has been stored in step (a), defining a boundary window a first dimension of which extends in said first direction a distance to a first side of the location of said respective area feature corresponding to the sum of the maximum possible dimension of said respective area feature in said first direction and a predefined separation distance between adjacent area features, and which extends in said first direction a distance to a second side of the location of said respective area feature corresponding to the sum of the length of the area feature in the first direction and said predefined separation distance. (c) for a respective area feature that lies within the dimension of the boundary window defined in step (b), identifying each remaining area feature within said dimension on a first side of the location of said respective area feature the distance between the location of which and the location of said respective area feature in a second direction is less than or equal to the sum of the dimension of said respective area feature in said second direction and said predefined separation distance between adjacent area features, and each remaining area feature within said dimension of said boundary window on a second side of the location of said respective area feature the distance between the location of which and the location of said respective area feature in said second direction is less than or equal to the sum of the maximum dimension of an area feature in said second direction and said predefined separation distance.