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US8400610B2 Active / In Force US ⏱️ 5.7 years remaining

Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine

Assignee: Nikon Corp
•
Filing: 2012-06-25
•
Granted: 2013-03-19
•
Expires: 2032-06-25
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Abstract

Abstract Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.

Inventors

  • 👤 Alex Poon
  • 👤 Leonard Kho
  • 👤 Gaurav Keswani
  • 👤 Derek Coon
  • 👤 Daishi Tanak

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 09:23
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/70691; G03F7/70733

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 150 words
A lithographic projection apparatus comprising: a projection optical assembly having a final optical element; a stage assembly including a substrate table on which a substrate is supported; a confinement member which encircles a portion of a path of an exposure beam under the final optical element of the projection optical assembly; and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, a first portion of the space located between the confinement member and the movable member, and a second portion of the space located between the movable member and the substrate, the substrate table, or both, wherein the substrate supported by the substrate table is exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, and the immersion liquid in the second portion is removed via the confinement member.
Claim 2
Dependent Claim 150 words
A lithographic projection apparatus comprising: a projection optical assembly having a final optical element; a stage assembly including a substrate table on which a substrate is supported; a confinement member which encircles a portion of a path of an exposure beam under the final optical element of the projection optical assembly; and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, a first portion of the space located between the confinement member and the movable member, and a second portion of the space located between the movable member and the substrate, the substrate table, or both, wherein the substrate supported by the substrate table is exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, and the immersion liquid in the second portion is removed via the confinement member.
Claim 3
Dependent Claim 28 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member includes a porous member through which the immersion liquid is removed from the second portion.
Claim 4
Dependent Claim 17 words
The lithographic projection apparatus according to claim 2 , wherein the confinement member supplies the immersion liquid.
Claim 5
Dependent Claim 28 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member includes a recovery outlet through which the immersion liquid is removed from the second portion.
Claim 6
Dependent Claim 17 words
The lithographic projection apparatus according to claim 4 , wherein the confinement member supplies the immersion liquid.
Claim 7
Dependent Claim 17 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member supplies the immersion liquid.
Claim 8
Dependent Claim 35 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member confines the immersion liquid to cover a localized area that is smaller than an area of an upper surface of the substrate.
Claim 9
Dependent Claim 23 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member encircles the final optical element of the projection optical assembly.
Claim 10
Dependent Claim 19 words
The lithographic projection apparatus according to claim 8 , wherein the confinement member is spaced from the stage assembly.
Claim 11
Dependent Claim 19 words
The lithographic projection apparatus according to claim 1 , wherein the confinement member is spaced from the stage assembly.
Claim 12
Dependent Claim 44 words
The lithographic projection apparatus according to claim 1 , wherein the immersion liquid in the second portion is removed via the confinement member while the movable member is present in the space between the confinement member and the substrate, the substrate table, or both.
Claim 13
Dependent Claim 24 words
The lithographic projection apparatus according to claim 1 , wherein a surface of the movable member that faces toward the confinement member is hydrophilic.
Claim 14
Dependent Claim 21 words
The lithographic projection apparatus according to claim 1 , wherein a bottom surface of the movable member includes a fluoric material.
Claim 15
Dependent Claim 25 words
The lithographic projection apparatus according to claim 1 , wherein a bottom surface of the movable member is hydrophobic with regard to the immersion liquid.
Claim 16
Dependent Claim 22 words
The lithographic projection apparatus according to claim 1 , wherein the movable member has a thickness of 50 microns to 5 mm.
Claim 17
Dependent Claim 22 words
The lithographic projection apparatus according to claim 1 , wherein the movable member has a thickness of 50 microns to 200 microns.

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2016-03-18 2016-09-17 2017-03-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2020-03-18 2020-09-17 2021-03-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2024-03-18 2024-09-17 2025-03-19 $7700.00 Window Closed / Lapsed

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