Abstract Techniques of forming a flash EEPROM cell array with the size of individual cells being reduced, thereby increasing the number of cells which may be formed on a semiconductor substrate of a given size. Use of dielectric spacers in several steps of the process controls areas being etched or implanted with ions to something smaller than can be obtained by the highest resolution photolithography. Both split-channel and non-split-channel (no select transistor) types of memory cells are included. Example cells employ three polysilicon layers, having separate floating, control and erase gates. A technique of forming the memory cell gates with greater uniformity of conductivity level includes depositing undoped polysilicon and then using ion implantation to introduce the dopant. Field oxide is formed at an early stage in the process by CVD deposition and dry etching. The memory cell array and adjacent peripheral components are formed in a coordinated manner on a single integrated circuit chip.
A method of patterning both of first and second polysilicon layers deposited on a semiconductor substrate with an insulating layer therebetween, comprising the steps of: depositing a dielectric layer on the second polysilicon layer, anisotropically etching the dielectric layer in a pattern, thereby forming openings therein with sidewalls substantially perpendicular to an upper surface of the second polysilicon layer, forming first dielectric spacers along the sidewalls of the dielectric layer, thereby to reduce a size of the openings therein, etching the second polysilicon layer through the reduced size openings of the dielectric layer, thereby forming openings in the second polysilicon layer which have sidewalls, forming second dielectric spacers over the first spacers and along the sidewalls of the openings in the second polysilicon layer, thereby to reduce a size of the openings in the second polysilicon layer, and etching the first polysilicon layer through the reduced size openings in the second polysilicon layer.
Claim 2
Independent Claim
153 words
A method of patterning both of first and second polysilicon layers deposited on a semiconductor substrate with an insulating layer therebetween, comprising the steps of: depositing a dielectric layer on the second polysilicon layer, anisotropically etching the dielectric layer in a pattern, thereby forming openings therein with sidewalls substantially perpendicular to an upper surface of the second polysilicon layer, forming first dielectric spacers along the sidewalls of the dielectric layer, thereby to reduce a size of the openings therein, etching the second polysilicon layer through the reduced size openings of the dielectric layer, thereby forming openings in the second polysilicon layer which have sidewalls, forming second dielectric spacers over the first spacers and along the sidewalls of the openings in the second polysilicon layer, thereby to reduce a size of the openings in the second polysilicon layer, and etching the first polysilicon layer through the reduced size openings in the second polysilicon layer.