US6590634B1
Expired / Lapsed
US
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Exposure apparatus and method
Assignee: Nikon Corp
•
Filing: 2000-11-21
•
Granted: 2003-07-08
•
Expires: 2020-11-21
Abstract
Abstract Two stages (WS1, WS2) holding wafers can independently move between a positional information measuring section (PIS) under an alignment system (24a) and an exposing section (EPS) under a projection optical system (PI). The wafer exchange and alignment are performed on the stage (WS1), during which wafer (W2) is exposed on the stage (WS2). A position of each shot area of wafer (WS1) is obtained as a relative position with respect to a reference mark formed on the stage WS1 in the section (PIS). Relative positional information can be used for the alignment with respect to an exposure pattern when the wafer (WS1) is moved to the section (EPS) to be exposed. Therefore, it is not necessary that a stage position is observed continuously in moving the stage. Exposure operations are performed in parallel by the two wafer stages (WS1) and (WS2) so as to improve the throughput.
Inventors
- 👤 Kenji Nishi
- 👤 Kazuya Ota
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 14:24
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; H; H10; H10P; H10P76/00; G03F7/70358; G03F7/70425; G03F7/70691; G03F7/70716; G03F7/70733; G03F9/00; G03F9/70; G03F9/7003; G03F9/7007; G03F9/7015; G03F9/7023; G03F9/7026; G03F9/7088
Claims Analysis
Total Claims: 52
Claim 1
Independent Claim
212 words
An exposure apparatus for forming a predetermined pattern on a sensitive substrate, wherein the exposure apparatus comprises: a first holding member which holds a sensitive substrate; a second holding member which holds a sensitive substrate; a first movable member which is used commonly for the first and second holding members, and which is movable in a two-dimensional plane while supporting one of the first and second holding members in order for an exposure to be performed of the sensitive substrate held by the one holding member; and a second movable member which is used commonly for the first and second holding members, and which is movable in a two-dimensional plane while supporting the other of the first and second holding members in order for a measurement to be performed of the sensitive substrate held by the holding member; a first interferometer system which obtains positional information of the one holding member held by the first movable member; and a second interferometer system which obtains positional information of the other holding member held by the second movable member; each of the first and second holding members having a reflective surface used for the first and second interferometer systems; and the first and second movable members alternately support the first and second holding members.
Claim 2
Dependent Claim
212 words
An exposure apparatus for forming a predetermined pattern on a sensitive substrate, wherein the exposure apparatus comprises: a first holding member which holds a sensitive substrate; a second holding member which holds a sensitive substrate; a first movable member which is used commonly for the first and second holding members, and which is movable in a two-dimensional plane while supporting one of the first and second holding members in order for an exposure to be performed of the sensitive substrate held by the one holding member; and a second movable member which is used commonly for the first and second holding members, and which is movable in a two-dimensional plane while supporting the other of the first and second holding members in order for a measurement to be performed of the sensitive substrate held by the holding member; a first interferometer system which obtains positional information of the one holding member held by the first movable member; and a second interferometer system which obtains positional information of the other holding member held by the second movable member; each of the first and second holding members having a reflective surface used for the first and second interferometer systems; and the first and second movable members alternately support the first and second holding members.
Claim 3
Dependent Claim
36 words
An exposure apparatus according to claim 1 , further comprising an exchanging mechanism which exchanges the one holding member supported by the first movable member and the other holding member supported by the second movable member.
Claim 4
Dependent Claim
21 words
An exposure apparatus according to claim 1 , wherein the first and second movable members are moved by an electromagnetic force.
Claim 5
Dependent Claim
29 words
An exposure apparatus according to claims 1 , wherein reflective surfaces used for the first and second interferometer systems are formed on the first and second holding members, respectively.
Claim 6
Dependent Claim
21 words
An exposure apparatus according to claim 1 , wherein the first and second movable members are supported on a common base.
Claim 7
Dependent Claim
24 words
An exposure apparatus according to claim 5 , further comprising a gas-bearing which supports the first and second movable members on the common base.
Claim 8
Dependent Claim
25 words
An exposure apparatus according to claim 1 , wherein the exposure apparatus performs a scanning-exposure while moving the sensitive substrates relative to an exposure light.
Claim 9
Dependent Claim
27 words
An exposure apparatus according to claim 1 , wherein the measurement includes a determination of positional information about a plurality of defined areas on the sensitive substrate.
Claim 10
Dependent Claim
22 words
An exposure apparatus according to claim 1 , wherein the measurement includes a detection of an alignment mark on the sensitive substrate.
Claim 11
Dependent Claim
32 words
An exposure apparatus according to claim 9 , herein the measurement includes a detection of focusing information of the substrate held on the other holding member supported by the second movable member.
Claim 12
Dependent Claim
32 words
An exposure apparatus according to claim 1 , wherein the first movable member is moved without the second interferometer system, and the second movable member is moved without the first interferometer system.
Claim 13
Dependent Claim
20 words
An exposure apparatus according to claim 11 , wherein the first and second movable members move on a common base.
Claim 14
Dependent Claim
116 words
An exposure apparatus according to claim 1 , wherein the measurement includes a determination of positional relationship between a plurality of defined areas on the substrate held on the other holding member supported by the second movable member and a reference provided on the other holding member supported by the second movable member, and wherein after exchanging the holding members so that the one holding member is supported by the second movable member and the other holding member is supported by the first movable member, the reference provided on the other holding member is detected in order for alignment of the plurality of defined areas on the other holding member supported by the first holding member.
Claim 15
Dependent Claim
32 words
An exposure apparatus according to claim 13 , wherein the first movable member is moved without the second interferometer system, and the second movable member is moved without the first interferometer system.
Claim 16
Dependent Claim
20 words
An exposure apparatus according to claim 14 , wherein the first and second movable members move on a common base.
Claim 17
Dependent Claim
17 words
A micro-device manufacturing method including a lithography process utilizing the exposure apparatus defined in claim 1 .
Claim 18
Dependent Claim
209 words
An exposure method for forming a predetermined pattern on sensitive substrate, the method comprising: exposing a sensitive substrate which is held on a first holding member, while moving a first movable member which supports said first holding member; monitoring positional information of the first holding member which is supported by the first movable member by using a first interferometer system; measuring alignment information of a sensitive substrate which is held on a second holding member, while moving a second movable member which supports said second holding member; monitoring positional information of the second holding member which is supported by the second movable member by using a second interferometer system; exchanging the holding members so that the first holding member is supported by the second movable member and the second holding member is supported by the first movable member; exposing, after the exchange, the sensitive substrate held on the second holding member, while moving said first movable member which supports the second holding member; and monitoring, after the exchange, positional information of the second holding member which is supported by the first movable member by using said first interferometer system, each of the first and second holding members having a reflective surface used for the first and second interferometer systems.
Claim 19
Dependent Claim
209 words
An exposure method for forming a predetermined pattern on sensitive substrate, the method comprising: exposing a sensitive substrate which is held on a first holding member, while moving a first movable member which supports said first holding member; monitoring positional information of the first holding member which is supported by the first movable member by using a first interferometer system; measuring alignment information of a sensitive substrate which is held on a second holding member, while moving a second movable member which supports said second holding member; monitoring positional information of the second holding member which is supported by the second movable member by using a second interferometer system; exchanging the holding members so that the first holding member is supported by the second movable member and the second holding member is supported by the first movable member; exposing, after the exchange, the sensitive substrate held on the second holding member, while moving said first movable member which supports the second holding member; and monitoring, after the exchange, positional information of the second holding member which is supported by the first movable member by using said first interferometer system, each of the first and second holding members having a reflective surface used for the first and second interferometer systems.
Claim 20
Dependent Claim
21 words
An exposure method according to claim 17 , wherein said first and second movable members are moved by an electromagnetic force.
Claim 21
Dependent Claim
29 words
An exposure method according to claim 17 , wherein reflective surfaces used for the first and second interferometer systems are formed on the first and second holding members, respectively.
Claim 22
Dependent Claim
44 words
An exposure method according to claim 17 , wherein each of said first and second holding members has a reference, and wherein the reference of one of said holding members which is supported by the first movable member is detected prior to an exposure.
Claim 23
Dependent Claim
17 words
An exposure method according to claim 17 , wherein said exposure is performed by a scanning-exposure method.
Claim 24
Dependent Claim
17 words
An exposure method according to claim 17 , wherein said first interferometer system measures yawing and pitching.
Claim 25
Dependent Claim
17 words
An exposure method according to claim 22 , wherein said second interferometer system measures yawing and pitching.
Claim 26
Dependent Claim
87 words
An exposure method according to claim 23 , wherein the alignment information includes positional relationship between a plurality of defined areas on the substrate held on the second holding member supported by the second movable member and a reference provided on the second holding member supported by the second movable member, and wherein after the exchange, the reference provided on the second holding member is detected in order for alignment of the plurality of defined areas on the second holding member supported by the first holding member.
Claim 27
Dependent Claim
32 words
An exposure method according to claim 24 , wherein the first movable member is moved without the second interferometer system, and the second movable member is moved without the first interferometer system.
Claim 28
Dependent Claim
21 words
An exposure method according to claim 25 , wherein the first and second movable members are moved on a common base.
Claim 29
Dependent Claim
32 words
An exposure method according to claim 23 , wherein the first movable member is moved without the second interferometer system, and the second movable member is moved without the first interferometer system.
Claim 30
Dependent Claim
21 words
An exposure method according to claim 27 , wherein the first and second movable members are moved on a common base.
Claim 31
Dependent Claim
24 words
An exposure method according to claim 17 , wherein said alignment information is obtained by detecting a plurality of marks on the sensitive substrate.
Claim 32
Dependent Claim
39 words
An exposure method according to claim 17 , wherein said exposure of the substrate held on the first holding member is performed, while executing said measurement of the alignment information of the substrate held on the second holding member.
Claim 33
Dependent Claim
16 words
A device manufacturing method including an exposure process utilizing the method defined in claim 17 .
Claim 34
Dependent Claim
87 words
An exposure method according to claim 17 , wherein the alignment information includes positional relationship between a plurality of defined areas on the substrate held on the second holding member supported by the second movable member and a reference provided on the second holding member supported by the second movable member, and wherein after the exchange, the reference provided on the second holding member is detected in order for alignment of the plurality of defined areas on the second holding member supported by the first holding member.
Claim 35
Dependent Claim
32 words
An exposure method according to claim 32 , wherein the first movable member is moved without the second interferometer system, and the second movable member is moved without the first interferometer system.
Claim 36
Dependent Claim
21 words
An exposure method according to claim 33 , wherein the first and second movable members are moved on a common base.
Claim 37
Dependent Claim
56 words
An exposure apparatus according to claim 1 , further comprising: a position control device, functionally associated with the first and second movable members, which controls the first and second movable members without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 38
Dependent Claim
45 words
An exposure apparatus according to claim 35 , wherein the position control device moves the first and second movable members without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 39
Dependent Claim
47 words
An exposure apparatus according to claim 35 , wherein the first and second movable members are stopped by the position control device without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 40
Dependent Claim
15 words
An exposure apparatus according to claim 37 , wherein the position control device includes stoppers.
Claim 41
Dependent Claim
63 words
An exposure apparatus according to claim 35 , wherein the position control device includes a measuring device which detects positional information of the first and second movable members in order to control the first and second movable members without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 42
Dependent Claim
15 words
An exposure apparatus according to claim 39 , wherein the measuring device includes an encoder.
Claim 43
Dependent Claim
22 words
An exposure apparatus according to claim 35 , further comprising: a driving system which moves the first and second movable members, respectively.
Claim 44
Dependent Claim
48 words
An exposure apparatus according to claim 41 , further comprising: a switching device having coupling members which are respectively coupled to the first and second holding members in order to carry out the first and second holding members between the first movable member and the second movable member.
Claim 45
Dependent Claim
44 words
An exposure method according to claim 17 , further comprising: controlling positions of the first and second movable members without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 46
Dependent Claim
42 words
An exposure method according to claim 43 , wherein the first and second movable members are moved without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 47
Dependent Claim
42 words
An exposure method according to claim 43 , wherein the first and second movable members are stopped without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 48
Dependent Claim
19 words
An exposure method according to claim 45 , wherein the first and second movable members are stopped by stoppers.
Claim 49
Dependent Claim
45 words
An exposure method according to claim 43 , further comprising: detecting positional information of the first and second movable members without using the first and second interferometer systems, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 50
Dependent Claim
39 words
An exposure method according to claim 47 , wherein the positional information of the first and second movable members are optically detected, when the first and second holding members are uncoupled from the first and second movable members, respectively.
Claim 51
Dependent Claim
26 words
An exposure method according to claim 48 , wherein the positional information of the first and second movable members are optically detected by using an encoder.
Claim 52
Dependent Claim
53 words
An exposure method according to claim 43 , further comprising: physically connecting a switching device to the first and second holding members in order to carry the first and second holding members, which are uncoupled from the first and second movable members, between the first movable member and the second movable member, respectively.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2006-07-07 | 2007-01-06 | 2007-07-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-07-07 | 2011-01-06 | 2011-07-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-07-07 | 2015-01-06 | 2015-07-08 | $7700.00 | Window Closed / Lapsed |