US5641703A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Voltage programmable links for integrated circuits
Assignee: Massachusetts Institute of Technology
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Filing: 1995-04-28
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Granted: 1997-06-24
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Expires: 2015-04-28
Abstract
Abstract Methods and systems are discussed for fabricating electrically programmable link structures by fabricating a first metal conductor of a refractory conductive material, composite, or an aluminum alloy which has been modified with a refractory material, then fabricating an insulating link material over the first conductor, and subsequently, depositing a second conductor over the link material. In use, an electrical path can be formed between the first and second conductors by applying a voltage between such conductors across at least one selected region of the insulator, such that the insulating link material is transformed in the region and rendered conductive to form an electrical signal path.
Inventors
- 👤 Simon S. Cohen
- 👤 Jack I. Raffel
- 👤 Peter W. Wyatt
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 05:20
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/49; H10W20/491
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
155 words
A method of producing an antifuse link in an integrated circuit structure, the method comprising: depositing a lower conductive element; depositing a transformable insulator material over the lower conductive element, the transformable insulator being transformable by a programming voltage of less than 15 volts to form a direct conductive path therethrough; depositing an upper conductive layer over the insulator material and patterning said upper conductive layer to leave conductive regions over regions of transformable insulator material, the transformable insulator material being substantially wider than regions where interlayer link openings are to be formed; depositing a thicker insulator layer over the upper conductive layer and etching the insulator away to form said interlayer link openings, whereby the upper conductive layer serves as an etch stop to preserve the transformable insulator beneath the conductive regions of the upper conductive layer; and depositing an additional conductive material in said interlayer link openings to provide an upper conductive element.
Claim 2
Independent Claim
155 words
A method of producing an antifuse link in an integrated circuit structure, the method comprising: depositing a lower conductive element; depositing a transformable insulator material over the lower conductive element, the transformable insulator being transformable by a programming voltage of less than 15 volts to form a direct conductive path therethrough; depositing an upper conductive layer over the insulator material and patterning said upper conductive layer to leave conductive regions over regions of transformable insulator material, the transformable insulator material being substantially wider than regions where interlayer link openings are to be formed; depositing a thicker insulator layer over the upper conductive layer and etching the insulator away to form said interlayer link openings, whereby the upper conductive layer serves as an etch stop to preserve the transformable insulator beneath the conductive regions of the upper conductive layer; and depositing an additional conductive material in said interlayer link openings to provide an upper conductive element.
Claim 3
Dependent Claim
32 words
The method of claim 1 wherein the step of depositing a lower conductive element comprises depositing a non-refractory conductive material followed by depositing a refractory conductive material over said non-refractory conductive material.
Claim 4
Dependent Claim
24 words
The method of claim 2 wherein the method further comprises the step of sintering following the deposition of said non-refractory and refractory conductive materials.
Claim 5
Dependent Claim
22 words
The method of claim 2 further comprising the step of forming an intermetallic compound near a boundary of said non-refractory conductive material.
Claim 6
Dependent Claim
24 words
The method of claim 4 wherein the step of forming an intermetallic compound is followed by removing a portion of said refractory conductive material.
Claim 7
Dependent Claim
31 words
The method of claim 2 wherein the step of depositing a refractory conducive material further comprises depositing a refractory conductive material having a thickness of not more than about 50 nanometers.
Claim 8
Dependent Claim
11 words
The method of claim 2 wherein said non-refractory material comprises aluminum.
Claim 9
Dependent Claim
37 words
The method of claim 1 wherein the step of depositing a lower conductive element further comprises depositing a material chosen from the group consisting of refractory metals, refractory metal alloys, refractory metal silicides, and refractory metal nitrides.
Claim 10
Dependent Claim
22 words
The method of claim 1 wherein the refractory material comprises a refractory material selected from the group of titanium, molybdenum, and tungsten.
Claim 11
Dependent Claim
11 words
The method of claim 9 wherein the refractory material comprises titanium.
Claim 12
Dependent Claim
11 words
The method of claim 9 wherein the refractory material comprises molybdenum.
Claim 13
Dependent Claim
31 words
The method of claim 1 wherein the step of depositing a refractory material further comprises depositing a refractory material having a thermal coefficient of expansion less than about 10.0×10 -6 /°C.
Claim 14
Dependent Claim
24 words
The method of claim 1 wherein the method further comprises coating the lower conductive element with a thin layer of a non-refractory conductive material.
Claim 15
Dependent Claim
12 words
The method of claim 13 wherein the non-refractory conductive layer is aluminum.
Claim 16
Dependent Claim
12 words
The method of claim 13 wherein the non-refractory conductive layer is silicon.
Claim 17
Dependent Claim
32 words
The method of claim 1 wherein the step of fabricating a lower conductive element comprises depositing a non-refractory conductive material followed by implanting ions of a refractory material into said non-refractory material.
Claim 18
Dependent Claim
34 words
The method of claim 1 wherein the step of depositing a transformable insulator material further comprises depositing a multi-layer structure comprising at least one silicon oxide layer, and at least one silicon nitride layer.
Claim 19
Dependent Claim
20 words
The method of claim 17 wherein the thickness of the oxide layer ranges from about 3 to about 30 nanometers.
Claim 20
Dependent Claim
19 words
The method of claim 17 wherein the thickness of each layer ranges from about 3 to about 30 nanometers.
Claim 21
Dependent Claim
12 words
The method of claim 17 wherein the silicon nitride layer is silicon-rich.
Claim 22
Dependent Claim
26 words
The method of claim 20 wherein the nitride is a composition according to the formula SiN y where y ranges from about 0.3 to about 1.3.
Claim 23
Dependent Claim
12 words
The method of claim 17 wherein the silicon oxide layer is silicon-rich.
Claim 24
Dependent Claim
26 words
The method of claim 22 wherein the oxide is a composition according to the formula SiO x where x ranges from about 1.5 to about 2.0.
Claim 25
Dependent Claim
31 words
The method of claim 1 wherein the method further comprises after the depositing steps the step of heat-treating the integrated circuit structure to establish a breakdown voltage for said transformable insulator.
Claim 26
Dependent Claim
31 words
The method of claim 24 wherein the step of heat-treating comprises sintering the integrated circuit structure to alter the insulator and thereby lower the voltage necessary to create the conductive path.
Claim 27
Dependent Claim
20 words
The method of claim 1 wherein the step of depositing an upper conductive element further comprises depositing an aluminum material.
Claim 28
Dependent Claim
20 words
The method of claim 1 wherein the step of depositing an upper conductive element further comprises depositing a refractory material.
Claim 29
Dependent Claim
43 words
The method of claim 1 wherein the upper conductive layer is a thin metal layer, and the method further comprises the step of sintering to fuse the thin metal layer initially deposited with the additional conductive material deposited above said thin metal layer.
Claim 30
Independent Claim
175 words
A method of producing an interlayer conductive path in an integrated circuit structure, the method comprising: depositing a lower conductive element; depositing a transformable insulator material over the lower conductive element, the transformable insulator being transformable by a programming voltage to form a direct conductive path therethrough; depositing an upper conductive layer above the transformable insulator material and patterning the upper conductive layer to define regions over regions of transformable insulator material, the transformable insulator material being substantially wider than regions where interlayer link openings are to be formed; depositing an insulator layer over the upper conductive layer and etching the insulator away to form said interlayer link openings, the upper conductive layer serving as an etch stop to preserve the transformable insulator beneath the upper conductive layer; depositing an additional conductive material in the etched region to provide an upper conductive element; and applying a voltage between the upper and lower conductive elements across the transformable insulator material such that at least one conductive path is formed between the upper and lower conductive elements.
Claim 31
Independent Claim
175 words
A method of producing an interlayer conductive path in an integrated circuit structure, the method comprising: depositing a lower conductive element; depositing a transformable insulator material over the lower conductive element, the transformable insulator being transformable by a programming voltage to form a direct conductive path therethrough; depositing an upper conductive layer above the transformable insulator material and patterning the upper conductive layer to define regions over regions of transformable insulator material, the transformable insulator material being substantially wider than regions where interlayer link openings are to be formed; depositing an insulator layer over the upper conductive layer and etching the insulator away to form said interlayer link openings, the upper conductive layer serving as an etch stop to preserve the transformable insulator beneath the upper conductive layer; depositing an additional conductive material in the etched region to provide an upper conductive element; and applying a voltage between the upper and lower conductive elements across the transformable insulator material such that at least one conductive path is formed between the upper and lower conductive elements.
Claim 32
Dependent Claim
29 words
A method as claimed in claim 29 wherein the upper conductive layer is patterned by removing the upper conductive layer except in regions where an interlayer link is desired.
Claim 33
Dependent Claim
14 words
A method as claimed in claim 29 wherein the upper conductive layer is aluminium.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-06-23 | 2000-12-23 | 2001-06-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-06-23 | 2004-12-23 | 2005-06-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-06-23 | 2008-12-23 | 2009-06-24 | $7700.00 | Window Closed / Lapsed |