Patent US3722152A successfully refreshed from Google Patents.
US8064044B2
Expired / Lapsed
US
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Exposure apparatus, exposure method, and device producing method
Assignee: Nikon Corp
•
Filing: 2004-12-27
•
Granted: 2011-11-22
•
Expires: 2024-12-27
Abstract
Abstract An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism ( 10 ). The exposure apparatus (EX) has a pressure adjustment mechanism ( 90 ) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism ( 10 ). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.
Inventors
- 👤 Hiroyuki Nagasaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 22:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70691; G03F7/70716; G03F7/70725; G03F7/20; G03F7/2041; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 32
Claim 1
Independent Claim
143 words
An exposure apparatus comprising: a projection optical system from which an exposure light is radiated onto a substrate through a liquid to expose the substrate; a liquid supply system which supplies the liquid; a liquid recovery system which recovers the liquid; and a substrate stage which holds the substrate, wherein: a magnitude of a velocity of movement of the substrate stage for moving the substrate stage substantially linearly from a first position to a second position in a state in which a liquid immersion area is locally formed on the substrate stage by using the liquid supply system and the liquid recovery system, is decreased when a distance between the first position and the second position is not less than a predetermined amount, as compared with when the distance between the first position and the second position is less than the predetermined amount.
Claim 2
Dependent Claim
143 words
An exposure apparatus comprising: a projection optical system from which an exposure light is radiated onto a substrate through a liquid to expose the substrate; a liquid supply system which supplies the liquid; a liquid recovery system which recovers the liquid; and a substrate stage which holds the substrate, wherein: a magnitude of a velocity of movement of the substrate stage for moving the substrate stage substantially linearly from a first position to a second position in a state in which a liquid immersion area is locally formed on the substrate stage by using the liquid supply system and the liquid recovery system, is decreased when a distance between the first position and the second position is not less than a predetermined amount, as compared with when the distance between the first position and the second position is less than the predetermined amount.
Claim 3
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate with the exposure apparatus of claim 1 ; and processing the substrate to form the device.
Claim 4
Dependent Claim
31 words
The exposure apparatus according to claim 1 , wherein the liquid immersion area formed on the substrate stage includes a liquid immersion area on the substrate held on the substrate stage.
Claim 5
Dependent Claim
48 words
The exposure apparatus according to claim 1 , wherein when the distance between the first position and the second position is not less than the predetermined amount, the magnitude of the velocity of movement of the substrate stage is decreased such that the liquid is prevented from leaking.
Claim 6
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate with the exposure apparatus of claim 4 ; and processing the substrate to form the device.
Claim 7
Dependent Claim
34 words
The exposure apparatus according to claim 1 , wherein the magnitude of the velocity of movement of the substrate is decreased such that a liquid immersion area locally formed on the substrate is maintained.
Claim 8
Dependent Claim
38 words
The exposure apparatus according to claim 1 , wherein the magnitude of the velocity of movement of the substrate is decreased such that no gas portion is formed in a liquid immersion area locally formed on the substrate.
Claim 9
Dependent Claim
132 words
An exposure apparatus comprising: a projection optical system from which an exposure light is radiated onto a substrate through a liquid to expose the substrate; a liquid supply system which supplies the liquid; a liquid recovery system which recovers the liquid; and a substrate stage which holds the substrate, wherein: a magnitude of a velocity of movement of the substrate stage for moving the substrate stage substantially linearly from a first position to a second position in a state in which a liquid immersion area is locally formed on the substrate stage by using the liquid supply system and the liquid recovery system, is decreased when the substrate stage is moved in a predetermined direction, as compared with when the substrate stage is moved in a direction different from the predetermined direction.
Claim 10
Dependent Claim
132 words
An exposure apparatus comprising: a projection optical system from which an exposure light is radiated onto a substrate through a liquid to expose the substrate; a liquid supply system which supplies the liquid; a liquid recovery system which recovers the liquid; and a substrate stage which holds the substrate, wherein: a magnitude of a velocity of movement of the substrate stage for moving the substrate stage substantially linearly from a first position to a second position in a state in which a liquid immersion area is locally formed on the substrate stage by using the liquid supply system and the liquid recovery system, is decreased when the substrate stage is moved in a predetermined direction, as compared with when the substrate stage is moved in a direction different from the predetermined direction.
Claim 11
Dependent Claim
34 words
The exposure apparatus according to claim 8 , wherein no liquid recovery port of the liquid recovery system is arranged at a side of a space under the projection system in the predetermined direction.
Claim 12
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate with the exposure apparatus of claim 8 ; and processing the substrate to form the device.
Claim 13
Dependent Claim
40 words
The exposure apparatus according to claim 8 , wherein when the substrate stage is moved in the predetermined direction, the magnitude of the velocity of movement of the substrate stage is decreased such that the liquid is prevented from leaking.
Claim 14
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate with the exposure apparatus of claim 11 ; and processing the substrate to form the device.
Claim 15
Dependent Claim
34 words
The exposure apparatus according to claim 8 , wherein the magnitude of the velocity of movement of the substrate is decreased such that a liquid immersion area locally formed on the substrate is maintained.
Claim 16
Dependent Claim
38 words
The exposure apparatus according to claim 8 , wherein the magnitude of the velocity of movement of the substrate is decreased such that no gas portion is formed in a liquid immersion area locally formed on the substrate.
Claim 17
Dependent Claim
97 words
An exposure method comprising: exposing a substrate by radiating an exposure light beam onto the substrate through a liquid; and moving the substrate from a first position to a second position while retaining the liquid on the substrate; wherein a magnitude of a velocity of movement of the substrate from the first position to the second position is decreased when a distance between the first position and the second position is not less than a predetermined distance, as compared with when the distance between the first position and the second position is less than the predetermined distance.
Claim 18
Dependent Claim
97 words
An exposure method comprising: exposing a substrate by radiating an exposure light beam onto the substrate through a liquid; and moving the substrate from a first position to a second position while retaining the liquid on the substrate; wherein a magnitude of a velocity of movement of the substrate from the first position to the second position is decreased when a distance between the first position and the second position is not less than a predetermined distance, as compared with when the distance between the first position and the second position is less than the predetermined distance.
Claim 19
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate by the exposure method of claim 15 ; and processing the substrate to form the device.
Claim 20
Dependent Claim
29 words
The exposure method according to claim 15 , wherein the magnitude of the velocity of movement of the substrate is decreased such that the liquid is prevented from leaking.
Claim 21
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate by the exposure method of claim 17 ; and processing the substrate to form the device.
Claim 22
Dependent Claim
34 words
The exposure method according to claim 15 , wherein the magnitude of the velocity of movement of the substrate is decreased such that a liquid immersion area locally formed on the substrate is maintained.
Claim 23
Dependent Claim
38 words
The exposure method according to claim 15 , wherein the magnitude of the velocity of movement of the substrate is decreased such that no gas portion is formed in a liquid immersion area locally formed on the substrate.
Claim 24
Dependent Claim
22 words
The exposure method according to claim 15 , wherein the substrate is linearly moved from the first position to the second position.
Claim 25
Dependent Claim
23 words
The exposure method according to claim 15 , wherein the predetermined amount is determined based on affinity of the substrate for the liquid.
Claim 26
Dependent Claim
84 words
An exposure method comprising: exposing a substrate by radiating an exposure light beam onto the substrate through a liquid; and moving the substrate from a first position to a second position while retaining the liquid on the substrate, wherein a magnitude of a velocity of movement of the substrate from the first position to the second position is decreased when the substrate is moved in a predetermined direction as compared with when the substrate is moved in a direction different from the predetermined direction.
Claim 27
Dependent Claim
84 words
An exposure method comprising: exposing a substrate by radiating an exposure light beam onto the substrate through a liquid; and moving the substrate from a first position to a second position while retaining the liquid on the substrate, wherein a magnitude of a velocity of movement of the substrate from the first position to the second position is decreased when the substrate is moved in a predetermined direction as compared with when the substrate is moved in a direction different from the predetermined direction.
Claim 28
Dependent Claim
26 words
A method for producing a device, comprising: exposing a substrate by the exposure method of claim 23 ; and processing the substrate to form the device.
Claim 29
Dependent Claim
29 words
The exposure method according to claim 23 , wherein the magnitude of the velocity of movement of the substrate is decreased such that the liquid is prevented from leaking.
Claim 30
Dependent Claim
34 words
The exposure method according to claim 23 , wherein the magnitude of the velocity of movement of the substrate is decreased such that a liquid immersion area locally formed on the substrate is maintained.
Claim 31
Dependent Claim
38 words
The exposure method according to claim 23 , wherein the magnitude of the velocity of movement of the substrate is decreased such that no gas portion is formed in a liquid immersion area locally formed on the substrate.
Claim 32
Dependent Claim
22 words
The exposure method according to claim 23 , wherein the substrate is linearly moved from the first position to the second position.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2014-11-21 | 2015-05-23 | 2015-11-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2018-11-21 | 2019-05-23 | 2019-11-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2022-11-21 | 2023-05-23 | 2023-11-22 | $7700.00 | Window Closed / Lapsed |