US4480910A — Pattern forming apparatus

Claim 1

Independent Claim 220 words

A pattern forming apparatus for projecting a semiconductor device pattern, which is formed on a reticle, upon a photoresist layer on a substrate, comprising: an illumination system for illuminating said pattern to project an optical pattern image; a reduction lens system including at least one lens for projecting said optical pattern image at a certain reduction ratio upon the photoresist layer formed on the substrate for exposing the photoresist layer; liquid sustaining means for filling a gap between said at least one lens of said reduction lens system and said photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one), whereby the resolution of the pattern forming apparatus including the reduction lens system is improved with respect to a pattern forming apparatus in which the gap is not filled with a liquid; and pattern detector means for detecting the alignment of patterns between said reticle and said substrate by light reflected from said substrate and transmitted through said photoresist layer, said liquid and said reduction lens system to be incident on said pattern detector means, the refractive index of said liquid being substantially equal to the refractive index of a material of said photoresist layer so that the light incident on said pattern detector means is not influenced by unevenness of said photoresist layer.

Claim 2

Dependent Claim 220 words

A pattern forming apparatus for projecting a semiconductor device pattern, which is formed on a reticle, upon a photoresist layer on a substrate, comprising: an illumination system for illuminating said pattern to project an optical pattern image; a reduction lens system including at least one lens for projecting said optical pattern image at a certain reduction ratio upon the photoresist layer formed on the substrate for exposing the photoresist layer; liquid sustaining means for filling a gap between said at least one lens of said reduction lens system and said photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one), whereby the resolution of the pattern forming apparatus including the reduction lens system is improved with respect to a pattern forming apparatus in which the gap is not filled with a liquid; and pattern detector means for detecting the alignment of patterns between said reticle and said substrate by light reflected from said substrate and transmitted through said photoresist layer, said liquid and said reduction lens system to be incident on said pattern detector means, the refractive index of said liquid being substantially equal to the refractive index of a material of said photoresist layer so that the light incident on said pattern detector means is not influenced by unevenness of said photoresist layer.

Claim 3

Dependent Claim 22 words

A pattern forming apparatus according to claim 1, wherein said pattern detector means is interposed between said illumination system and said reticle.

Claim 4

Dependent Claim 15 words

A pattern forming apparatus according to claim 1, wherein said substrate comprises a semiconductor substrate.

Claim 5

Dependent Claim 48 words

A pattern forming apparatus according to claim 1, wherein said liquid sustaining means comprises a nozzle for supplying said liquid, said nozzle being disposed at a position below said reduction lens system for enabling the flow of said liquid along the optical path of said reduction lens system.

Claim 6

Dependent Claim 37 words

A pattern forming apparatus according to claim 4, wherein said nozzle is positioned for directly supplying said liquid to the optical path of said reduction lens system and in a direction extending transversely to the optical path.

Claim 7

Dependent Claim 15 words

A pattern forming apparatus according to claim 1, wherein said liquid is trichlorotrifluoroethane or chlorobenzene.

Claim 8

Dependent Claim 258 words

A pattern forming apparatus for projecting a pattern formed on a reticle onto a photoresist layer formed on a substrate, comprising illuminating means for illuminating the pattern to project an optical pattern image, and image forming optic means having a numerical aperture, the image forming optic means including lens means having at least one reduction lens for projecting the optical pattern image at a predetermined reduction ratio onto the photoresist layer formed on the substrate for exposing the photoresist layer, liquid sustaining means for filling a gap between the at least one reduction leans and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one) for enabling the optical pattern image to be projected onto the photoresist layer with improved resolution of the image forming optic means of the pattern forming apparatus by varying the numerical aperture of the image forming optic means with respect to an image forming optic means in which the gap is not filled with a liquid, and pattern detector means for detecting the alignment of patterns between the reticle and the substrate by light reflected from the substrate and incident upon the pattern detector means along a path through the photoresist layer, the liquid and the lens means, the refractive index of the liquid being substantially equal to a refractive index of a material of the photoresist layer so that the light incident upon the photodetector means is not influenced by unevenness of the photoresist layer and substantially no error occurs in the pattern detection alignment.

Claim 9

Dependent Claim 258 words

A pattern forming apparatus for projecting a pattern formed on a reticle onto a photoresist layer formed on a substrate, comprising illuminating means for illuminating the pattern to project an optical pattern image, and image forming optic means having a numerical aperture, the image forming optic means including lens means having at least one reduction lens for projecting the optical pattern image at a predetermined reduction ratio onto the photoresist layer formed on the substrate for exposing the photoresist layer, liquid sustaining means for filling a gap between the at least one reduction leans and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one) for enabling the optical pattern image to be projected onto the photoresist layer with improved resolution of the image forming optic means of the pattern forming apparatus by varying the numerical aperture of the image forming optic means with respect to an image forming optic means in which the gap is not filled with a liquid, and pattern detector means for detecting the alignment of patterns between the reticle and the substrate by light reflected from the substrate and incident upon the pattern detector means along a path through the photoresist layer, the liquid and the lens means, the refractive index of the liquid being substantially equal to a refractive index of a material of the photoresist layer so that the light incident upon the photodetector means is not influenced by unevenness of the photoresist layer and substantially no error occurs in the pattern detection alignment.

Claim 10

Dependent Claim 20 words

A pattern forming apparatus according to claim 7, wherein the pattern formed on the reticle is a semiconductor device pattern.

Claim 11

Dependent Claim 22 words

A pattern forming apparatus according to claim 7, wherein the pattern detector means is interposed between the illumination means and the reticle.

Claim 12

Dependent Claim 15 words

A pattern forming apparatus according to claim 7, wherein the substrate comprises a semiconductor substrate.

Claim 13

Dependent Claim 52 words

A pattern forming apparatus according to claim 7, wherein the liquid sustaining means comprises a nozzle for supplying the liquid, the nozzle being disposed at a position below the at least one reduction lens for enabling the flow of the liquid along the optical path of the at least one reduction lens.

Claim 14

Dependent Claim 47 words

A pattern forming apparatus according to claim 11, wherein the liquid sustaining means further includes casing means for at least partially surrounding the at least one reduction lens and extending in the direction of at least one reduction lens, the nozzle being disposed in the casing means.

Claim 15

Dependent Claim 43 words

A pattern forming apparatus according to claim 12, wherein the nozzle is disposed in the casing means for directly supplying the liquid to the optical path of the at least one reduction lens and in a direction extending transversely to the optical path.

Claim 16

Dependent Claim 15 words

A pattern forming apparatus according to claim 7, wherein the liquid is trichlorotrifluoroethane or chlorobenzene.

Claim 17

Dependent Claim 61 words

A pattern forming apparatus according to claim 7, wherein the numerical aperture of the image forming optic means is determined by n sin θ where n is the refractive index of the liquid and sin θ is the value of the at least one reduction lens, the resolution of the image forming optic means being inversely proportional to the numerical aperture.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1987-11-06	1988-05-07	1988-11-06	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	1991-11-06	1992-05-07	1992-11-06	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	1995-11-06	1996-05-07	1996-11-06	$7700.00	Window Closed / Lapsed

Pattern forming apparatus

Abstract

Inventors

Bibliographic Details

Claims Analysis

References Cited (Backward Citations)

USPTO Annuity & Maintenance Windows

Assigned Categories & Tags

Assign Category Tag