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US6788477B2
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Apparatus for method for immersion lithography
Assignee: Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Filing: 2002-10-22
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Granted: 2004-09-07
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Expires: 2022-10-22
Abstract
Abstract An apparatus for immersion lithography that includes an imaging lens which has a front surface, a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.
Inventors
- 👤 Burn Jeng Lin
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 08:10
CPC Classifications
G; G02; G02B; G02B7/00; G02B7/02; G02B7/028; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G02B7/04
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
89 words
An apparatus for immersion lithography comprising: an imaging lens having a front surface; a wafer having a top surface to be exposed positioned spaced-apart and juxtaposed to said front surface of the imaging lens; fluid retaining means for holding a fluid, said fluid having a refractive index between about 1.0 and about 2.0 filling a gap formed in-between said front surface of the imaging lens and said top surface of the wafer; and cover means for said fluid-retaining means to protect said fluid around said imaging lens from particulates.
Claim 2
Independent Claim
89 words
An apparatus for immersion lithography comprising: an imaging lens having a front surface; a wafer having a top surface to be exposed positioned spaced-apart and juxtaposed to said front surface of the imaging lens; fluid retaining means for holding a fluid, said fluid having a refractive index between about 1.0 and about 2.0 filling a gap formed in-between said front surface of the imaging lens and said top surface of the wafer; and cover means for said fluid-retaining means to protect said fluid around said imaging lens from particulates.
Claim 3
Dependent Claim
21 words
An apparatus for immersion lithography according to claim 1 further comprising a wafer holding means for holding said wafer in place.
Claim 4
Dependent Claim
37 words
An apparatus for immersion lithography according to claim 1 further comprising a fluid-retaining means for maintaining said fluid in said gap formed in-between said front surface of the imaging lens and said top surface of the wafer.
Claim 5
Dependent Claim
21 words
An apparatus for immersion lithography according to claim 1 further comprising a wafer holding means for holding said wafer in place.
Claim 6
Dependent Claim
35 words
An apparatus for immersion lithography according to claim 1 , wherein said apparatus is a device selected from the group consisting of a scan-and-repeat mask aligner, a step-and-repeat mask aligner and a proximity mask aligner.
Claim 7
Dependent Claim
42 words
An apparatus for immersion lithography according to claim 3 , wherein said fluid-retaining means further comprises fluid circulating means for circulating said fluid through the gap formed in-between said front surface of the imaging lens and said top surface of the wafer.
Claim 8
Dependent Claim
27 words
An apparatus for immersion lithography according to claim 3 , wherein said fluid-retaining means further comprises a temperature controlling means for controlling a temperature of said fluid.
Claim 9
Dependent Claim
25 words
An apparatus for immersion lithography according to claim 3 , wherein said fluid-retaining means further comprises a fluid-filter means for substantially maintaining said fluid particle-free.
Claim 10
Dependent Claim
19 words
An apparatus for immersion lithography according to claim 6 , wherein said fluid circulating means being a pump device.
Claim 11
Dependent Claim
37 words
An apparatus for immersion lithography according to claim 1 , wherein said fluid-retaining means further comprises: a fluid inlet for replenish fluid in said fluid-retaining means; and a fluid outlet for discharging fluid from said fluid-retaining means.
Claim 12
Dependent Claim
23 words
An apparatus for immersion lithography according to claim 2 , wherein said wafer holding means being a vacuum means or a mechanical means.
Claim 13
Dependent Claim
19 words
An apparatus for immersion lithography according to claim 2 , wherein said wafer holding means further comprises wafer-tilting means.
Claim 14
Dependent Claim
24 words
An apparatus for immersion lithography according to claim 1 further comprising mirror means for monitoring a position of said imaging lens and said wafer.
Claim 15
Independent Claim
82 words
A method for conducting immersion lithography comprising the steps of: providing an imaging lens having a front surface; positioning a wafer having a top surface to be exposed spaced-apart and juxtaposed to said front surface of the imaging lens; maintaining a fluid having a refractive index between about 1.0 and about 2.0 in a gap formed in-between said front surface of the imaging lens and said top surface of the wafer; and moving said imaging lens in a longitudinal direction for focusing.
Claim 16
Independent Claim
82 words
A method for conducting immersion lithography comprising the steps of: providing an imaging lens having a front surface; positioning a wafer having a top surface to be exposed spaced-apart and juxtaposed to said front surface of the imaging lens; maintaining a fluid having a refractive index between about 1.0 and about 2.0 in a gap formed in-between said front surface of the imaging lens and said top surface of the wafer; and moving said imaging lens in a longitudinal direction for focusing.
Claim 17
Dependent Claim
25 words
A method for conducting immersion lithography according to claim 14 further comprising the step of moving said wafer in a lateral direction for repeated exposures.
Claim 18
Dependent Claim
21 words
A method for conducting immersion lithography according to claim 14 further comprising the step of controlling a temperature of said fluid.
Claim 19
Dependent Claim
21 words
A method for conducting immersion lithography according to claim 14 further comprising the step of submerging said wafer in the fluid.
Claim 20
Dependent Claim
36 words
A method for conducting immersion lithography according to claim 14 further comprising the step of controlling a flow of said fluid between said front surface of the imaging lens and said top surface of the wafer.
Claim 21
Dependent Claim
23 words
A method for conducting immersion lithography according to claim 14 further comprising the step of filtering said fluid to substantially remove all particles.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2007-09-07 | 2008-03-08 | 2008-09-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-09-07 | 2012-03-08 | 2012-09-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-09-07 | 2016-03-08 | 2016-09-07 | $7700.00 | Window Closed / Lapsed |