US4717644A
Expired / Lapsed
US
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Hybrid electron beam and optical lithography method
Assignee: International Business Machines Corp
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Filing: 1982-12-20
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Granted: 1988-01-05
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Expires: 2002-12-20
Abstract
Abstract A complete lithographic exposure pattern is formed in accordance with this invention by forming part of the complete pattern with electron beam radiation and forming the remaining part with light radiation. The electron beam exposure pattern part delineates all of the edges of the desired complete pattern while the optical exposure pattern part fills in any remaining regions, together forming the desired complete exposure pattern. Since all edges are delineated by electron beam radiation, any radiation sensitive layer exposed to the complete pattern will develop edges characteristic of an electron beam pattern exposure. Electron beam exposure system thruput is improved because the whole pattern is not exposed by electron beam. Preferably, the exposure width of the electron beam edge delineation is on the order of the minimum linewidth of the pattern, so that proximity effects will be automatically reduced or eliminated without requiring computation of the exposure contribution from adjacent shapes in the pattern due to lateral scattering effects and without requiring any variation in the applied electron beam exposure dose. Use of a wider exposure width for electron beam delineation of pattern edges has the advantage that alignment tolerance of the optical exposure pattern part with respect to the electron beam exposure pattern part is increased.
Inventors
- 👤 Fletcher Jones
- 👤 Henry R. Voelker
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; B; B82; B82Y; B82Y10/00; B82Y40/00; G03F7/70; G03F7/70425; G03F7/7045; H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; H01J2237/00; H01J2237/30; H01J2237/317; H01J2237/3175; H01J2237/31769; H01J2237/31771; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
109 words
A method of exposing a radiation sensitive layer to a pattern having electron beam defined edges and resolution, but with improved electron beam exposure system thruput and reduced sensitivity to electron beam proximity effects, comprising the steps of: electron beam exposing a radiation sensitive layer to an edge pattern, said edge pattern corresponding with the edge regions of a desired exposure pattern, optically exposing said radiation sensitive layer to a non-edge pattern, said non-edge pattern corresponding with non-edge regions of said desired exposure pattern, said electron beam exposure of an edge pattern and said optical exposure of a non-edge pattern being superposed to form said desired exposure pattern together.
Claim 2
Independent Claim
109 words
A method of exposing a radiation sensitive layer to a pattern having electron beam defined edges and resolution, but with improved electron beam exposure system thruput and reduced sensitivity to electron beam proximity effects, comprising the steps of: electron beam exposing a radiation sensitive layer to an edge pattern, said edge pattern corresponding with the edge regions of a desired exposure pattern, optically exposing said radiation sensitive layer to a non-edge pattern, said non-edge pattern corresponding with non-edge regions of said desired exposure pattern, said electron beam exposure of an edge pattern and said optical exposure of a non-edge pattern being superposed to form said desired exposure pattern together.
Claim 3
Dependent Claim
22 words
A method as defined in claim 1 wherein said edge pattern comprises bands corresponding with all edges of the desired exposure pattern.
Claim 4
Dependent Claim
25 words
A method as defined in claim 2 wherein said edge bands have a width on the order of the minimum linewidth of said exposure pattern.
Claim 5
Dependent Claim
20 words
A method as defined in claim 3 wherein said edge bands have a width on the order of one-half micron.
Claim 6
Dependent Claim
27 words
A method as defined in claim 2 wherein said non-edge pattern comprises all regions of said desired exposure pattern which do not correspond with said edge pattern.
Claim 7
Independent Claim
88 words
A method of forming a lithographic resist pattern, comprising the steps of: delineating the edges of a desired resist pattern by exposing a radiation sensitive resist layer to a pattern of electron beam radiation corresponding with the edges of said desired resist pattern; filling in the non-edge regions of said desired resist pattern by exposing said radiation sensitive resist layer to a pattern of light radiation corresponding with the non-edge regions of said desired resist pattern; and developing said exposed resist layer to form said desired resist pattern.
Claim 8
Independent Claim
88 words
A method of forming a lithographic resist pattern, comprising the steps of: delineating the edges of a desired resist pattern by exposing a radiation sensitive resist layer to a pattern of electron beam radiation corresponding with the edges of said desired resist pattern; filling in the non-edge regions of said desired resist pattern by exposing said radiation sensitive resist layer to a pattern of light radiation corresponding with the non-edge regions of said desired resist pattern; and developing said exposed resist layer to form said desired resist pattern.
Claim 9
Dependent Claim
26 words
The method defined in claim 6 wherein said pattern of electron beam radiation comprises edge bands defining all of the edges of the desired resist pattern.
Claim 10
Dependent Claim
27 words
The method defined in claim 7 wherein said resist layer is positive acting so that said desired resist pattern corresponds with exposed regions of said resist layer.
Claim 11
Dependent Claim
71 words
A patterned layer formed by a lithographic process, said lithographic process comprising the steps of: delineating the edges of a desired pattern by electron beam exposure of an edge pattern part of the desired pattern; and defining non-edge regions of said desired pattern by optical exposure of a non-edge pattern part of said desired pattern, said electron beam exposure and said optical exposure being superposed to define said desired pattern together.
Claim 12
Dependent Claim
71 words
A patterned layer formed by a lithographic process, said lithographic process comprising the steps of: delineating the edges of a desired pattern by electron beam exposure of an edge pattern part of the desired pattern; and defining non-edge regions of said desired pattern by optical exposure of a non-edge pattern part of said desired pattern, said electron beam exposure and said optical exposure being superposed to define said desired pattern together.
Claim 13
Dependent Claim
27 words
A patterned layer as defined in claim 9 wherein said edge pattern part is a pattern of edge bands corresponding with the edges of said desired pattern.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-01-04 | 1991-07-06 | 1992-01-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-01-04 | 1995-07-06 | 1996-01-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-01-04 | 1999-07-06 | 2000-01-05 | $7700.00 | Window Closed / Lapsed |