US5885734A
Expired / Lapsed
US
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Process for modifying a hierarchical mask layout
Assignee: Round Rock Research LLC
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Filing: 1996-08-15
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Granted: 1999-03-23
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Expires: 2016-08-15
Abstract
Abstract A binary mask layout design arranged hierarchically to include a plurality of levels is modified to include optical proximity effect corrections or phase shifting layers. This is accomplished by beginning at the lowest level of the hierarchy and modifying elements or cells in the design. Any modifications that are uniform to corresponding cells throughout the level are placed in the same level in the hierarchy. Any modifications that apply only to selected cells in the level are placed in a higher level in the hierarchy. The process is repeated for all levels in the hierarchy.
Inventors
- 👤 Christophe Pierrat
- 👤 Chin Aik Le
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 17:54
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/36
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
97 words
A process for modifying a hierarchical mask layout comprising: obtaining a binary mask layout design that has been arranged in a hierarchy having a plurality of levels; modifying elements of the design in a first level of said hierarchy to which changes are necessary; placing modifications that are uniform to corresponding elements throughout said first level in said first level in said hierarchy; and placing modifications that apply only to selected elements in said first level in a second level in said hierarchy, said second level being a higher level in said hierarchy than said first level.
Claim 2
Dependent Claim
97 words
A process for modifying a hierarchical mask layout comprising: obtaining a binary mask layout design that has been arranged in a hierarchy having a plurality of levels; modifying elements of the design in a first level of said hierarchy to which changes are necessary; placing modifications that are uniform to corresponding elements throughout said first level in said first level in said hierarchy; and placing modifications that apply only to selected elements in said first level in a second level in said hierarchy, said second level being a higher level in said hierarchy than said first level.
Claim 3
Dependent Claim
25 words
A process for modifying a hierarchical mask layout as defined in claim 1 wherein said second level is the next higher level in said hierarchy.
Claim 4
Dependent Claim
21 words
A process for modifying a hierarchical mask layout as defined in claim 1 wherein said modifications comprise optical proximity effect corrections.
Claim 5
Dependent Claim
19 words
A process for modifying hierarchical mask layout as defined in claim 1 wherein said modifications comprise phase shifting layers.
Claim 6
Dependent Claim
22 words
A process for modifying a hierarchical mask layout as defined in claim 1 wherein modifications are made in a plurality of levels.
Claim 7
Dependent Claim
30 words
A process for modifying a hierarchical mask layout as defined in claim 1 wherein said hierarchy has at least ten levels and modifications are made to a plurality of levels.
Claim 8
Dependent Claim
38 words
A process for modifying a hierarchical mask layout as defined in claim 6 wherein modifications are first made to the lowest level in said hierarchy to which changes are necessary and are then made to successively higher levels.
Claim 9
Dependent Claim
85 words
A process for modifying a hierarchical mask layout comprising: obtaining a binary mask layout design having cells that are arranged in a hierarchy having a plurality of levels; creating modifications to cells in a first level of said hierarchy; placing modifications that are uniform to all similar cells in said first level in said first level in said hierarchy; and placing modifications that apply only to selected cells of a group of similar cells in said first level in a second level in said hierarchy.
Claim 10
Dependent Claim
85 words
A process for modifying a hierarchical mask layout comprising: obtaining a binary mask layout design having cells that are arranged in a hierarchy having a plurality of levels; creating modifications to cells in a first level of said hierarchy; placing modifications that are uniform to all similar cells in said first level in said first level in said hierarchy; and placing modifications that apply only to selected cells of a group of similar cells in said first level in a second level in said hierarchy.
Claim 11
Dependent Claim
26 words
A process for modifying a hierarchical mask layout as defined in claim 8 wherein said second level is higher in said hierarchy than said first level.
Claim 12
Dependent Claim
22 words
A process for modifying a hierarchical mask layout as defined in claim 9 wherein said second level is the next higher level.
Claim 13
Dependent Claim
21 words
A process for modifying a hierarchical mask layout as defined in claim 8 wherein said modifications comprise optical proximity effect corrections.
Claim 14
Dependent Claim
20 words
A process for modifying a hierarchical mask layout as defined in claim 8 wherein said modifications comprise phase shifting layers.
Claim 15
Dependent Claim
23 words
A process for modifying a hierarchical mask layout as defined in claim 8 wherein modifications are sequentially made in a plurality of levels.
Claim 16
Dependent Claim
89 words
A hierarchical mask layout comprising: a mask layout design that has been arranged in a hierarchy having a plurality of levels wherein elements in a first level of said hierarchy include changes made to a binary mask design upon which said mask layout is based, said changes in said first level being uniform to all corresponding elements throughout said first level and having modifications in a second level in said hierarchy, said modifications in said second level including modifications that apply only to selected elements in said first level.
Claim 17
Dependent Claim
89 words
A hierarchical mask layout comprising: a mask layout design that has been arranged in a hierarchy having a plurality of levels wherein elements in a first level of said hierarchy include changes made to a binary mask design upon which said mask layout is based, said changes in said first level being uniform to all corresponding elements throughout said first level and having modifications in a second level in said hierarchy, said modifications in said second level including modifications that apply only to selected elements in said first level.
Claim 18
Dependent Claim
24 words
A hierarchical mask layout as defined in claim 14 wherein said second level is a higher level in said hierarchy than said first level.
Claim 19
Dependent Claim
17 words
A hierarchical mask layout as defined in claim 14 wherein said modifications comprise optical proximity effect corrections.
Claim 20
Dependent Claim
16 words
A hierarchical mask layout as defined in claim 14 wherein said modifications comprise phase shifting layers.
Claim 21
Dependent Claim
27 words
A hierarchical mask layout as defined in claim 14 wherein said hierarchy has at least ten levels and modifications are made to a plurality of said levels.
Claim 22
Dependent Claim
89 words
A hierarchical mask layout comprising: a mask layout design that has been arranged in a hierarchy having a plurality of levels wherein cells in a first level of said hierarchy include changes made to a binary mask design upon which said mask layout is based, said changes in said first level being uniform to all corresponding cells throughout said first level and having modifications in a second level in said hierarchy, said modifications in said second level including modifications that apply only to selected cells in said first level.
Claim 23
Dependent Claim
89 words
A hierarchical mask layout comprising: a mask layout design that has been arranged in a hierarchy having a plurality of levels wherein cells in a first level of said hierarchy include changes made to a binary mask design upon which said mask layout is based, said changes in said first level being uniform to all corresponding cells throughout said first level and having modifications in a second level in said hierarchy, said modifications in said second level including modifications that apply only to selected cells in said first level.
Claim 24
Dependent Claim
25 words
A hierarchical mask layout as defined in claim 19 wherein said second level is the next higher level than said first level in the hierarchy.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-22 | 2002-09-21 | 2003-03-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-22 | 2006-09-21 | 2007-03-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-22 | 2010-09-21 | 2011-03-23 | $7700.00 | Window Closed / Lapsed |