US5605760A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Polishing pads
Assignee: DuPont Electronic Materials Holding Inc
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Filing: 1995-08-21
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Granted: 1997-02-25
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Expires: 2015-08-21
Abstract
Abstract A pad is provided for use on a machine for the polishing of silicon wafers which allows the use of optical detection of the wafer surface condition as the wafer is being polished. This accomplished by constructing the entire pad or a portion thereof out of a solid uniform polymer sheet with no intrinsic ability to absorb or transport slurry particles and which is transparent to the light beam being used to detect the wafer surface condition by optical methods. Polymers which are transparent to light having a wavelength within the range of 190 to 3500 nanometers are suitable for the construction of these pads.
Inventors
- 👤 John V. H. Roberts
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 23:16
CPC Classifications
B; B24; B24B; B24B1/00; B24B37/00; B24B37/11; B24B37/20; B24B37/205; B24B29/00; B24B3/00; B24B3/60; B24B37/26; B82; B82Y; B82Y10/00; Y; Y10; Y10T; Y10T428/00; Y10T428/31
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
50 words
A pad useful for polishing integrated circuit wafers, said pad having at least a portion comprised of a solid uniform polymer sheet with no intrinsic ability to absorb or transport slurry particles, said polymer sheet being transparent to light having a wavelength within the range of 190 to 3500 nanometers.
Claim 2
Dependent Claim
50 words
A pad useful for polishing integrated circuit wafers, said pad having at least a portion comprised of a solid uniform polymer sheet with no intrinsic ability to absorb or transport slurry particles, said polymer sheet being transparent to light having a wavelength within the range of 190 to 3500 nanometers.
Claim 3
Dependent Claim
61 words
A pad according to claim 1 wherein said solid uniform polymer sheet has a surface with a surface texture or pattern comprising both large and small flow channels which together permit the transport of polishing slurry containing particles across said surface, said surface texture or pattern being produced solely by external means upon said surface of said solid uniform polymer sheet.
Claim 4
Dependent Claim
33 words
A pad according to claim 1 wherein said pad comprises a first portion comprised of said solid uniform polymer sheet transparent to light and a second portion comprised of a microporous polyurethane structure.
Claim 5
Dependent Claim
33 words
A pad according to claim 2 wherein said pad comprises a first portion comprised of said solid uniform polymer sheet transparent to light and a second portion comprised of a microporous polyurethane structure.
Claim 6
Dependent Claim
35 words
A pad according to claim 1 wherein said pad comprises a first portion comprised of said solid uniform polymer sheet transparent to light and a second portion comprised of a filled or blown polyurethane structure.
Claim 7
Dependent Claim
35 words
A pad according to claim 2 wherein said pad comprises a first portion comprised of said solid uniform polymer sheet transparent to light and a second portion comprised of a filled or blown polyurethane structure.
Claim 8
Dependent Claim
94 words
A pad according to claim 1 wherein said pad comprises a first portion comprised of said solid uniform polymer sheet transparent to light and a second portion comprised of a solid uniform polymer sheet with no intrinsic ability to absorb or transport slurry particles, said second portion having a surface with a surface texture or pattern comprising both large and small flow channels which together permit the transport of polishing slurry containing particles across said surface, said surface texture being produced solely by external means upon said surface of said solid uniform polymer sheet.
Claim 9
Dependent Claim
94 words
A pad according to claim 2 wherein said pad comprises a first portion comprised of said solid uniform polymer sheet transparent to light and a second portion comprised of a solid uniform polymer sheet with no intrinsic ability to absorb or transport slurry particles; said second portion having a surface with a surface texture or pattern comprising both large and small flow channels which together permit the transport of polishing slurry containing particles across said surface, said surface texture being produced solely by external means upon said surface of said solid uniform polymer sheet.
References Cited (Backward Citations)
US5081796A
Cited
US5036015A
Cited
US5240552A
Cited
US5337015A
Cited
US5413941A
Cited
US5489233A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-02-25 | 2000-08-26 | 2001-02-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-02-25 | 2004-08-26 | 2005-02-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-02-25 | 2008-08-26 | 2009-02-25 | $7700.00 | Window Closed / Lapsed |