US8675174B2 — Exposure apparatus, exposure method, and method f…

Claim 1

Independent Claim 162 words

An exposure apparatus which exposes a substrate, the exposure apparatus comprising: a projection optical system by which a pattern image is projected onto the substrate through a liquid immersion area; a first support member by which the projection optical system is supported; a first nozzle member which has a liquid supply port for supplying a liquid to form the liquid immersion area; a second nozzle member which has a liquid recovery port for recovering the liquid, the second nozzle member being movable relative to the first nozzle member; a second support member by which the second nozzle member is supported; an anti-vibration device provided between the first and second support members, by which vibration is prevented from being transmitted from the second support member to the first support member; and a nozzle-adjusting system which adjusts height and/or inclination of the second nozzle member, the nozzle-adjusting system having a driving system to move the second nozzle member relative to the second support member.

Claim 2

Dependent Claim 162 words

An exposure apparatus which exposes a substrate, the exposure apparatus comprising: a projection optical system by which a pattern image is projected onto the substrate through a liquid immersion area; a first support member by which the projection optical system is supported; a first nozzle member which has a liquid supply port for supplying a liquid to form the liquid immersion area; a second nozzle member which has a liquid recovery port for recovering the liquid, the second nozzle member being movable relative to the first nozzle member; a second support member by which the second nozzle member is supported; an anti-vibration device provided between the first and second support members, by which vibration is prevented from being transmitted from the second support member to the first support member; and a nozzle-adjusting system which adjusts height and/or inclination of the second nozzle member, the nozzle-adjusting system having a driving system to move the second nozzle member relative to the second support member.

Claim 3

Dependent Claim 67 words

The exposure apparatus according to claim 1 , wherein: the second nozzle member has a lower surface which is opposed to a surface of an object; the recovery port is formed on the lower surface of the second nozzle member; and the nozzle-adjusting system adjusts a relative distance and/or a relative inclination between the lower surface of the second nozzle member and the surface of the object.

Claim 4

Dependent Claim 33 words

The exposure apparatus according to claim 2 , wherein the nozzle-adjusting system adjusts the relative distance and/or the relative inclination to maintain the relative distance and/or the relative inclination in a predetermined state.

Claim 5

Dependent Claim 66 words

The exposure apparatus according to claim 1 , wherein: the first nozzle member is formed to have an annular shape and arranged to surround the projection optical system; and the liquid immersion area is formed between a surface of an object and a lower surface of the first nozzle member and between the surface of the object and a lower surface of the projection optical system.

Claim 6

Dependent Claim 36 words

The exposure apparatus according to claim 1 , wherein: the substrate is subjected to scanning exposure while being moved in a predetermined direction, and the nozzle-adjusting system moves the second nozzle member during the scanning exposure.

Claim 7

Dependent Claim 84 words

The exposure apparatus according to claim 5 , further comprising: a focus-adjusting system which adjusts a positional relationship between a surface of the substrate and an image plane of the projection optical system, wherein: the focus-adjusting system changes one of a position and a posture of the substrate during the scanning exposure to adjust the positional relationship; and the nozzle-adjusting system moves the second nozzle member to follow a change in a surface position of the surface of the substrate during the scanning exposure.

Claim 8

Dependent Claim 35 words

The exposure apparatus according to claim 1 , wherein the nozzle-adjusting system moves the second nozzle member based on surface position information of a surface of an object arranged opposite to the second nozzle member.

Claim 9

Dependent Claim 49 words

The exposure apparatus according to claim 1 , further comprising: a detecting system which detects surface position information of a surface of an object arranged opposite to the second nozzle member, wherein: the nozzle-adjusting system moves the second nozzle member based on a detection result of the detecting system.

Claim 10

Dependent Claim 26 words

The exposure apparatus according to claim 8 , wherein: the driving system moves the second nozzle member based on the detection result of the detecting system.

Claim 11

Dependent Claim 54 words

The exposure apparatus according to claim 1 , wherein: the second nozzle member is moved by the driving system such that a predetermined relative distance and/or a predetermined relative inclination between a lower surface of the second nozzle member and a surface of an object arranged opposite to the second nozzle member are/is maintained.

Claim 12

Dependent Claim 38 words

The exposure apparatus according to claim 1 , wherein the second nozzle member has a gas supply port from which gas is supplied to a portion in the vicinity of an edge portion of the liquid immersion area.

Claim 13

Dependent Claim 31 words

The exposure apparatus according to claim 1 , wherein the recovery port is provided further outside, with respect to an optical axis of the projection optical system, than the supply port.

Claim 14

Dependent Claim 42 words

The exposure apparatus according to claim 1 , wherein: the first nozzle member is provided to surround a final portion of the projection optical system, and the second nozzle member is provided to surround an outer side of the first nozzle member.

Claim 15

Dependent Claim 29 words

The exposure apparatus according to claim 13 , wherein the first nozzle member is connected to a holding member which holds an optical element constructing the projection optical system.

Claim 16

Dependent Claim 29 words

The exposure apparatus according to claim 13 , wherein the first nozzle member is included in a holding member which holds an optical element constructing the projection optical system.

Claim 17

Dependent Claim 78 words

The exposure apparatus according to claim 1 , wherein: the first nozzle member is provided in the vicinity of a side of an image plane of the projection optical system; the second nozzle member is provided outside the first nozzle member with respect to an optical axis of the projection optical system; and the second nozzle member is supported by the second support member such that the second nozzle member is movable relative to the first nozzle member.

Claim 18

Dependent Claim 56 words

The exposure apparatus according to claim 16 , wherein: the first nozzle member is formed to have an annular shape and arranged to surround a tip portion of the projection optical system; and the second nozzle member is formed to have an annular shape and arranged to surround an outer side of the first nozzle member.

Claim 19

Dependent Claim 29 words

The exposure apparatus according to claim 16 , further comprising: an anti-vibration system which prevents vibration of the second nozzle member from being transmitted to the second support member.

Claim 20

Dependent Claim 28 words

The exposure apparatus according to claim 18 , wherein the anti-vibration system prevents the vibration of the second nozzle member from being transmitted to the projection optical system.

Claim 21

Dependent Claim 33 words

The exposure apparatus according to claim 18 , wherein the anti-vibration system includes a passive anti-vibration system which passively performs vibration-prevention for the second nozzle member with respect to the second support member.

Claim 22

Dependent Claim 70 words

The exposure apparatus according to claim 16 , further comprising: a holding member which holds a first optical element which is included in a plurality of optical elements constructing the projection optical system and which is arranged at a position closest to the image plane of the projection optical system, wherein: the first nozzle member is connected to the holding member and integrated with the holding member as one body.

Claim 23

Dependent Claim 72 words

The exposure apparatus according to claim 16 , wherein: the projection optical system includes a first optical element which is arranged at a position closest to the image plane of the projection optical system; the first nozzle member has a lower surface which is opposed to a surface of the substrate; and the lower surface of the first nozzle member is substantially flush with a lower surface of the first optical element.

Claim 24

Dependent Claim 23 words

The exposure apparatus according to claim 22 , wherein the supply port is provided on the lower surface of the first nozzle member.

Claim 25

Dependent Claim 31 words

The exposure apparatus according to claim 16 , wherein a part of the liquid supplied from the supply port forms a flow of the liquid directed outwardly from the supply port.

Claim 26

Dependent Claim 77 words

The exposure apparatus according to claim 16 , wherein: the first nozzle member is provided to surround a first optical element which is included in a plurality of optical elements constructing the projection optical system and which is arranged at a position closest to the image plane of the projection optical system; and a seal member is provided to suppress inflow of the liquid into a gap between the first nozzle member and the first optical element.

Claim 27

Dependent Claim 38 words

The exposure apparatus according to claim 1 , wherein the second nozzle member has a gas supply port which is provided further outside, with respect to an optical axis of the projection optical system, than the recovery port.

Claim 28

Dependent Claim 39 words

The exposure apparatus according to claim 26 , wherein the second nozzle member has a gas suction port that is provided further outside, with respect to the optical axis of the projection optical system, than the gas supply port.

Claim 29

Dependent Claim 37 words

The exposure apparatus according to claim 1 , wherein the nozzle-adjusting system adjusts the inclination of the second nozzle member depending on a position of a surface of an object arranged opposite to the second nozzle member.

Claim 30

Dependent Claim 23 words

The exposure apparatus according to claim 1 , wherein the nozzle-adjusting system adjusts the inclination and a position of the second nozzle member.

Claim 31

Dependent Claim 26 words

The exposure apparatus according to claim 1 , wherein the height and/or inclination of the second nozzle member is adjustable independently of the first nozzle member.

Claim 32

Dependent Claim 20 words

The exposure apparatus according to claim 1 , wherein the driving device moves the second nozzle member using Lorentz force.

Claim 33

Dependent Claim 21 words

The exposure apparatus according to claim 1 , wherein the driving device has a motor to move the second nozzle member.

Claim 34

Dependent Claim 29 words

The exposure apparatus according to claim 1 , wherein the projection optical system is supported by the second support member via the first support member and the anti-vibration device.

Claim 35

Independent Claim 178 words

A method for producing a device, the method comprising: exposing a substrate, with an exposure apparatus which exposes a substrate, the exposure apparatus comprising: a projection optical system by which a pattern image is projected onto the substrate through an immersion area; a first support member by which the projection optical system is supported; a first nozzle member which has a liquid supply port for supplying a liquid to form the immersion area; a second nozzle member which has a liquid recovery port for recovering the liquid, the second nozzle member being movable relative to the first nozzle member; a second support member by which the second nozzle member is supported; an anti-vibration device provided between the first and second support members, by which vibration is prevented from being transmitted from the second support member to the first support member; and a nozzle-adjusting system which adjusts height and/or inclination of the second nozzle member, the nozzle-adjusting system having a driving system to move the second nozzle member relative to the second support member; and processing the exposed substrate.

Claim 36

Independent Claim 178 words

A method for producing a device, the method comprising: exposing a substrate, with an exposure apparatus which exposes a substrate, the exposure apparatus comprising: a projection optical system by which a pattern image is projected onto the substrate through an immersion area; a first support member by which the projection optical system is supported; a first nozzle member which has a liquid supply port for supplying a liquid to form the immersion area; a second nozzle member which has a liquid recovery port for recovering the liquid, the second nozzle member being movable relative to the first nozzle member; a second support member by which the second nozzle member is supported; an anti-vibration device provided between the first and second support members, by which vibration is prevented from being transmitted from the second support member to the first support member; and a nozzle-adjusting system which adjusts height and/or inclination of the second nozzle member, the nozzle-adjusting system having a driving system to move the second nozzle member relative to the second support member; and processing the exposed substrate.

Claim 37

Dependent Claim 36 words

The method according to claim 34 , wherein the nozzle-adjusting system adjusts the inclination of the second nozzle member depending on a position of a surface of an object arranged opposite to the second nozzle member.

Claim 38

Dependent Claim 22 words

The method according to claim 34 , wherein the nozzle-adjusting system adjusts the inclination and a position of the second nozzle member.

Claim 39

Dependent Claim 126 words

An exposure method for exposing a substrate through a liquid on the substrate, the exposure method comprising: exposing the substrate by projecting a pattern image onto the substrate through the liquid by a projection optical system which is supported by a first support member; providing the liquid from a liquid supply port of a first nozzle member; recovering the liquid from a recovery port of a second nozzle member which is supported by a second support member and which is movable relative to the first nozzle member, vibration being prevented from being transmitted from the second support member to the first support member by an anti-vibration device; and adjusting height and/or inclination of the second nozzle member moving the second nozzle member by a driving system.

Claim 40

Dependent Claim 126 words

An exposure method for exposing a substrate through a liquid on the substrate, the exposure method comprising: exposing the substrate by projecting a pattern image onto the substrate through the liquid by a projection optical system which is supported by a first support member; providing the liquid from a liquid supply port of a first nozzle member; recovering the liquid from a recovery port of a second nozzle member which is supported by a second support member and which is movable relative to the first nozzle member, vibration being prevented from being transmitted from the second support member to the first support member by an anti-vibration device; and adjusting height and/or inclination of the second nozzle member moving the second nozzle member by a driving system.

Claim 41

Dependent Claim 36 words

The exposure method according to claim 37 , wherein an object is arranged opposite to the second nozzle member, and the height and/or the inclination of the second nozzle member are/is adjusted while exposing the substrate.

Claim 42

Dependent Claim 46 words

The exposure method according to claim 37 , further comprising detecting a position of a surface of an object arranged opposite to the second nozzle member, wherein the height and/or the inclination of the second nozzle member are/is adjusted based on a result of the detection.

Claim 43

Dependent Claim 75 words

The exposure method according to claim 37 , wherein: the second nozzle member has a surface opposed to a surface of an object, the object being arranged opposite the second nozzle member; and a relative distance and/or a relative inclination between the surface of the second nozzle member and the surface of the object are/is detected to adjust the height and/or the inclination of the second nozzle member based on a result of the detection.

Claim 44

Dependent Claim 52 words

The exposure method according to claim 37 , further comprising: supplying a gas from a gas supply port of the second nozzle member, wherein the gas is blown against a portion of a surface of the substrate, located outside an area to which the liquid is provided, from the gas supply port

Claim 45

Dependent Claim 25 words

A method for producing a device, comprising: exposing a substrate by the exposure method as defined in claim 37 ; and processing the exposed substrate.

Claim 46

Dependent Claim 34 words

The method according to claim 37 , wherein the inclination of the second nozzle member is adjusted depending on a position of a surface of the substrate arranged opposite to the second nozzle member.

Claim 47

Dependent Claim 20 words

The method according to claim 37 , wherein the inclination and a position of the second nozzle member are adjusted.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	2017-03-17	2017-09-16	2018-03-18	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2021-03-17	2021-09-16	2022-03-18	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2025-03-17	2025-09-16	2026-03-18	$7700.00	Window Closed / Lapsed

Exposure apparatus, exposure method, and method for producing device

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