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US6068539A Expired / Lapsed US ⏱️ 0.0 years remaining

Wafer polishing device with movable window

Assignee: Applied Materials Inc
•
Filing: 1998-03-10
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Granted: 2000-05-30
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Expires: 2018-03-10
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Abstract

Abstract A wafer polishing device with movable window can be used for in-situ monitoring of a wafer during CMP processing. During most of the CMP operation, the window remains below a polishing surface of a polishing device to protect the window from the deleterious effects of the polishing process. When the window moves into position between the wafer and a measurement sensor, the window is moved closer to the polishing surface. In this position, at least some polishing agent collected in the recess above the window is removed, and an in-situ measurement can be taken with reduced interference from the polishing agent. After the window is positioned away from the wafer and measurement sensor, the window moves farther away from the wafer and polishing surface. With such a movable window, the limitations of current polishing devices are overcome.

Inventors

  • 👤 Rajeev Bajaj
  • 👤 Herbert E. Litvak
  • 👤 Rahul K. Surana
  • 👤 Stephen C. Jew
  • 👤 Jiri Pecen

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 15:02
CPC Classifications
B; B24; B24D; B24D7/00; B24D7/12; B24B; B24B21/00; B24B21/04; B24B37/00; B24B37/04; B24B49/00; B24B49/12

Claims Analysis

Total Claims: 42
Claim 1
Independent Claim 57 words
A chemical mechanical polishing element comprising: a belt comprising a polishing surface, said belt formed in a closed loop; and a window comprising a first surface and movably disposed within said belt to move between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position.
Claim 2
Dependent Claim 57 words
A chemical mechanical polishing element comprising: a belt comprising a polishing surface, said belt formed in a closed loop; and a window comprising a first surface and movably disposed within said belt to move between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position.
Claim 3
Dependent Claim 116 words
In a linear chemical mechanical polisher of the type comprising: at least two rollers, a belt comprising a polishing surface, said belt mounted to extend between the rollers such that rotation of the rollers drives the belt, and a wafer carrier positioned adjacent the belt to press a wafer into contact with the belt intermediate the rollers, the improvement comprising: a window comprising a first surface and movably disposed within said belt to move between first and second positions, said first surface being closer to the polishing surface in the second position than in the first position, said window positioned to move intermittently into alignment with the wafer as the belt is driven by the rollers.
Claim 4
Dependent Claim 116 words
In a linear chemical mechanical polisher of the type comprising: at least two rollers, a belt comprising a polishing surface, said belt mounted to extend between the rollers such that rotation of the rollers drives the belt, and a wafer carrier positioned adjacent the belt to press a wafer into contact with the belt intermediate the rollers, the improvement comprising: a window comprising a first surface and movably disposed within said belt to move between first and second positions, said first surface being closer to the polishing surface in the second position than in the first position, said window positioned to move intermittently into alignment with the wafer as the belt is driven by the rollers.
Claim 5
Dependent Claim 22 words
The invention of claim 1 or 2, wherein said first surface is substantially flush with said polishing surface in the second position.
Claim 6
Dependent Claim 18 words
The invention of claim 1 or 2, further comprising a flexible diaphragm coupling said window with said belt.
Claim 7
Dependent Claim 14 words
The invention of claim 1 or 2, wherein said window comprises a single-piece window.
Claim 8
Dependent Claim 14 words
The invention of claim 1 or 2, wherein said window comprises a flat-sheet window.
Claim 9
Dependent Claim 14 words
The invention of claim 1 or 2, wherein said window comprises a sliding window.
Claim 10
Dependent Claim 14 words
The invention of claim 1 or 2, wherein said window comprises a bellows window.
Claim 11
Dependent Claim 15 words
The invention of claim 1 or 2, wherein said window is affixed to said belt.
Claim 12
Dependent Claim 15 words
The invention of claim 1 or 2, wherein said window is integral with said belt.
Claim 13
Dependent Claim 15 words
The invention of claim 1 or 2, wherein said window is molded in said belt.
Claim 14
Dependent Claim 23 words
The invention of claim 2, further comprising a window displacement mechanism operative to move said window from the first to the second position.
Claim 15
Dependent Claim 22 words
The invention of claim 2, further comprising a fluid platen operative to move said window from the first to the second position.
Claim 16
Dependent Claim 23 words
The invention of claim 2, further comprising a window displacement mechanism operative to move said window from the second to the first position.
Claim 17
Dependent Claim 15 words
The invention of claim 2, further comprising an in-situ measuring device coupled with said polisher.
Claim 18
Dependent Claim 51 words
A chemical mechanical polishing element comprising: a rotating platen comprising a polishing surface; and a window comprising a first surface and movably disposed within said platen to move between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position.
Claim 19
Dependent Claim 51 words
A chemical mechanical polishing element comprising: a rotating platen comprising a polishing surface; and a window comprising a first surface and movably disposed within said platen to move between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position.
Claim 20
Dependent Claim 103 words
In a chemical mechanical polisher of the type comprising: a rotating platen comprising a polishing surface, means for moving the platen along a rotating polishing path, and a wafer carrier positioned adjacent the polishing element to press a wafer against the polishing surface during a polishing operation; the improvement comprising: a window comprising a first surface and movably disposed within said rotating platen to move between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position, said window positioned to move intermittently into alignment with the wafer during the polishing operation.
Claim 21
Dependent Claim 103 words
In a chemical mechanical polisher of the type comprising: a rotating platen comprising a polishing surface, means for moving the platen along a rotating polishing path, and a wafer carrier positioned adjacent the polishing element to press a wafer against the polishing surface during a polishing operation; the improvement comprising: a window comprising a first surface and movably disposed within said rotating platen to move between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position, said window positioned to move intermittently into alignment with the wafer during the polishing operation.
Claim 22
Dependent Claim 52 words
A chemical mechanical polishing element comprising: an orbital platen comprising a polishing surface; and a window comprising a first surface and movably disposed within said platen to move between first position and second positions, said first surface being closer to said polishing surface in the second position than in the first position.
Claim 23
Dependent Claim 52 words
A chemical mechanical polishing element comprising: an orbital platen comprising a polishing surface; and a window comprising a first surface and movably disposed within said platen to move between first position and second positions, said first surface being closer to said polishing surface in the second position than in the first position.
Claim 24
Dependent Claim 101 words
In a chemical mechanical polisher of the type comprising: an orbital platen comprising a polishing surface, means for moving the platen along an orbital polishing path, and a wafer carrier positioned adjacent the platen element to press a wafer against the polishing surface during a polishing operation; the improvement comprising: a window comprising a first surface and movably disposed within said platen movable between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position, said window positioned to move intermittently into alignment with the wafer during the polishing operation.
Claim 25
Dependent Claim 101 words
In a chemical mechanical polisher of the type comprising: an orbital platen comprising a polishing surface, means for moving the platen along an orbital polishing path, and a wafer carrier positioned adjacent the platen element to press a wafer against the polishing surface during a polishing operation; the improvement comprising: a window comprising a first surface and movably disposed within said platen movable between first and second positions, said first surface being closer to said polishing surface in the second position than in the first position, said window positioned to move intermittently into alignment with the wafer during the polishing operation.
Claim 26
Dependent Claim 24 words
The invention of claim 16, 17, 18, or 19, wherein said first surface is substantially flush with said polishing surface in the second position.
Claim 27
Dependent Claim 20 words
The invention of claim 16, 17, 18, or 19, further comprising a flexible diaphragm coupling said window with said platen.
Claim 28
Dependent Claim 16 words
The invention of claim 16, 17, 18, or 19, wherein said window comprises a single-piece window.
Claim 29
Dependent Claim 16 words
The invention of claim 16, 17, 18, or 19, wherein said window comprises a flat-sheet window.
Claim 30
Dependent Claim 16 words
The invention of claim 16, 17, 18, or 19, wherein said window comprises a sliding window.
Claim 31
Dependent Claim 16 words
The invention of claim 16, 17, 18, or 19, wherein said window comprises a bellows window.
Claim 32
Dependent Claim 17 words
The invention of claim 16, 17, 18, or 19, wherein said window is affixed to said platen.
Claim 33
Dependent Claim 17 words
The invention of claim 16, 17, 18, or 19, wherein said window is integral with said platen.
Claim 34
Dependent Claim 17 words
The invention of claim 16, 17, 18, or 19, wherein said window is molded in said platen.
Claim 35
Dependent Claim 25 words
The invention of claim 17 or 19, further comprising a window displacement mechanism operative to move said window from the first to the second position.
Claim 36
Dependent Claim 24 words
The invention of claim 17 or 19, further comprising a fluid platen operative to move said window from the first to the second position.
Claim 37
Dependent Claim 25 words
The invention of claim 17 or 19, further comprising a window displacement mechanism operative to move said window from the second to the first position.
Claim 38
Dependent Claim 17 words
The invention of claim 17 or 19, further comprising an in-situ measuring device coupled with said polisher.
Claim 39
Dependent Claim 29 words
The invention of claim 1, 2, 16, 17, 18, or 19, wherein said first surface is below a pad cutting surface of a pad conditioner in the first position.
Claim 40
Dependent Claim 22 words
The invention of claim 1, 2, 16, 17, 18, or 19, wherein said first surface of said window comprises a slurry-phobic material.
Claim 41
Independent Claim 84 words
A method for in-situ monitoring of a wafer while polishing the wafer with a polishing device comprising a polishing surface, said method comprising the steps of: (a) providing a polishing device comprising a polishing surface and a window, said window movably disposed within said polishing device to move toward and away from said polishing surface; then (b) moving said window toward the polishing surface; then (c) performing an in-situ measurement of said wafer; and then (d) moving said window away from the polishing surface.
Claim 42
Independent Claim 84 words
A method for in-situ monitoring of a wafer while polishing the wafer with a polishing device comprising a polishing surface, said method comprising the steps of: (a) providing a polishing device comprising a polishing surface and a window, said window movably disposed within said polishing device to move toward and away from said polishing surface; then (b) moving said window toward the polishing surface; then (c) performing an in-situ measurement of said wafer; and then (d) moving said window away from the polishing surface.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2003-05-30 2003-11-29 2004-05-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2007-05-30 2007-11-29 2008-05-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2011-05-30 2011-11-29 2012-05-30 $7700.00 Window Closed / Lapsed

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