US4509852A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for the photolithographic manufacture of integrated circuit elements
Assignee: MERCOTRUST AKTIENGESELLSCHAFT A CORP OF LIECOTENSTEIN
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Filing: 1982-08-17
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Granted: 1985-04-09
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Expires: 2002-08-17
Abstract
Abstract Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.
Inventors
- 👤 Werner Tabarelli
- 👤 Ernst W. Lobach
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 19:15
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; G03F7/70341; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875; G03F7/70883; G03F7/70891
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
219 words
An apparatus for the photolithographic printing of a pattern onto a semiconductor substrate, comprising: a substantially horizontal support for said semiconductor substrate; means for horizontally moving said support in mutually orthogonal X and Y directions for step-by-step exposure of successive portions of said semiconductor substrate; a projection lens disposed above said support and said semiconductor substrate for imaging a pattern of a mask upon each of the successive portions of said semiconductor substrate to activate a photosensitive layer thereon, as said portions are aligned with said lens by the movement of said support in said X and Y directions; a basin carried by and movable with said support, receiving said semiconductor substrate and having an upper rim lying above at least a lower face of said lens whereby said lower face projects into said basin; and flexible pipe mens for feeding a transparent liquid having a refractive index close to that of said layer into said basin, for removing said liquid from said basin and for maintaining the level of liquid in said basin always above said lower face for imaging of said pattern upon said successive portions under constant conditions of filling of the space between said layer and said face with said liquid, said liquid being capable of wetting said layer and substantially incapable of attacking same.
Claim 2
Independent Claim
219 words
An apparatus for the photolithographic printing of a pattern onto a semiconductor substrate, comprising: a substantially horizontal support for said semiconductor substrate; means for horizontally moving said support in mutually orthogonal X and Y directions for step-by-step exposure of successive portions of said semiconductor substrate; a projection lens disposed above said support and said semiconductor substrate for imaging a pattern of a mask upon each of the successive portions of said semiconductor substrate to activate a photosensitive layer thereon, as said portions are aligned with said lens by the movement of said support in said X and Y directions; a basin carried by and movable with said support, receiving said semiconductor substrate and having an upper rim lying above at least a lower face of said lens whereby said lower face projects into said basin; and flexible pipe mens for feeding a transparent liquid having a refractive index close to that of said layer into said basin, for removing said liquid from said basin and for maintaining the level of liquid in said basin always above said lower face for imaging of said pattern upon said successive portions under constant conditions of filling of the space between said layer and said face with said liquid, said liquid being capable of wetting said layer and substantially incapable of attacking same.
Claim 3
Dependent Claim
37 words
The apparatus defined in claim 1 wherein said flexible pipe means includes a flexible feed pipe and a flexible discharge pipe for said transparent liquid, said pipes opening into said basin below the level of said face.
Claim 4
Dependent Claim
34 words
The apparatus defined in claim 2 wherein said feed pipe and said discharge pipe are connected in a closed circulating path for said liquid, said path including a filter for cleaning the circulated liquid.
Claim 5
Dependent Claim
20 words
The apparatus defined in claim 3 wherein said path further includes means for maintaining said liquid at a constant temperature.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-04-08 | 1988-10-08 | 1989-04-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-04-08 | 1992-10-08 | 1993-04-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-04-08 | 1996-10-08 | 1997-04-09 | $7700.00 | Window Closed / Lapsed |