US7075616B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
•
Filing: 2003-11-12
•
Granted: 2006-07-11
•
Expires: 2023-11-12
Abstract
Abstract In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
Inventors
- 👤 Antonius Theodorus Anna Maria Derksen
- 👤 Sjoerd Nicolaas Lambertus Donders
- 👤 Christiaan Alexander Hoogendam
- 👤 Joeri Lof
- 👤 Erik Roelof Loopstra
- 👤 Jeroen Johannes Sophia Maria Mertens
- 👤 Johannes Catharinus Hubertus Mulkens
- 👤 Timotheus Franciscus Sengers
- 👤 Alexander Straaijer
- 👤 Bob Streefkerk
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 17:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/707; H; H10; H10P; H10P76/00; G03F7/70216; G03F7/70341; G03F7/708; G03F7/70808; G03F7/70833; G03F7/7085; G03F7/70908; G03F7/70916; G03F9/00; G03F9/70; G03F9/7088
Claims Analysis
Total Claims: 35
Claim 1
Independent Claim
112 words
A lithographic projection apparatus comprising: a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide an immersion liquid, through which said beam is to be projected, in a space between said projection system and said substrate; and a shutter configured to keep said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.
Claim 2
Dependent Claim
112 words
A lithographic projection apparatus comprising: a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide an immersion liquid, through which said beam is to be projected, in a space between said projection system and said substrate; and a shutter configured to keep said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.
Claim 3
Dependent Claim
42 words
An apparatus according to claim 1 , wherein said shutter is positionable on a side of said supply system opposite said projection system such that liquid can be confined in said liquid supply system and between said projection system and said shutter.
Claim 4
Dependent Claim
17 words
An apparatus according to claim 2 , wherein said shutter comprises a surface of said substrate table.
Claim 5
Dependent Claim
36 words
An apparatus according to claim 3 , wherein said shutter has a primary surface substantially co-planar with a surface of said substrate facing said projection system and is closely adjacent to the edge of said substrate.
Claim 6
Dependent Claim
36 words
An apparatus according to claim 2 , wherein said shutter is separable from the remainder of said apparatus, said apparatus further comprising an attachment device configured to releasably attach said shutter to said liquid supply system.
Claim 7
Dependent Claim
14 words
An apparatus according to claim 5 , wherein said attachment device comprises a magnet.
Claim 8
Dependent Claim
25 words
An apparatus according to claim 5 , wherein said attachment device comprises a vacuum outlet configured to attract said shutter to said liquid supply system.
Claim 9
Dependent Claim
62 words
An apparatus according to claim 7 , wherein said liquid supply system comprises a liquid confinement structure which extends along at least part of the boundary of said space to contain said immersion liquid and which comprises a low pressure outlet configured to seal between said structure and said substrate, said low pressure outlet forming at least part of said attachment device.
Claim 10
Dependent Claim
48 words
An apparatus according to claim 2 , wherein said shutter is separable from the remainder of said apparatus, wherein said shutter, said substrate table, or both, comprises a holding device configured to releasably hold said shutter to said substrate table, and wherein said holding device comprises a magnet.
Claim 11
Dependent Claim
30 words
An apparatus according to claim 2 , wherein, in a stowed position, said shutter has a primary surface substantially co-planar with a surface of said substrate facing said projection system.
Claim 12
Dependent Claim
14 words
An apparatus according to claim 2 , wherein said shutter comprises a guide mark.
Claim 13
Dependent Claim
22 words
An apparatus according to claim 11 , comprising a sensor configured to measure a position of said shutter using said guide mark.
Claim 14
Dependent Claim
51 words
An apparatus according to claim 2 , wherein said lithographic apparatus comprises a controller configured to move the substrate table towards the liquid supply system, at least a portion of the liquid supply system towards the substrate table, or both, so that the shutter confines liquid in said liquid supply system.
Claim 15
Dependent Claim
26 words
An apparatus according to claim 2 , wherein said shutter comprises a shape configured to center the shutter when being attached to the liquid supply system.
Claim 16
Dependent Claim
27 words
An apparatus according to claim 2 , wherein said substrate table comprises a channel to remove liquid that leaks from between said projection system and the shutter.
Claim 17
Dependent Claim
55 words
An apparatus according to claim 1 , wherein the liquid supply system comprises a liquid confinement structure extending along at least a part of the boundary of said space between the projection system and the substrate table and wherein said shutter, when keeping said projection system in contact with liquid, is positioned in said structure.
Claim 18
Dependent Claim
34 words
An apparatus according to claim 1 , wherein said liquid supply system comprises an outlet configured to remove liquid from said space and a gas inlet configured to provide flushing gas in said space.
Claim 19
Dependent Claim
44 words
An apparatus according to claim 1 , wherein said liquid supply system comprises at least one inlet to supply said immersion liquid onto the substrate and at least one outlet to remove said immersion liquid after said liquid has passed under said projection system.
Claim 20
Dependent Claim
32 words
An apparatus according to claim 1 , wherein said liquid supply system is configured to provide said liquid to a space between a final lens of said projection system and said substrate.
Claim 21
Dependent Claim
32 words
An apparatus according to claim 1 , wherein said shutter is configured to keep said projection system in contact with liquid when said substrate is moved away from under said projection system.
Claim 22
Independent Claim
66 words
A device manufacturing method comprising: providing an immersion liquid to a space between a projection system and a substrate; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate using the projection system; and maintaining said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.
Claim 23
Independent Claim
66 words
A device manufacturing method comprising: providing an immersion liquid to a space between a projection system and a substrate; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate using the projection system; and maintaining said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.
Claim 24
Dependent Claim
39 words
A method according to claim 21 , wherein maintaining said projection system in contact with liquid comprises positioning a shutter on a side opposite said projection system such that liquid is confined between said projection system and said shutter.
Claim 25
Dependent Claim
17 words
A method according to claim 22 , wherein said shutter comprises a surface of a substrate table.
Claim 26
Dependent Claim
41 words
A method according to claim 22 , wherein said shutter is separable from the remainder of a lithographic apparatus, the method further comprising releasably attaching said shutter to a liquid supply system used to provide said immersion liquid to said space.
Claim 27
Dependent Claim
23 words
A method according to claim 24 , wherein releasably attaching comprises attaching said shutter using at least one of magnetic force and vacuum.
Claim 28
Dependent Claim
18 words
A method according to claim 22 , comprising measuring a position of said shutter using a guide mark.
Claim 29
Dependent Claim
38 words
A method according to claim 22 , wherein said shutter, when keeping said projection system in contact with liquid, is positioned in a structure of a liquid supply system used to provide said immersion liquid to said space.
Claim 30
Dependent Claim
49 words
A method according to claim 22 , comprising moving a substrate table towards a liquid supply system used to provide said liquid, moving at least a portion of said liquid supply system towards said substrate table, or both, so that the shutter confines liquid in said liquid supply system.
Claim 31
Dependent Claim
20 words
A method according to claim 22 , comprising removing liquid that leaks from between said projection system and the shutter.
Claim 32
Dependent Claim
20 words
A method according to claim 21 , comprising removing liquid from said space and flushing said space with a gas.
Claim 33
Dependent Claim
44 words
A method according to claim 21 , wherein providing said immersion liquid comprises supplying said immersion liquid onto the substrate through at least one inlet and removing said immersion liquid, after said liquid has passed under said projection system, through at least one outlet.
Claim 34
Dependent Claim
25 words
A method according to claim 21 , comprising providing said liquid to a space between a final lens of said projection system and said substrate.
Claim 35
Dependent Claim
31 words
A method according to claim 21 , wherein said maintaining comprises maintaining said projection system in contact with liquid after said substrate has been moved away from under said projection system.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2009-07-10 | 2010-01-09 | 2010-07-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2013-07-10 | 2014-01-09 | 2014-07-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2017-07-10 | 2018-01-09 | 2018-07-11 | $7700.00 | Window Closed / Lapsed |