US6867844B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Immersion photolithography system and method using microchannel nozzles
Assignee: ASML Holding NV
•
Filing: 2003-06-19
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Granted: 2005-03-15
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Expires: 2023-06-19
Abstract
Abstract A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
Inventors
- 👤 Herman Vogel
- 👤 Klaus Simon
- 👤 Antonius Theodorus Anna Maria Derksen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 18:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/20; G03F7/2022; G03F7/203; G03F7/70358; G03F7/708; G03F7/70858; G03F7/709; H; H10; H10P; H10P76/00
Claims Analysis
Total Claims: 47
Claim 1
Independent Claim
81 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate; a liquid supply system that provides liquid flow between the projection optical system and the substrate; and a plurality of micronozzles arranged around a periphery of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
Claim 2
Dependent Claim
81 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate; a liquid supply system that provides liquid flow between the projection optical system and the substrate; and a plurality of micronozzles arranged around a periphery of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
Claim 3
Dependent Claim
22 words
The liquid immersion photolithography system of claim 1 , wherein the plurality of micronozzles include a plurality of tubes of varying lengths.
Claim 4
Dependent Claim
24 words
The liquid immersion photolithography system of claim 1 , wherein the varying lengths of the tubes provide a velocity profile that compensates for non-uniformities.
Claim 5
Dependent Claim
49 words
The liquid immersion photolithography system of claim 1 , wherein the liquid supply system includes: an input channel for delivering the liquid into a first plenum; a first diffuser screen through which the liquid can flow into a second plenum, wherein the liquid can then flow into the micronozzles.
Claim 6
Dependent Claim
55 words
The liquid immersion photolithography system of claim 4 , wherein the liquid supply system further comprises: a second plurality of micronozzles removing the liquid from the exposure area into a third plenum; a second diffuser screen through which the liquid flows into a fourth plenum; and an output channel through which the liquid is circulated.
Claim 7
Dependent Claim
27 words
The liquid immersion photolithography system of claim 1 , wherein the projection optical system includes a housing with a gas seal between the housing and the substrate.
Claim 8
Dependent Claim
39 words
The liquid immersion photolithography system of claim 6 , wherein the housing includes a plurality of annular channels connected to the gas seal through which negative pressure is maintained around the exposure area so as to remove stray liquid.
Claim 9
Dependent Claim
21 words
The liquid immersion photolithography system of claim 1 , wherein the micronozzles are between 5 microns and 5 millimeters in diameter.
Claim 10
Dependent Claim
14 words
The liquid immersion photolithography system of claim 1 , wherein the micronozzles are slit-shaped.
Claim 11
Dependent Claim
33 words
The liquid immersion photolithography system of claim 1 , wherein at least some of the micronozzles include a portion that flares out into an area between the substrate and the projection optical system.
Claim 12
Dependent Claim
18 words
The liquid immersion photolithography system of claim 1 , wherein a direction of the liquid flow is reversible.
Claim 13
Dependent Claim
24 words
The liquid immersion photolithography system of claim 1 , wherein the liquid supply system includes at least three channels through which liquid can flow.
Claim 14
Dependent Claim
21 words
The liquid immersion photolithography system of claim 1 , wherein the liquid supply system compensates for non-uniformities in a velocity profile.
Claim 15
Dependent Claim
73 words
A liquid immersion photolithography system comprising: an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system; means for providing a liquid flow between the projection optical system and the exposure area; and a first microshower at one side of the projection optical system that provides the liquid flow having a desired velocity profile when the liquid flow is present in the exposure area.
Claim 16
Dependent Claim
73 words
A liquid immersion photolithography system comprising: an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system; means for providing a liquid flow between the projection optical system and the exposure area; and a first microshower at one side of the projection optical system that provides the liquid flow having a desired velocity profile when the liquid flow is present in the exposure area.
Claim 17
Dependent Claim
20 words
The liquid immersion photolithography system of claim 14 , wherein the microshower includes a plurality of tubes of varying lengths.
Claim 18
Dependent Claim
24 words
The liquid immersion photolithography system of claim 15 , wherein the varying lengths of the tubes provide a velocity profile that compensates for non-uniformities.
Claim 19
Dependent Claim
53 words
The liquid immersion photolithography system of claim 14 , further comprising a liquid supply system that includes: an input channel for delivering the liquid into a first plenum; a first diffuser screen through which the liquid can flow into a second plenum, wherein the liquid flows into the exposure area through the microshower.
Claim 20
Dependent Claim
60 words
The liquid immersion photolithography system of claim 15 , wherein the liquid supply system further comprises: a second microshower for removing the liquid from the exposure area into a third plenum; a second diffuser screen through which the liquid can flow into a fourth plenum; and an output channel through which the liquid can circulate out of the exposure area.
Claim 21
Dependent Claim
27 words
The liquid immersion photolithography system of claim 14 , wherein the projection optical system includes a housing with a gas seal between the housing and the substrate.
Claim 22
Dependent Claim
33 words
The liquid immersion photolithography system of claim 19 , wherein the housing includes a plurality of channels through which negative pressure is maintained around the exposure area so as to remove stray liquid.
Claim 23
Dependent Claim
24 words
The liquid immersion photolithography system of claim 14 , wherein the microshower has micronozzles that are between 5 microns and 5 millimeters in diameter.
Claim 24
Dependent Claim
26 words
The liquid immersion photolithography system of claim 21 , wherein at least some of the micronozzles include a portion that flares out into the exposure area.
Claim 25
Dependent Claim
14 words
The liquid immersion photolithography system of claim 21 , wherein the micronozzles are slit-shaped.
Claim 26
Dependent Claim
18 words
The liquid immersion photolithography system of claim 14 , wherein a direction of the liquid flow is reversible.
Claim 27
Dependent Claim
24 words
The liquid immersion photolithography system of claim 17 , wherein the liquid supply system includes at least three channels through which liquid can flow.
Claim 28
Dependent Claim
22 words
The liquid immersion photolithography system of claim 14 , wherein the microshower compensates for non-uniformities in the velocity profile due to scanning.
Claim 29
Dependent Claim
54 words
A liquid immersion photolithography system comprising: an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system; a liquid flow between the projection optical system and the exposure area having a velocity profile that compensates for relative motion of the exposure system and the substrate.
Claim 30
Dependent Claim
54 words
A liquid immersion photolithography system comprising: an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system; a liquid flow between the projection optical system and the exposure area having a velocity profile that compensates for relative motion of the exposure system and the substrate.
Claim 31
Dependent Claim
51 words
A liquid immersion photolithography system comprising: an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system; and a plurality of micronozzles around a periphery of a lens of the projection optical system that provide a liquid flow in the exposure area.
Claim 32
Dependent Claim
51 words
A liquid immersion photolithography system comprising: an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system; and a plurality of micronozzles around a periphery of a lens of the projection optical system that provide a liquid flow in the exposure area.
Claim 33
Dependent Claim
68 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate; and a liquid supply system that provides liquid flow between the projection optical system and the substrate, wherein a direction of the liquid flow may be changed so as to compensate for direction of movement of the substrate.
Claim 34
Dependent Claim
68 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate; and a liquid supply system that provides liquid flow between the projection optical system and the substrate, wherein a direction of the liquid flow may be changed so as to compensate for direction of movement of the substrate.
Claim 35
Dependent Claim
45 words
The liquid immersion photolithography system of claim 29 , further including a plurality of micronozzles arranged around a periphery of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
Claim 36
Dependent Claim
22 words
The liquid immersion photolithography system of claim 30 , wherein the plurality of micronozzles include a plurality of tubes of varying lengths.
Claim 37
Dependent Claim
24 words
The liquid immersion photolithography system of claim 31 , wherein the varying lengths of the tubes provide a velocity profile that compensates for non-uniformities.
Claim 38
Dependent Claim
49 words
The liquid immersion photolithography system of claim 29 , wherein the liquid supply system includes: an input channel for delivering the liquid into a first plenum; a first diffuser screen through which the liquid can flow into a second plenum, wherein the liquid can then flow into the micronozzles.
Claim 39
Dependent Claim
55 words
The liquid immersion photolithography system of claim 33 , wherein the liquid supply system further comprises: a second plurality of micronozzles removing the liquid from the exposure area into a third plenum; a second diffuser screen through which the liquid flows into a fourth plenum; and an output channel through which the liquid is circulated.
Claim 40
Dependent Claim
21 words
The liquid immersion photolithography system of claim 29 , wherein the liquid supply system compensates for non-uniformities in a velocity profile.
Claim 41
Independent Claim
48 words
A method of exposing a substrate comprising: projecting electromagnetic radiation onto the substrate using a projection optical system; delivering a liquid flow between the projection optical system and the substrate; and controlling a velocity profile of the liquid flow to as to provide a substantially uniform velocity profile.
Claim 42
Independent Claim
48 words
A method of exposing a substrate comprising: projecting electromagnetic radiation onto the substrate using a projection optical system; delivering a liquid flow between the projection optical system and the substrate; and controlling a velocity profile of the liquid flow to as to provide a substantially uniform velocity profile.
Claim 43
Dependent Claim
22 words
The method of claim 36 , further comprising the step of removing excess liquid from the substrate using a gas supply system.
Claim 44
Dependent Claim
17 words
The method of claim 36 , further comprising the step of reversing direction of the liquid flow.
Claim 45
Independent Claim
53 words
A method of exposing a substrate comprising: projecting electromagnetic radiation onto the substrate using a projection optical system; delivering a liquid flow between the projection optical system and the substrate; and changing a direction of the liquid flow so as to compensate for a change in a direction of movement of the substrate.
Claim 46
Independent Claim
53 words
A method of exposing a substrate comprising: projecting electromagnetic radiation onto the substrate using a projection optical system; delivering a liquid flow between the projection optical system and the substrate; and changing a direction of the liquid flow so as to compensate for a change in a direction of movement of the substrate.
Claim 47
Dependent Claim
22 words
The method of claim 39 , further comprising the step of removing excess liquid from the substrate using a gas supply system.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2008-03-14 | 2008-09-13 | 2009-03-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-03-14 | 2012-09-13 | 2013-03-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-03-14 | 2016-09-13 | 2017-03-15 | $7700.00 | Window Closed / Lapsed |