US8743343B2
Active / In Force
US
⏱️ 6.3 years remaining
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
Assignee: Nikon Corp
•
Filing: 2013-01-30
•
Granted: 2014-06-03
•
Expires: 2033-01-30
Abstract
Abstract A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.
Inventors
- 👤 Alex Ka Tim Poon
- 👤 Leonard Wai Fung Kho
- 👤 Gaurav Keswani
- 👤 Derek Coon
- 👤 Daishi Tanaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 11:05
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/70691; G03F7/70733
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
205 words
A lithographic projection apparatus comprising: a projection optical assembly having a final optical element; a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid; a confinement member which encircles a portion of a path of the exposure beam, the confinement member having an aperture through which the exposure beam is projected; and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, a first portion of the space located between the confinement member and an upper surface of the movable member, and a second portion of the space located between a bottom surface of the movable member and the substrate, the substrate table, or both, wherein the movable member has a recovery outlet from which the immersion liquid in the second portion is removed, and the movable member is movable to a position at which a portion of the upper surface of the movable member is located closer to an optical axis of the projection optical assembly than is an edge of the aperture.
Claim 2
Dependent Claim
205 words
A lithographic projection apparatus comprising: a projection optical assembly having a final optical element; a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid; a confinement member which encircles a portion of a path of the exposure beam, the confinement member having an aperture through which the exposure beam is projected; and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, a first portion of the space located between the confinement member and an upper surface of the movable member, and a second portion of the space located between a bottom surface of the movable member and the substrate, the substrate table, or both, wherein the movable member has a recovery outlet from which the immersion liquid in the second portion is removed, and the movable member is movable to a position at which a portion of the upper surface of the movable member is located closer to an optical axis of the projection optical assembly than is an edge of the aperture.
Claim 3
Dependent Claim
19 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member is located above the substrate table.
Claim 4
Dependent Claim
17 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member supplies the immersion liquid.
Claim 5
Dependent Claim
35 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member confines the immersion liquid to cover a localized area that is smaller than an area of an upper surface of the substrate.
Claim 6
Dependent Claim
23 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member encircles the final optical element of the projection optical assembly.
Claim 7
Dependent Claim
19 words
The lithographic projection apparatus according to claim 5 , wherein the confinement member is spaced from the stage assembly.
Claim 8
Dependent Claim
19 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member is spaced from the stage assembly.
Claim 9
Dependent Claim
48 words
The lithographic projection apparatus according to claim 1 , wherein the immersion liquid in the second portion is removed via the recovery outlet of the movable member while the movable member is present in the space between the confinement member and the substrate, the substrate table, or both.
Claim 10
Dependent Claim
25 words
The lithographic projection apparatus according to claim 1 , wherein the upper surface of the movable member that faces toward the confinement member is hydrophilic.
Claim 11
Dependent Claim
21 words
The lithographic projection apparatus according to claim 1 , wherein the bottom surface of the movable member includes a fluoric material.
Claim 12
Dependent Claim
25 words
The lithographic projection apparatus according to claim 1 , wherein the bottom surface of the movable member is hydrophobic with regard to the immersion liquid.
Claim 13
Dependent Claim
22 words
The lithographic projection apparatus according to claim 1 , wherein the movable member has a thickness of 50 microns to 5 mm.
Claim 14
Dependent Claim
22 words
The lithographic projection apparatus according to claim 1 , wherein the movable member has a thickness of 50 microns to 200 microns.
Claim 15
Dependent Claim
33 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member includes a porous member through which the immersion liquid is recovered during exposure of the substrate with the exposure beam.
Claim 16
Dependent Claim
17 words
The lithographic projection apparatus according to claim 14 , wherein the confinement member supplies the immersion liquid.
Claim 17
Dependent Claim
33 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member includes a recovery outlet through which the immersion liquid is recovered during exposure of the substrate with the exposure beam.
Claim 18
Dependent Claim
17 words
The lithographic projection apparatus according to claim 16 , wherein the confinement member supplies the immersion liquid.
Claim 19
Independent Claim
196 words
A device manufacturing method in which a substrate is exposed with an exposure beam from a final optical element of a projection optical assembly and through an immersion liquid while the substrate is supported by a substrate table of a stage assembly, a confinement member encircling a portion of a path of the exposure beam and the confinement member having an aperture through which the exposure beam is projected, the method comprising: moving a movable member in a space between the confinement member and the substrate, the substrate table, or both, such that the space is divided into a first portion located between the confinement member and an upper surface of the movable member, and into a second portion located between a bottom surface of the movable member and the substrate, the substrate table, or both, the movable member being movable to a position at which a portion of the upper surface of the movable member is located closer to an optical axis of the projection optical assembly than is an edge of the aperture; and removing the immersion liquid from the second portion of the space with a recovery outlet provided in the movable member.
Claim 20
Independent Claim
196 words
A device manufacturing method in which a substrate is exposed with an exposure beam from a final optical element of a projection optical assembly and through an immersion liquid while the substrate is supported by a substrate table of a stage assembly, a confinement member encircling a portion of a path of the exposure beam and the confinement member having an aperture through which the exposure beam is projected, the method comprising: moving a movable member in a space between the confinement member and the substrate, the substrate table, or both, such that the space is divided into a first portion located between the confinement member and an upper surface of the movable member, and into a second portion located between a bottom surface of the movable member and the substrate, the substrate table, or both, the movable member being movable to a position at which a portion of the upper surface of the movable member is located closer to an optical axis of the projection optical assembly than is an edge of the aperture; and removing the immersion liquid from the second portion of the space with a recovery outlet provided in the movable member.
Claim 21
Dependent Claim
17 words
The method according to claim 18 , wherein the confinement member is located above the substrate table.
Claim 22
Dependent Claim
26 words
The method according to claim 18 , wherein the movable member is not present in the space while the substrate is exposed with the exposure beam.
Claim 23
Dependent Claim
36 words
The method according to claim 18 , wherein the movable member is moved into the space to divide the space into the first and second portions after the substrate has been exposed with the exposure beam.
Claim 24
Dependent Claim
15 words
The method according to claim 18 , wherein the confinement member supplies the immersion liquid.
Claim 25
Dependent Claim
33 words
The method according to claim 18 , wherein the confinement member confines the immersion liquid to cover a localized area that is smaller than an area of an upper surface of the substrate.
Claim 26
Dependent Claim
21 words
The method according to claim 18 , wherein the confinement member encircles the final optical element of the projection optical assembly.
Claim 27
Dependent Claim
17 words
The method according to claim 24 , wherein the confinement member is spaced from the stage assembly.
Claim 28
Dependent Claim
17 words
The method according to claim 18 , wherein the confinement member is spaced from the stage assembly.
Claim 29
Dependent Claim
46 words
The method according to claim 18 , wherein the immersion liquid in the second portion is removed via the recovery outlet of the movable member while the movable member is present in the space between the confinement member and the substrate, the substrate table, or both.
Claim 30
Dependent Claim
23 words
The method according to claim 18 , wherein the upper surface of the movable member that faces toward the confinement member is hydrophilic.
Claim 31
Dependent Claim
19 words
The method according to claim 18 , wherein the bottom surface of the movable member includes a fluoric material.
Claim 32
Dependent Claim
23 words
The method according to claim 18 , wherein the bottom surface of the movable member is hydrophobic with regard to the immersion liquid.
Claim 33
Dependent Claim
31 words
The method according to claim 18 , wherein the confinement member includes a porous member through which the immersion liquid is recovered during exposure of the substrate with the exposure beam.
Claim 34
Dependent Claim
15 words
The method according to claim 31 , wherein the confinement member supplies the immersion liquid.
Claim 35
Dependent Claim
31 words
The method according to claim 18 , wherein the confinement member includes a recovery outlet through which the immersion liquid is recovered during exposure of the substrate with the exposure beam.
Claim 36
Dependent Claim
15 words
The method according to claim 33 , wherein the confinement member supplies the immersion liquid.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2017-06-02 | 2017-12-02 | 2018-06-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2021-06-02 | 2021-12-02 | 2022-06-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2025-06-02 | 2025-12-02 | 2026-06-03 | $7700.00 | Window Closed / Lapsed |