US3573975A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photochemical fabrication process
Assignee: International Business Machines Corp
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Filing: 1968-07-10
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Granted: 1971-04-06
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Expires: 1988-07-10
Abstract
Abstract IN A PHOTOCHEMICAL FABRICATION PROCESS WHEREIN A PHOTORESIST LAYER IS IMAGE-WISE EXPOSED BY CONTACT EXPOSURE THROUGH A MASK, THE IMPROVEMENT OF PROVIDING A LIQUID INTERFACE BETWEEN THE PHOTORESIST LAYER AND MASK PRIOR AND DURING EXPOSURE.
Inventors
- 👤 Vir A Dhaka
- 👤 Edwin R Clark
- 👤 Arnold Pinck
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 05:25
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2041
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-04-05 | 1974-10-05 | 1975-04-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-04-05 | 1978-10-05 | 1979-04-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-04-05 | 1982-10-05 | 1983-04-06 | $7700.00 | Window Closed / Lapsed |