Postive working multi-level photoresist

Claim 2

A process for preparing a positive photoresist image using a portable conformable mask which consists essentially of in order: (a) forming a first photosensitive composition which consists essentially of (i) from about 1% to about 25% based on the weight of the solid parts of the composition of a photosensitive compound having the formula ##STR40## wherein R 1 =1, 2-benzoquinone-2-diazide-4-sulfonyl; 1,2-naphthoquinone-2-diazide-4-sulfonyl; or 1,2-anthraquinone-2-diazide-4-sulfonyl R 2 =R, R 7 , OR 6 or ##STR41## R 3 =H, R 7 , OR 6 or ##STR42## R 4 =H, R 7 , OR 6 or ##STR43## R 6 =H, alkyl, aryl, aralkyl or R 1 R 7 =alkyl, aryl or aralkyl (ii) from about 75% to about 99% based on the weight of the solid parts of the composition of a novolak, and/or polyvinyl phenol resin; and (iii) from about 0.5% to about 20% based on the weight of the solid parts of said composition of a crosslinking compound which, when in the presence of that amount and strength of the acid generated when said diazide is exposed to actinic radiation, is capable of crosslinking said resin under the application of the heating conditions of step (d); and (iv) sufficient solvent to dissolve the foregoing composition components; and (b) coating said first composition on a suitable substrate; and (c) heat treating said coated substrate at a temperature of from about 20? C. to about 100? C. until enough of said solvent is dried off to render it non-tacky; and (d) non-imagewise exposing said composition overall to sufficient actinic ultraviolet radiation and sufficient heat to partially cross-link said composition while substantially retaining its photosensitivity; and (e) coating said first photosensitive composition directly with a second photosensitive composition comprising an o-quinone diazied, a dye which absorbs at the exposure wavelength of step (g) such that transmission through the second photosensitive composition at step (g) is about 1% or less, and a novolak and/or polyvinyl phenol resin, wherein said first photosensitive composition and said second photosensitive composition are reactive to ultraviolet radiation at substantially different wavelengths; and, (f) imagewise exposing said second photosensitive composition to actinic ultraviolet radiation and developing with an aqueous alkaline solution to form an image mask; and (g) exposing said first photosensitive composition to actinic ultraviolet radiation at a wavelength different from step (f) through said image mask and developing with an aqueous alkaline solution to remove the exposed portion of said first photosensitive composition.

Claim 3

The process of claim 1 wherein the photosensitizer in said first photosensitive composition is 2, 3, 4-trihydroxybenzophenone-1, 2-naphthoquinone-2-diazide-4-sulfonic acid trisester.

Claim 4

The process of claim 1 wherein said crosslinker is dimethylol paracresol.

Claim 5

The process of claim 1 wherein said crosslinker is methyl methoxy diphenyl ether.

Claim 6

The process of claim 1 wherein said crosslinker is an melamine formaldehyde compound or any of its alkylated analogues.

Claim 7

The process of claim 1 wherein said crosslinker is a resole resin or an epoxy cresol novolak resin.

Claim 8

The process of claim 1 wherein said solvent in said first photosensitive composition comprises propylene glycol alkyl ether acetate.

Claim 9

The process of claim 1 wherein said substrate is selected from the group consisting of silicon, aluminum or polymeric resins, silicon dioxide, doped silicon dioxide, silicon nitride, tantalum, copper, polysilicon, ceramics and aluminum/copper mixtures.

Claim 10

The process of claim 1 wherein each of said first and said second photosensitive compositions further comprises one or more compounds selected from the group consisting of colorants, dyes, anti-striation agents, solvents, leveling agents, plasticizers, adhesion promoters, speed enhancers, and surfactants.

Claim 11

The process of claim 1 wherein said developer is an aqueous alkaline solution.

Claim 12

The process of claim 10 wherein said developer comprises sodium hydroxide and/or tetramethylammonium hydroxide.

Claim 13

The process of claim 1 wherein said resin is a novolak, said crosslinker comprises dimethylol paracresol, said exposure of step (d) is from about 5mJ/cm 2 to about 40mJ/cm 2 and said heat treatment of step (d) is conducted at a temperature of from about 90° C. to about 160° C., and said developer comprises an aqueous solution of sodium hydroxide and/or tetramethyl ammonium hydroxide.

Claim 14

The process of claim 2 wherein said resin is a novolak, said crosslinker comprises dimethylol paracresol, said exposure of step (d) is from about 5mJ/cm 2 to about 40mJ/cm 2 and said heat treatment of step (d) is conducted at a temperature of from about 90° C. to about 160° C., and said developer comprises an aqueous solution of sodium hydroxide and/or tetramethyl ammonium hydroxide.

Claim 15

A process of claim 1 wherein said composition in step (d) is not exposed to actinic radiation.

Claim 16

A process for preparing a positive working-photographic element which comprises in order: (a) forming a first photosensitive composition which comprises (i) from about 1% to about 25% based on the weight of the solid parts of the composition of a photosensitive compound represented by the general formulae (1), (2) or (3): ##STR44## wherein R is H, --X--R b or ##STR45## X is a single C--C bond, --O--, --S--, --SO 2 --, ##STR46## n is 1 or 2, R a is H, --OH, --OY, --OZ, halogen or lower alkyl, with at least one R a radical being --OY and at least one thereof being --OZ, R b is H, alkyl, aryl, substituted alkyl, or substituted aryl; ##STR47## wherein R 1 is H, or ##STR48## R c is H, --OH, --OY or --OZ, with at least one R c radical being --OY and at least one thereof being --OZ; and ##STR49## wherein R 2 is H, alkyl, aryl, substituted alkyl, or substituted aryl, R d is --OH, --OY or --OZ with at least one R d radical being --OY and at least one thereof being --OZ; wherein Y is 1, 2-naphthoquinonediazide-4-sulfonyl and Z is 1,2-naphthoquinone-diazide-5-sulfonyl or an organic acid halide represented by the formula 'W--R 3 , where W is ##STR50## or --SO 2 --, and R 3 is alkyl, aryl, substituted alkyl or substituted aryl wherein the amount of diazo and/or organic acid reacted with said phenolic compound being sufficient to produce a photosensitizer composition capable of inhibiting the dissolution rate of an alkali soluable resin in alkaline developing solution; (ii) from about 75% to about 99% based on the weight of the solid parts of the composition of a novolak, and/or polyvinyl phenol resin; and (iii) from about 0.5% to about 20% based on the weight of the solid parts of said composition of a crosslinking compound which, when in the presence of that amount and strength of the acid generated when said diazide is exposed actinic radiation, is capable of crosslinking said resin under the application of the heating conditions of step (d); and (iv) sufficient solvent to dissolve the foregoing composition components; and (b) coating said first composition on a suitable substrate; and (c) heat treating said coated substrate at a temperate of from about 20° C. to about 100° C. until enough of said solvent is dried off to render it non-tacky; and (d) non-imagewise exposing said composition overall to sufficient actinic ultraviolet radiation and sufficient heat to partially cross-link said composition while substantially retaining its photosensitivity; and (e) coating said first photosensitive composition directly with a second photosensitive composition comprising an o-quinone diazide, a dye which absorbs at the exposure wavelength of step (g) such that transmission through the second photosensitive composition at step (g) is about 1% or less, and a novolak and/or polyvinyl phenol resin, wherein said first photosensitive composition and said second photosensitive composition are reactive to ultraviolet radiation at substantially different wavelengths; and, (f) imagewise exposing said second photosensitive composition to actinic ultraviolet radiation and developing with an aqueous alkaline solution to form an image mask; and (g) exposing said first photosensitive composition to actinic ultraviolet radiation at a wavelength different from step (f) through said image mask and developing with an aqueous alkaline solution to remove the exposed portion of said first photosenstive composition.

Claim 17

A process for preparing a positive working-photographic element which comprises in order: (a) forming a first photosensitive composition which comprises (i) from about 1% to about 25% based on the weight of the solid parts of the composition of a photosensitive compound represented by the general formulae (1), (2) or (3): ##STR44## wherein R is H, --X--R b or ##STR45## X is a single C--C bond, --O--, --S--, --SO 2 --, ##STR46## n is 1 or 2, R a is H, --OH, --OY, --OZ, halogen or lower alkyl, with at least one R a radical being --OY and at least one thereof being --OZ, R b is H, alkyl, aryl, substituted alkyl, or substituted aryl; ##STR47## wherein R 1 is H, or ##STR48## R c is H, --OH, --OY or --OZ, with at least one R c radical being --OY and at least one thereof being --OZ; and ##STR49## wherein R 2 is H, alkyl, aryl, substituted alkyl, or substituted aryl, R d is --OH, --OY or --OZ with at least one R d radical being --OY and at least one thereof being --OZ; wherein Y is 1, 2-naphthoquinonediazide-4-sulfonyl and Z is 1,2-naphthoquinone-diazide-5-sulfonyl or an organic acid halide represented by the formula 'W--R 3 , where W is ##STR50## or --SO 2 --, and R 3 is alkyl, aryl, substituted alkyl or substituted aryl wherein the amount of diazo and/or organic acid reacted with said phenolic compound being sufficient to produce a photosensitizer composition capable of inhibiting the dissolution rate of an alkali soluable resin in alkaline developing solution; (ii) from about 75% to about 99% based on the weight of the solid parts of the composition of a novolak, and/or polyvinyl phenol resin; and (iii) from about 0.5% to about 20% based on the weight of the solid parts of said composition of a crosslinking compound which, when in the presence of that amount and strength of the acid generated when said diazide is exposed actinic radiation, is capable of crosslinking said resin under the application of the heating conditions of step (d); and (iv) sufficient solvent to dissolve the foregoing composition components; and (b) coating said first composition on a suitable substrate; and (c) heat treating said coated substrate at a temperate of from about 20° C. to about 100° C. until enough of said solvent is dried off to render it non-tacky; and (d) non-imagewise exposing said composition overall to sufficient actinic ultraviolet radiation and sufficient heat to partially cross-link said composition while substantially retaining its photosensitivity; and (e) coating said first photosensitive composition directly with a second photosensitive composition comprising an o-quinone diazide, a dye which absorbs at the exposure wavelength of step (g) such that transmission through the second photosensitive composition at step (g) is about 1% or less, and a novolak and/or polyvinyl phenol resin, wherein said first photosensitive composition and said second photosensitive composition are reactive to ultraviolet radiation at substantially different wavelengths; and, (f) imagewise exposing said second photosensitive composition to actinic ultraviolet radiation and developing with an aqueous alkaline solution to form an image mask; and (g) exposing said first photosensitive composition to actinic ultraviolet radiation at a wavelength different from step (f) through said image mask and developing with an aqueous alkaline solution to remove the exposed portion of said first photosenstive composition.

Claim 18

A process for preparing a positive photoresist image using a portable conformable mask which consists essentially of in order: (a) forming a first photosensitive composition which consists essentially of (i) from about 1% to about 25% based on the weight of the solid parts of the composition of a component comprising the condensation product of: (I) a phenolic compound selected from the group consisting of: ##STR51## wherein R is H, --X--R b , or ##STR52## R a is H, --OH, halogen or lower alkyl, with at least two and not greater than six R a radicals being --OH, X is a single C--C bond, --O--, --S--, --SO 2 ', ##STR53## n is 1 or 2, R b is H, alkyl, aryl, substituted alkyl or substituted aryl; ##STR54## wherein R 1 is H or ##STR55## R c is H or --OH with at least two Rc radicals being --OH; and ##STR56## wherein R 2 is H, alkyl, aryl, substituted alkyl, or substituted aryl; (II) a 1, 2-naphthoquinonediazide-4-sulfonic acid (diazo 1); and (III) a 1,2-naphthoquinonediazide-5-sulfonic acid (Diazo 2) and/or an organic acid halide represented by the formula: W--R.sub.3 wherein W is ##STR57## or --SO 2 --V, V is halogen, R 3 is alkyl, aryl, substituted alkyl or substituted aryl and the amount of diazo and/or organic acid reacted with said phenolic compound being sufficient to produce a photosensitizer composition capable of inhibiting the dissolution rate of an alkali soluble resin in alkaline developing solution; wherein the molar ratio of the amount of Diazo 1 reacted to the amount of Diazo 2 and/or organic acid reacted is in the range of from about 1:1 to about 39:1; (ii) from about 75% to about 99% based on the weight of the solid parts of the composition of a novolak, and/or polyvinyl phenol resin; and (iii) from about 0.5% to about 20% based on the weight of the solid parts of said composition of a crosslinking compound which, when in the presence of that amount and strength of the acid generated when said diazide is exposed to actinic radiation, is capable of crosslinking said resin under the application of the heating conditions of step (d); and (iv) sufficient solvent to dissolve the foregoing composition components; and (b) coating said first composition on a suitable substrate; and (c) heat treating said coated substrate at a temperature of from about 20° C. to about 100° C. until enough of said solvent is dried off to render it non-tacky; and (d) non-imagewise exposing said composition overall to sufficient actinic ultraviolet radiation and sufficient heat to partially cross-link said composition while substantially retaining its photosensitivity; and (e) coating said first photosensitive composition directly with a second photosenstive composition comprising an o-quinone diazide, a dye which absorbs at the exposure wavelength of step (g) such that transmission through the second photosensitive composition at step (g) is about 1% or less, and a novolak and/or polyvinyl phenol resin, wherein said first photosensitive composition and said second photosenstive composition are reactive to ultraviolet radiation at substantially different wavelengths; and, (f) imagewise exposing said second photosensitive composition to actinic ultraviolet radiation and developing with an aqueous alkaline solution to form an image mask; and (g) exposing said first photosensitive composition to actinic ultraviolet radiation at a wavelength different from step (f) through said image mask and developing with an aqueous alkaline solution to remove the exposed portion of said first photosensitive composition.

Claim 19

A process for preparing a positive photoresist image using a portable conformable mask which consists essentially of in order: (a) forming a first photosensitive composition which consists essentially of (i) from about 1% to about 25% based on the weight of the solid parts of the composition of a component comprising the condensation product of: (I) a phenolic compound selected from the group consisting of: ##STR51## wherein R is H, --X--R b , or ##STR52## R a is H, --OH, halogen or lower alkyl, with at least two and not greater than six R a radicals being --OH, X is a single C--C bond, --O--, --S--, --SO 2 ', ##STR53## n is 1 or 2, R b is H, alkyl, aryl, substituted alkyl or substituted aryl; ##STR54## wherein R 1 is H or ##STR55## R c is H or --OH with at least two Rc radicals being --OH; and ##STR56## wherein R 2 is H, alkyl, aryl, substituted alkyl, or substituted aryl; (II) a 1, 2-naphthoquinonediazide-4-sulfonic acid (diazo 1); and (III) a 1,2-naphthoquinonediazide-5-sulfonic acid (Diazo 2) and/or an organic acid halide represented by the formula: W--R.sub.3 wherein W is ##STR57## or --SO 2 --V, V is halogen, R 3 is alkyl, aryl, substituted alkyl or substituted aryl and the amount of diazo and/or organic acid reacted with said phenolic compound being sufficient to produce a photosensitizer composition capable of inhibiting the dissolution rate of an alkali soluble resin in alkaline developing solution; wherein the molar ratio of the amount of Diazo 1 reacted to the amount of Diazo 2 and/or organic acid reacted is in the range of from about 1:1 to about 39:1; (ii) from about 75% to about 99% based on the weight of the solid parts of the composition of a novolak, and/or polyvinyl phenol resin; and (iii) from about 0.5% to about 20% based on the weight of the solid parts of said composition of a crosslinking compound which, when in the presence of that amount and strength of the acid generated when said diazide is exposed to actinic radiation, is capable of crosslinking said resin under the application of the heating conditions of step (d); and (iv) sufficient solvent to dissolve the foregoing composition components; and (b) coating said first composition on a suitable substrate; and (c) heat treating said coated substrate at a temperature of from about 20° C. to about 100° C. until enough of said solvent is dried off to render it non-tacky; and (d) non-imagewise exposing said composition overall to sufficient actinic ultraviolet radiation and sufficient heat to partially cross-link said composition while substantially retaining its photosensitivity; and (e) coating said first photosensitive composition directly with a second photosenstive composition comprising an o-quinone diazide, a dye which absorbs at the exposure wavelength of step (g) such that transmission through the second photosensitive composition at step (g) is about 1% or less, and a novolak and/or polyvinyl phenol resin, wherein said first photosensitive composition and said second photosenstive composition are reactive to ultraviolet radiation at substantially different wavelengths; and, (f) imagewise exposing said second photosensitive composition to actinic ultraviolet radiation and developing with an aqueous alkaline solution to form an image mask; and (g) exposing said first photosensitive composition to actinic ultraviolet radiation at a wavelength different from step (f) through said image mask and developing with an aqueous alkaline solution to remove the exposed portion of said first photosensitive composition.