Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
99 words
An electrostatic discharge protection circuit for use in an integrated circuit having bond pads and internal circuitry on a substrate for operation of the integrated circuit, the electrostatic discharge protection circuit comprising: a latchable circuit fabricated on said substrate and connected to a first said bond pad; and field effect transistors having connections to a second said bond pad, the field effect transistors located in proximity to said latchable circuit so that upon occurrence of an electrostatic discharge event the field effect transistors inject current into the substrate to latch said latchable circuit and thereby protect said integrated circuit.
Claim 2
Dependent Claim
99 words
An electrostatic discharge protection circuit for use in an integrated circuit having bond pads and internal circuitry on a substrate for operation of the integrated circuit, the electrostatic discharge protection circuit comprising: a latchable circuit fabricated on said substrate and connected to a first said bond pad; and field effect transistors having connections to a second said bond pad, the field effect transistors located in proximity to said latchable circuit so that upon occurrence of an electrostatic discharge event the field effect transistors inject current into the substrate to latch said latchable circuit and thereby protect said integrated circuit.
Claim 3
Dependent Claim
28 words
The circuit of claim 1 wherein said latchable circuit comprises an SCR circuit and said field effect transistors have respective resistive connections to the first said bond pad.
Claim 4
Dependent Claim
54 words
The circuit of claim 1 wherein each of the field effect transistors has a gate and first and second semiconductive regions, the first region resisitively connected to said latchable circuit, and the second region connected to said second bond pad, the field effect transistors operative to trigger the latchable circuit for electrostatic discharge protection.
Claim 5
Dependent Claim
40 words
The circuit of claim 3 wherein the gate of each of the field effect transistors is connected to a signal line, whereby the field effect transistors act together as an output buffer and as a trigger for the latchable circuit.
Claim 6
Dependent Claim
26 words
The circuit of claim 3 wherein the resistive connection of the first region of each of the field effect transistors is to the first bond pad.
Claim 7
Dependent Claim
125 words
A semiconductor device comprising: a semiconductor substrate of a first conductivity type; a tank region of a second conductivity type formed within said substrate; a first doped region of said second conductivity type formed within said tank region; a second doped region of said first conductivity type formed within said tank region adjacent said first doped region; a third doped region of said second conductivity type formed within said tank region spaced from said second doped region; and field effect transistors formed within said substrate spaced from said tank region, each of said field effect transistors comprising first and second source/drain regions of said second conductivity type spaced by a channel region wherein said first source/drain regions are resistively coupled to said third doped region.
Claim 8
Dependent Claim
125 words
A semiconductor device comprising: a semiconductor substrate of a first conductivity type; a tank region of a second conductivity type formed within said substrate; a first doped region of said second conductivity type formed within said tank region; a second doped region of said first conductivity type formed within said tank region adjacent said first doped region; a third doped region of said second conductivity type formed within said tank region spaced from said second doped region; and field effect transistors formed within said substrate spaced from said tank region, each of said field effect transistors comprising first and second source/drain regions of said second conductivity type spaced by a channel region wherein said first source/drain regions are resistively coupled to said third doped region.