US5877845A
Expired / Lapsed
US
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Scanning exposure apparatus and method
Assignee: Nikon Corp
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Filing: 1997-07-17
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Granted: 1999-03-02
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Expires: 2017-07-17
Abstract
Abstract A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux is provided. The scanning exposure apparatus includes a movable mask stage for holding the mask, a movable substrate stage for holding the substrate, a first detector outputting a first signal indicating the position of the substrate stage, and a second detector outputting a second signal indicating the position of the mask stage. The scanning exposure apparatus further includes a controller processing the first signal to derive a target position of the mask stage, the controller receiving the second signal to derive a deviation of the mask stage from the target position, the controller further deriving an error anticipation signal in accordance with deviations in mask stage movement measured in advance of scan-exposure, and a mask stage controller for moving the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal to maintain the position of the mask stage to the target position.
Inventors
- 👤 Susumu Makinouchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:39
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358; G03F7/70691; G03F7/70716; G03F7/70725; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 25
Claim 1
Independent Claim
120 words
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the scanning exposure apparatus comprising: a movable mask stage for holding the mask; a movable substrate stage for holding the substrate; a calculation control unit generating control information for maintaining a predetermined positional relationship between the mask stage and the substrate stage during scan-exposure; and an error correction unit adding correction information to the control information generated by the calculation control unit, the correction information being determined in accordance with a predetermined positional error between the mask stage and the substrate stage measured in advance of scan-exposure.
Claim 2
Dependent Claim
120 words
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the scanning exposure apparatus comprising: a movable mask stage for holding the mask; a movable substrate stage for holding the substrate; a calculation control unit generating control information for maintaining a predetermined positional relationship between the mask stage and the substrate stage during scan-exposure; and an error correction unit adding correction information to the control information generated by the calculation control unit, the correction information being determined in accordance with a predetermined positional error between the mask stage and the substrate stage measured in advance of scan-exposure.
Claim 3
Dependent Claim
18 words
The scanning exposure apparatus according to claim 1, wherein said predetermined positional error includes a mechanical assembly error.
Claim 4
Dependent Claim
118 words
The scanning exposure apparatus according to claim 2, wherein at least one of the mask stage and the substrate stage includes a coarse movement stage for coarse movement and a micro-movement stage coupled to the coarse movement stage for fine positional correction, wherein the predetermined positional error includes a directional error with respect to the movement direction of the coarse movement stage, wherein the calculation control unit generates the control information including velocity control information of the micro-movement stage, and wherein the error correction unit adds the correction information including velocity correction information to the velocity control information of the micro-movement stage generated by the calculation control unit to offset the directional error of the coarse movement stage.
Claim 5
Dependent Claim
118 words
The scanning exposure apparatus according to claim 1, wherein at least one of the mask stage and the substrate stage includes a coarse movement stage for coarse movement and a micro-movement stage coupled to the coarse movement stage for fine positional correction, wherein the predetermined positional error includes a directional error with respect to the movement direction of the coarse movement stage, wherein the calculation control unit generates the control information including velocity control information of the micro-movement stage, and wherein the error correction unit adds the correction information including velocity correction information to the velocity control information of the micro-movement stage generated by the calculation control unit to offset the directional error of the coarse movement stage.
Claim 6
Dependent Claim
177 words
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the scanning exposure apparatus comprising: a movable mask stage for holding the mask; a movable substrate stage for holding the substrate; a first detector outputting a first signal indicating the position of the substrate stage; a second detector outputting a second signal indicating the position of the mask stage; a controller processing the first signal to derive a target position of the mask stage, the controller receiving the second signal to derive a deviation of the mask stage from the target position, the controller further deriving an error anticipation signal in accordance with deviations in mask stage movement measured in advance of scan-exposure; and a mask stage controller for moving the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal to maintain the position of the mask stage to the target position.
Claim 7
Dependent Claim
177 words
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the scanning exposure apparatus comprising: a movable mask stage for holding the mask; a movable substrate stage for holding the substrate; a first detector outputting a first signal indicating the position of the substrate stage; a second detector outputting a second signal indicating the position of the mask stage; a controller processing the first signal to derive a target position of the mask stage, the controller receiving the second signal to derive a deviation of the mask stage from the target position, the controller further deriving an error anticipation signal in accordance with deviations in mask stage movement measured in advance of scan-exposure; and a mask stage controller for moving the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal to maintain the position of the mask stage to the target position.
Claim 8
Dependent Claim
81 words
The scanning exposure apparatus according to claim 5, wherein the controller includes: a calculation unit processing the first signal to derive the target position of the mask stage; a differential unit receiving the second signal and a signal indicating the target position of the mask stage to derive the deviation of the mask stage from the target position; and a multiplication unit deriving the error anticipation signal in accordance with the deviation in mask stage movement measured in advance of scan-exposure.
Claim 9
Dependent Claim
114 words
The scanning exposure apparatus according to claim 5, wherein the controller multiplies a design velocity of the substrate stage by a predetermined coefficient determined in accordance with the deviations in mask stage movement measured in advance of scan-exposure to derive the error anticipation signal in termns of velocity, and wherein the mask stage controller includes: a position gain unit for multiplying the derived deviation of the mask stage from the target position by a predetermined positional gain to output a velocity signal indicating the deviation of the mask stage in terms of velocity; and an adder adding the velocity signal and the error anticipation signal to derive a target velocity of the mask stage.
Claim 10
Dependent Claim
53 words
The scanning exposure apparatus according to claim 5, further comprising a projection optical system for projecting the image of the mask pattern onto the substrate with a predetermined reduction ratio, wherein the controller processes the first signal in accordance with the predetermined reduction ratio to derive the target position of the mask stage.
Claim 11
Dependent Claim
84 words
The scanning exposure apparatus according to claim 5, wherein the first detector outputs the first signal including a first vector signal, and the second detector outputs the second signal including a second vector signal, wherein the controller multiplies the first vector signal by a predetermined matrix to derive the target position of the mask stage in terms of a vector, the controller receiving the second vector signal to derive the deviation of the mask stage from the target position in terms of a vector.
Claim 12
Dependent Claim
29 words
The scanning exposure apparatus according to claim 5, wherein the first detector includes a mirror fixed to the substrate stage and a laser interferometer optically coupled to the mirror.
Claim 13
Dependent Claim
29 words
The scanning exposure apparatus according to claim 5, wherein the second detector includes a mirror fixed to the mask state and a laser interferometer optically coupled to the mirror.
Claim 14
Dependent Claim
183 words
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the scanning exposure apparatus comprising: a movable mask stage for holding the mask; a movable substrate stage for holding the substrate; a first detector outputting a first signal indicating the position of the substrate stage; a second detector outputting a second signal indicating the position of the mask stage; and a mask stage driver processing the first signal to derive a target position of the mask stage, the mask stage driver controlling the movement of the mask stage by feedback control in accordance with the second signal and the derived target position, the mask stage driver further providing an error anticipation signal indicating an expected deviation in mask stage movement to the feedback control of the mask stage to perform feedforward control to maintain the position of the mask stage to the target position, the expected deviation being determined in advance of the actual control of the mask stage movement.
Claim 15
Dependent Claim
183 words
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the scanning exposure apparatus comprising: a movable mask stage for holding the mask; a movable substrate stage for holding the substrate; a first detector outputting a first signal indicating the position of the substrate stage; a second detector outputting a second signal indicating the position of the mask stage; and a mask stage driver processing the first signal to derive a target position of the mask stage, the mask stage driver controlling the movement of the mask stage by feedback control in accordance with the second signal and the derived target position, the mask stage driver further providing an error anticipation signal indicating an expected deviation in mask stage movement to the feedback control of the mask stage to perform feedforward control to maintain the position of the mask stage to the target position, the expected deviation being determined in advance of the actual control of the mask stage movement.
Claim 16
Dependent Claim
104 words
The scanning exposure apparatus according to claim 12, wherein the mask stage driver includes: a first controller processing the first signal to derive the target position of the mask stage, the first controller receiving the second signal to derive the deviation of the mask stage from the target position, the first controller further deriving the error anticipation signal in accordance with the expected deviation; and a second controller for moving the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal to perform feedback control and feedforward control of the mask stage movement.
Claim 17
Dependent Claim
151 words
A control device for controlling scanning movement of a first movable stage relative to a second movable stage, the control device comprising: a first detector outputting a first signal indicating the position of the first stage; a second detector outputting a second signal indicating the position of the second stage; and a first stage controller processing the second signal to derive a target position of the first stage, the first stage controller controlling the movement of the first stage by feedback control in accordance with the first signal and the derived target position, the first stage controller further providing an error anticipation signal indicating an expected deviation in first stage movement to the feedback control of the first stage to perform feedforward control to maintain the position of the first stage to the target position, the expected deviation being determined in advance of the actual control of the first stage movement.
Claim 18
Dependent Claim
151 words
A control device for controlling scanning movement of a first movable stage relative to a second movable stage, the control device comprising: a first detector outputting a first signal indicating the position of the first stage; a second detector outputting a second signal indicating the position of the second stage; and a first stage controller processing the second signal to derive a target position of the first stage, the first stage controller controlling the movement of the first stage by feedback control in accordance with the first signal and the derived target position, the first stage controller further providing an error anticipation signal indicating an expected deviation in first stage movement to the feedback control of the first stage to perform feedforward control to maintain the position of the first stage to the target position, the expected deviation being determined in advance of the actual control of the first stage movement.
Claim 19
Independent Claim
229 words
A method of controlling scanning movement of a mask stage relative to a substrate stage in a scanning exposure apparatus, the method comprising the steps of: deriving an error anticipation signal indicating the tendency in deviation of the mask stage during the scanning movement of the mask stage relative to the substrate stage in advance of actual scanning movement; moving the substrate stage in a predetermined direction; outputting a first signal indicating the position of the substrate stage during the step of moving the substrate stage; moving the mask stage in a predetermined direction substantially in synchronization with the substrate stage movement; outputting a second signal indicating the position of the mask stage during the step of moving the mask stage; processing the first signal to derive a target position of the mask stage during the step of moving the mask stage; processing the second signal in accordance with the target position of the mask stage to derive a deviation of the mask stage from the target position during the step of moving the mask stage; and adjusting the position of the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal determined in the step of deriving to maintain the position of the mask stage to the target position during the step of moving the mask stage.
Claim 20
Independent Claim
229 words
A method of controlling scanning movement of a mask stage relative to a substrate stage in a scanning exposure apparatus, the method comprising the steps of: deriving an error anticipation signal indicating the tendency in deviation of the mask stage during the scanning movement of the mask stage relative to the substrate stage in advance of actual scanning movement; moving the substrate stage in a predetermined direction; outputting a first signal indicating the position of the substrate stage during the step of moving the substrate stage; moving the mask stage in a predetermined direction substantially in synchronization with the substrate stage movement; outputting a second signal indicating the position of the mask stage during the step of moving the mask stage; processing the first signal to derive a target position of the mask stage during the step of moving the mask stage; processing the second signal in accordance with the target position of the mask stage to derive a deviation of the mask stage from the target position during the step of moving the mask stage; and adjusting the position of the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal determined in the step of deriving to maintain the position of the mask stage to the target position during the step of moving the mask stage.
Claim 21
Dependent Claim
36 words
The method according to claim 15, wherein the step of deriving the error anticipation signal includes the step of measuring a mechanical assembly error in at least one of the mask stage and the substrate stage.
Claim 22
Dependent Claim
33 words
The method according to claim 15, wherein the step of deriving the error anticipation signal includes the step of determining a directional error in the mask stage movement relative to the substrate stage.
Claim 23
Independent Claim
186 words
A method of exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the method comprising the steps of: deriving an error anticipation signal indicating the tendency in deviation of the mask stage during the scanning movement of the mask stage relative to the substrate stage in advance of actual scanning movement; moving the substrate stage in a predetermined direction; moving the mask stage in a predetermined direction substantially in synchronization with the substrate stage movement; outputting a first signal indicating the position of the mask stage during the step of moving the mask stage; processing a second signal to derive a deviation of the mask stage from a target position during the step of moving the mask stage; and adjusting the position of the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal determined in the step of deriving to maintain the position of the mask stage during the step of moving the mask stage.
Claim 24
Independent Claim
186 words
A method of exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux, the method comprising the steps of: deriving an error anticipation signal indicating the tendency in deviation of the mask stage during the scanning movement of the mask stage relative to the substrate stage in advance of actual scanning movement; moving the substrate stage in a predetermined direction; moving the mask stage in a predetermined direction substantially in synchronization with the substrate stage movement; outputting a first signal indicating the position of the mask stage during the step of moving the mask stage; processing a second signal to derive a deviation of the mask stage from a target position during the step of moving the mask stage; and adjusting the position of the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal determined in the step of deriving to maintain the position of the mask stage during the step of moving the mask stage.
Claim 25
Dependent Claim
33 words
The method according to claim 18, wherein the step of deriving the error anticipation signal includes the step of determining a directional error in the mask stage movement relative to the substrate stage.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-01 | 2002-08-31 | 2003-03-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-01 | 2006-08-31 | 2007-03-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-01 | 2010-08-31 | 2011-03-02 | $7700.00 | Window Closed / Lapsed |