US5677758A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithography System using dual substrate stages
Assignee: ASML Netherlands BV
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Filing: 1995-02-09
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Granted: 1997-10-14
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Expires: 2015-02-09
Abstract
Abstract Two lithographic substrate stages are used in a single lithographic system. While a substrate on one stage is being exposed, a second substrate is being loaded, unloaded, or aligned on a second stage. After exposure, the first stage is unloaded, reloaded, and the newly-loaded substrate is aligned, while the second substrate on the second stage is being exposed. The two stages are thus used alternately in different steps of the process. One of the steps is being performed on one stage while a different step is being performed on the other stage. The substrates on both stages are, therefore, being acted upon simultaneously. The two stages are carried on a single linear motor platen, and moved about the platen by use of linear motors. The two stages alternately both move in clockwise directions about the platen, or both move in counterclockwise directions. When both move in clockwise directions, the first stage is moving to the exposure position, and the second stage is moving to the unload/load/align station. When they both move in counterclockwise directions, the second stage is moving to the exposure position and the first stage is moving to the unload/load/align station.
Inventors
- 👤 Robert A. McEachern
- 👤 Mark S. Lucas
- 👤 Craig R. Simpson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 02:07
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70733; G03F7/70716; Y; Y10; Y10S; Y10S414/00; Y10S414/135; Y10S414/136; Y10S414/141
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
145 words
A lithographic system providing for rapid throughput of substrates, said system including: an optical projection system which projects an image upon a substrate; a platen including an exposure station and a load/unload station, said exposure station being positioned in an operative relationship with said optical projection system, said load/unload station being removed from said exposure station; a first stage and a second stage carried by said platen; and motors which independently move said stages on said platen between said exposure station and said load/unload station; wherein said platen is dimensioned to permit said stages to pass one another as they alternately move between said exposure station and said load/unload station and enable a substrate on one of said stages to be exposed at said exposure station while another substrate is being loaded upon or unloaded from the other of said stages at said load/unload station.
Claim 2
Dependent Claim
145 words
A lithographic system providing for rapid throughput of substrates, said system including: an optical projection system which projects an image upon a substrate; a platen including an exposure station and a load/unload station, said exposure station being positioned in an operative relationship with said optical projection system, said load/unload station being removed from said exposure station; a first stage and a second stage carried by said platen; and motors which independently move said stages on said platen between said exposure station and said load/unload station; wherein said platen is dimensioned to permit said stages to pass one another as they alternately move between said exposure station and said load/unload station and enable a substrate on one of said stages to be exposed at said exposure station while another substrate is being loaded upon or unloaded from the other of said stages at said load/unload station.
Claim 3
Dependent Claim
25 words
A lithographic system as set forth in claim 1 in which said motors move said stages alternately in clockwise and counterclockwise directions about said platen.
Claim 4
Dependent Claim
38 words
A lithographic system as set forth in claim 1 further including alignment sensors at said load/unload station for aligning substrates on said first or second stage while said first or second stage is positioned in said load/unload station.
Claim 5
Dependent Claim
38 words
A lithographic system as set forth in claim 1 further including loading and unloading means positioned for loading and unloading substrates from one of said stages when said one of said stages is located at said load/unload station.
Claim 6
Dependent Claim
35 words
A lithography system as set forth in claim 1, wherein the platen is planar and the motors are located on the first and second stages to propel the stages across a surface of the platen.
Claim 7
Dependent Claim
40 words
A lithography system as set forth in claim 1, wherein the substrates are aligned relative to one of the first or second stage at the load/unload station while the other stage moves another substrate underneath the projection system for exposure.
Claim 8
Dependent Claim
169 words
A lithographic system providing for rapid throughput of substrates, said system including an optical projection system which projects an image upon a substrate a platen including an exposure station and a load/unload station, said exposure station being positioned in an operative relationship with said optical projection system, said load/unload station being removed from said exposure station; a first stage and a second stage carried by said platen; motors which independently move said stages on said platen between said exposure station and said load/unload station; loading and unloading means for loading and unloading a substrate from one of said stages when said one of said stages is located at said load/unload station; and a controller programmed to cause said motors to move said stages alternately in clockwise and counterclockwise directions about said platen; whereby a substrate on one of said stages can be being exposed at said exposure station while another substrate can be being simultaneously loaded upon or unloaded from the other of said stages at said load/unload station.
Claim 9
Dependent Claim
169 words
A lithographic system providing for rapid throughput of substrates, said system including an optical projection system which projects an image upon a substrate a platen including an exposure station and a load/unload station, said exposure station being positioned in an operative relationship with said optical projection system, said load/unload station being removed from said exposure station; a first stage and a second stage carried by said platen; motors which independently move said stages on said platen between said exposure station and said load/unload station; loading and unloading means for loading and unloading a substrate from one of said stages when said one of said stages is located at said load/unload station; and a controller programmed to cause said motors to move said stages alternately in clockwise and counterclockwise directions about said platen; whereby a substrate on one of said stages can be being exposed at said exposure station while another substrate can be being simultaneously loaded upon or unloaded from the other of said stages at said load/unload station.
Claim 10
Dependent Claim
38 words
A lithographic system as set forth in claim 7 including alignment means at said load/unload station for aligning substrates on a said first or second stage while said first or second stage is positioned in said load/unload station.
Claim 11
Independent Claim
70 words
A method of processing substrates in a lithographic system having a single projection system and two substrate stages on a platen to move relative to said projection system, said method including the steps of projecting an image on a substrate carried by the first of said stages, and independently positioning the second of the stages to simultaneously load or unload a substrate onto or from the second of said stages.
Claim 12
Independent Claim
70 words
A method of processing substrates in a lithographic system having a single projection system and two substrate stages on a platen to move relative to said projection system, said method including the steps of projecting an image on a substrate carried by the first of said stages, and independently positioning the second of the stages to simultaneously load or unload a substrate onto or from the second of said stages.
Claim 13
Dependent Claim
46 words
The method of claim 9 followed by the steps of reversing the positions of said stages and thereafter: projecting an image on a substrate carried by the second of said stages; and simultaneously loading or unloading a substrate onto or from the first of said stages.
Claim 14
Independent Claim
101 words
A system for moving stages, said system including a platen; a first stage and a second stage carried by said platen, said platen being large enough to permit said stages to move past one another on said platen, whereby said first stage can be moved on said platen independently of said second stage on said platen; each of said stages carrying at least two linear motors, one of said motors being positioned to move said stage in a y-direction and the other of said motors being positioned to move said stage in an x-direction; and a controller for said linear motors.
Claim 15
Independent Claim
101 words
A system for moving stages, said system including a platen; a first stage and a second stage carried by said platen, said platen being large enough to permit said stages to move past one another on said platen, whereby said first stage can be moved on said platen independently of said second stage on said platen; each of said stages carrying at least two linear motors, one of said motors being positioned to move said stage in a y-direction and the other of said motors being positioned to move said stage in an x-direction; and a controller for said linear motors.
Claim 16
Dependent Claim
43 words
A system as set forth in claim 11 in which each of said stages carries four linear motors, two of which are positioned to mive said stage in a y-direction, and two of which are positioned to move said stage in an x-direction.
Claim 17
Dependent Claim
54 words
A system as set forth in claim 11 including a lithographic projection system positioned over a portion of said platen, whereby said first stage and said second stage can alternately be positioned under said projection system and an image can be projected upon a substrate carried on the said stage which is so positioned.
Claim 18
Independent Claim
112 words
A method of processing substrates in a lithographic system including a projection system, at least two substrate stages, and a platen on which the two substrate stages move independently relative to each other, the method comprising: projecting an image with the projector system on a substrate carried by the first of the stages; loading a substrate onto the second of the stages; aligning the substrate on the second stage to the second stage; exchanging positions between the first stage and the second stage; projecting an image on the substrate carried by the second stage; and unloading the substrate on the first stage while the substrate on the second stage is being exposed.
Claim 19
Independent Claim
112 words
A method of processing substrates in a lithographic system including a projection system, at least two substrate stages, and a platen on which the two substrate stages move independently relative to each other, the method comprising: projecting an image with the projector system on a substrate carried by the first of the stages; loading a substrate onto the second of the stages; aligning the substrate on the second stage to the second stage; exchanging positions between the first stage and the second stage; projecting an image on the substrate carried by the second stage; and unloading the substrate on the first stage while the substrate on the second stage is being exposed.
Claim 20
Dependent Claim
61 words
A lithographic system, comprising: optical projection means for projecting an image on a substrate; a platen, including an exposure station and a load/unload station, the exposure station being positioned in an operative relationship with the optical projection means; and at least two substrate stages, carried by the platen, for independently transporting substrates simultaneously between the exposure station and the load/unload station.
Claim 21
Dependent Claim
61 words
A lithographic system, comprising: optical projection means for projecting an image on a substrate; a platen, including an exposure station and a load/unload station, the exposure station being positioned in an operative relationship with the optical projection means; and at least two substrate stages, carried by the platen, for independently transporting substrates simultaneously between the exposure station and the load/unload station.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-10-13 | 2001-04-14 | 2001-10-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-10-13 | 2005-04-14 | 2005-10-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-10-13 | 2009-04-14 | 2009-10-14 | $7700.00 | Window Closed / Lapsed |