US7053983B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Liquid immersion type exposure apparatus
Assignee: Canon Inc
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Filing: 2004-09-01
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Granted: 2006-05-30
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Expires: 2024-09-01
Abstract
Abstract Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
Inventors
- 👤 Toshinobu Tokita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 19:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
101 words
An exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate; a supplying system for supplying a liquid medium; a collecting system for collecting a liquid medium; and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
Claim 2
Dependent Claim
101 words
An exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate; a supplying system for supplying a liquid medium; a collecting system for collecting a liquid medium; and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
Claim 3
Dependent Claim
21 words
An apparatus according to claim 1 , wherein a clearance is defined between said bubble removing material and said exhausting system.
Claim 4
Dependent Claim
25 words
An apparatus according to claim 1 , wherein said supplying system supplies the liquid medium through a liquid supplying material having a liquid absorbing property.
Claim 5
Dependent Claim
25 words
An apparatus according to claim 1 , wherein said collecting system collects the liquid medium through a liquid collecting material having a liquid absorbing property.
Claim 6
Dependent Claim
21 words
An apparatus according to claim 4 , wherein said collecting system includes a replacing mechanism for replacing the liquid collecting material.
Claim 7
Dependent Claim
27 words
An apparatus according to claim 1 , wherein said bubble removing material is disposed at least in a portion of an outer periphery of the optical element.
Claim 8
Dependent Claim
49 words
An apparatus according to claim 3 , wherein said bubble removing material is disposed at least in a portion of an outer periphery of the optical element, and wherein said liquid supplying material is disposed at least in a portion of an outer periphery of said bubble removing material.
Claim 9
Dependent Claim
55 words
An apparatus according to claim 3 , wherein said liquid supplying material is disposed at least in a portion of an outer periphery of the optical element, and wherein said bubble removing material is disposed at least in a portion at a side of the substrate which side is remote from the liquid supplying material.
Claim 10
Dependent Claim
49 words
An apparatus according to claim 4 , wherein said bubble removing material is disposed at least in a portion of an outer periphery of the optical element, and wherein said liquid collecting material is disposed at least in a portion of an outer periphery of said bubble removing material.
Claim 11
Dependent Claim
67 words
An apparatus according to claim 1 , wherein said collecting system collects the liquid medium through a liquid collecting material having a liquid absorbing property, and wherein said liquid supplying material is disposed at least in a portion of an outer periphery of the optical element while said liquid collecting material is disposed at least in a portion of an outer periphery of said liquid supplying material.
Claim 12
Dependent Claim
67 words
An apparatus according to claim 8 , wherein said collecting system collects the liquid medium through a liquid collecting material having a liquid absorbing property, and wherein said liquid supplying material is disposed at least in a portion of an outer periphery of the optical element while said liquid collecting material is disposed at least in a portion of an outer periphery of said liquid supplying material.
Claim 13
Dependent Claim
43 words
An apparatus according to claim 3 , further comprising a first controller for controlling the liquid medium supplying rate of said supplying system so as to maintain a state that the amount of liquid absorption of the liquid supplying material is substantially saturated.
Claim 14
Dependent Claim
40 words
An apparatus according to claim 12 , further comprising a second controller for controlling the liquid medium supplying rate of said supplying system substantially at the same level as the liquid medium supplying rate as controlled by said first controller.
Claim 15
Dependent Claim
42 words
An apparatus according to claim 4 , further comprising a controller for controlling the liquid medium collecting rate of said collecting system so as to maintain a state that the amount of liquid absorption of said liquid collecting material is not saturated.
Claim 16
Dependent Claim
28 words
A device manufacturing method comprising the steps of: exposing a substrate by use of an exposure apparatus as recited in claim 1 ; and developing the exposed substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2009-05-29 | 2009-11-28 | 2010-05-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2013-05-29 | 2013-11-28 | 2014-05-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2017-05-29 | 2017-11-28 | 2018-05-30 | $7700.00 | Window Closed / Lapsed |