US4302875A
Expired / Lapsed
US
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Complementary MOSFET device and method of manufacturing the same
Assignee: Toshiba Corp
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Filing: 1979-05-23
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Granted: 1981-12-01
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Expires: 1999-05-23
Abstract
Abstract A CMOS device comprising an N type semiconductor substrate, a P type well region diffused in the substrate, an n-channel MOS transistor formed in the P type well region, and a p-channel MOS transistor formed in the N type semiconductor substrate, and a method for manufacturing the CMOS device. In case the CMOS device serves as a CMOS inverter, the source region of the p-channel MOS transistor, the semiconductor substrate and the well layer constitute a parasitic PNP type bipolar transistor, and the source region of the n-channel MOS transistor, the well layer and the semiconductor substrate constitute a parasitic NPN type bipolar transistor. The product of the current amplification factor β 1 of the PNP type bipolar transistor and the current amplification factor β 2 of the NPN type bipolar transistor is smaller than 1.
Inventors
- 👤 Kazuo Satou
- 👤 Mitsuhiko Ueno
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 02:37
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/80; H10D62/83; H10D62/834; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/0165; H10D84/02; H10D84/03; H10D84/038; H10D84/80; H10D84/82; H10D84/83; H10D84/85; H10D84/854; H10P; H10P95/00; H10P95/90
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
156 words
A method of manufacturing a semiconductor device comprising the steps of forming a semiconductor substrate of one conductivity type; forming a well layer of the opposite conductivity type in said semiconductor substrate; forming a first MOS transistor of one channel type comprising first drain and source regions in said substrate outside said well layer; forming a second MOS transistor of opposite channel type comprising second drain and source regions in said well layer, said substrate and said well layer respectively constituting, in the presence of impulse noise, the base region of first and second lateral parasitic bipolar transistors and the base region of first and second vertical parasitic bipolar transistors; and gold doping and semiconductor substrate sufficiently to assure that the product of the current amplification factors B 1 of at least one of said lateral parasitic bipolar transistors and B 2 of at least one of said vertical parasitic bipolar transistors is smaller than 1.
Claim 2
Independent Claim
156 words
A method of manufacturing a semiconductor device comprising the steps of forming a semiconductor substrate of one conductivity type; forming a well layer of the opposite conductivity type in said semiconductor substrate; forming a first MOS transistor of one channel type comprising first drain and source regions in said substrate outside said well layer; forming a second MOS transistor of opposite channel type comprising second drain and source regions in said well layer, said substrate and said well layer respectively constituting, in the presence of impulse noise, the base region of first and second lateral parasitic bipolar transistors and the base region of first and second vertical parasitic bipolar transistors; and gold doping and semiconductor substrate sufficiently to assure that the product of the current amplification factors B 1 of at least one of said lateral parasitic bipolar transistors and B 2 of at least one of said vertical parasitic bipolar transistors is smaller than 1.
Claim 3
Independent Claim
178 words
A method of manufacturing a semiconductor device comprising the steps of forming a semiconductor substrate of one conductivity type; forming a well layer of the opposite conductivity type in said semiconductor substrate; forming a first MOS transistor of one channel type comprising first drain and source regions in said substrate outside said well layer; forming a second MOS transistor of opposite channel type comprising second drain and source regions in said well layer, said substrate and said well layer respectively constituting, in the presence of impulse noise, the base region of first and second lateral parasitic bipolar transistors and the base region of first and second vertical parasitic bipolar transistors; and heating said semiconductor substrate in an inert atmosphere and cooling said substrate rapidly, after gate oxide films of said first and second MOS transistors have been formed, sufficiently to assure that the product of the current amplification factors B 1 of at least one of said lateral parasitic bipolar transistors and B 2 of at least one of said vertical parasitic bipolar transistors is smaller than 1.
Claim 4
Independent Claim
178 words
A method of manufacturing a semiconductor device comprising the steps of forming a semiconductor substrate of one conductivity type; forming a well layer of the opposite conductivity type in said semiconductor substrate; forming a first MOS transistor of one channel type comprising first drain and source regions in said substrate outside said well layer; forming a second MOS transistor of opposite channel type comprising second drain and source regions in said well layer, said substrate and said well layer respectively constituting, in the presence of impulse noise, the base region of first and second lateral parasitic bipolar transistors and the base region of first and second vertical parasitic bipolar transistors; and heating said semiconductor substrate in an inert atmosphere and cooling said substrate rapidly, after gate oxide films of said first and second MOS transistors have been formed, sufficiently to assure that the product of the current amplification factors B 1 of at least one of said lateral parasitic bipolar transistors and B 2 of at least one of said vertical parasitic bipolar transistors is smaller than 1.
Claim 5
Independent Claim
182 words
A method of manufacturing a semiconductor device comprising the steps of forming a semiconductor substrate of one conductivity type; forming a well layer of the opposite conductivity type in said semiconductor substrate; forming a first MOS transistor of one channel type comprising first drain and source regions in said substrate outside said well layer; forming a second MOS transistor of opposite channel type comprising second drain and source regions in said well layer, said substrate and said well layer respectively constituting, in the presence of impulse noise, the base region of first and second lateral parasitic bipolar transistors and the base region of first and second vertical parasitic bipolar transistors; and heating during the formation of said semiconductor substrate, a semiconductor wafer from which said substrate is formed to 1050° C. to 1150° C. so as to adjust the resistivity of said wafer to assure that the product of the current amplification factors B 1 of at least one of said lateral parasitic bipolar transistors and B 2 of at least one of said vertical parasitic bipolar transistors is smaller than 1.
Claim 6
Independent Claim
182 words
A method of manufacturing a semiconductor device comprising the steps of forming a semiconductor substrate of one conductivity type; forming a well layer of the opposite conductivity type in said semiconductor substrate; forming a first MOS transistor of one channel type comprising first drain and source regions in said substrate outside said well layer; forming a second MOS transistor of opposite channel type comprising second drain and source regions in said well layer, said substrate and said well layer respectively constituting, in the presence of impulse noise, the base region of first and second lateral parasitic bipolar transistors and the base region of first and second vertical parasitic bipolar transistors; and heating during the formation of said semiconductor substrate, a semiconductor wafer from which said substrate is formed to 1050° C. to 1150° C. so as to adjust the resistivity of said wafer to assure that the product of the current amplification factors B 1 of at least one of said lateral parasitic bipolar transistors and B 2 of at least one of said vertical parasitic bipolar transistors is smaller than 1.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1984-11-30 | 1985-06-01 | 1985-12-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-11-30 | 1989-06-01 | 1989-12-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-11-30 | 1993-06-01 | 1993-12-01 | $7700.00 | Window Closed / Lapsed |