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US5000831A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of production of amorphous hydrogenated carbon layer

Assignee: Minolta Co Ltd
•
Filing: 1988-03-07
•
Granted: 1991-03-19
•
Expires: 2008-03-07
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Abstract

Abstract The present invention provides a method of plasma-polymerization at low temperature (from normal temperature to about 100° C.) and that at low frequency.

Inventors

  • 👤 Izumi Osawa
  • 👤 Shuji Iino
  • 👤 Hideo Hotomi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 08:01
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5096

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 126 words
A method of production of an amorphous hydrogenated carbon layer for a photosensitive member, which comprises: (a) forming a photosensitive layer on a substrate; (b) introducing organic compounds of hydrocarbon series which have an unsaturated bond and a boiling point within the range of from between -50° C. and +15° C., and maintaining a temperature of the substrate to be less than 100° C.; (c) decomposing the organic compounds into radical seeds or ionic seeds by a plasma-discharge with low frequency within the range of from between 10 KHz and 1000 KHz; and (d) depositing said radical seeds of said ionic seeds on a surface of the photosensitive layer, thereby an amorphous hydrogenated carbon layer is formed at the most external surface of the photosensitive member.
Claim 2
Independent Claim 126 words
A method of production of an amorphous hydrogenated carbon layer for a photosensitive member, which comprises: (a) forming a photosensitive layer on a substrate; (b) introducing organic compounds of hydrocarbon series which have an unsaturated bond and a boiling point within the range of from between -50° C. and +15° C., and maintaining a temperature of the substrate to be less than 100° C.; (c) decomposing the organic compounds into radical seeds or ionic seeds by a plasma-discharge with low frequency within the range of from between 10 KHz and 1000 KHz; and (d) depositing said radical seeds of said ionic seeds on a surface of the photosensitive layer, thereby an amorphous hydrogenated carbon layer is formed at the most external surface of the photosensitive member.
Claim 3
Dependent Claim 26 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein said organic compounds of hydrocarbon series have three or four carbon members.
Claim 4
Dependent Claim 21 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein the photosensitive layer includes organic photosensitive material.
Claim 5
Dependent Claim 42 words
A method of production of amorphous hydrogenated carbon layer of claim 1, wherein the photosensitive layer comprises a charge generating layer which comprises a charge generating material and a charge transporting layer which comprises a charge transporting material and a binder resin.
Claim 6
Dependent Claim 26 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein the photosensitive layer is formed by an As 2 Se 3 alloy.
Claim 7
Dependent Claim 81 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein the organic compounds of hydrocarbon series are selected from the group consisting of propylene (bp: -47.8° C.), cyclopropene (bp:-36° C.), allene (bp:-32° C.), methylacetylene (bp:-27.5° C.), isobutylene (bp:-6.6° C.), 1-butene (bp:-6.1° C.), butadiene (bp:-2.6° C.), 2-butene (bp:0.96° C.), cyclobutene (bp:2.0° C.), monovinylacetylene (bp:5.1° C.), 1-butyne (bp:8.3° C.), butadiyne (bp:9.5° C.), methylallene (bp:10.3° C.), vinyl chloride (bp:-13.9° C.), chlorotrifluoroethylene (bp:-28° C.), perfluoropropylene (bp:-29° C.) and a mixture thereof.
Claim 8
Dependent Claim 28 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein the organic compounds of hydrogencarbon series are plasma-polymerized together with halogen atom containing compounds.
Claim 9
Dependent Claim 36 words
A method of production of an amorphous hydrogenated carbon layer of claim 7, wherein the halogen containing compounds are selected from the group consisting of vinyl chloride (bp:-13.9° C.), chlorotrifluoroethylene (bp:-28° C.) and a mixture thereof.
Claim 10
Dependent Claim 27 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein the organic compounds of hydrogencarbon series are plasma-polymerized together with boron containing compounds.
Claim 11
Dependent Claim 51 words
A method of production of an amorphous hydrogenated carbon layer of claim 9, wherein the boron containing compounds are selected from the group consisting of B(OC 2 H 5 ) 3 , B 2 H 6 , B 2 Cl 3 , BBr 3 , BF 3 and a mixture thereof.
Claim 12
Dependent Claim 27 words
A method of production of an amorphous hydrogenated carbon layer of claim 1, wherein the organic compounds of hydrogencarbon series are plasma-polymerized together with phosphorous containing compounds.
Claim 13
Dependent Claim 49 words
A method of production of an amorphous hydrogenated carbon layer of claim 11, wherein the phosphorous containing compounds are selected from the group consisting of PO(OCH 3 ) 3 , (C 2 H 5 ) 3 P, PH 3 , PF 5 , POCl 3 and a mixture thereof.

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-03-18 1994-09-17 1995-03-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-03-18 1998-09-17 1999-03-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-03-18 2002-09-17 2003-03-19 $7700.00 Window Closed / Lapsed

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