EP1528433A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Lithographic apparatus
Assignee: ASML Netherlands BV
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Filing: 2004-10-26
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Granted: —
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Expires: 2024-10-26
Abstract
Abstract Liquid is supplied to a reservoir (10) between the final element of the projection system (PS) and the substrate by an inlet (21,22). An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant.
Inventors
- 👤 Christiaan Alexander Hoogendam
- 👤 Bob Streefkerk
- 👤 Johannes Catharinus Hubertus Mulkens
- 👤 Erik Theodorus Maria Bijlaart
- 👤 Aleksey Yurievich Kolesnychenko
- 👤 Erik Roelof Loopstra
- 👤 J.J.S.M. Mertens
- 👤 Bernardus Antonius Slaghekke
- 👤 P.A.J. Tinnemans
- 👤 Helmar Van Santen
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 16:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70808; G03F7/70216; G03F7/70341; G03F7/70858; G03F7/70866
Claims Analysis
Total Claims: 29
Claim 1
Independent Claim
99 words
A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving
to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the
substrate; and a liquid supply system for at least partly filling a space between the final element
of said projection system and said substrate with a liquid to form a liquid
reservoir, characterized by further comprising an overflow from said liquid reservoir.
Claim 2
Dependent Claim
26 words
A lithographic projection apparatus according to claim 1 further comprising an
inlet for supplying liquid to said space wherein said overflow is arranged above said inlet.
Claim 3
Dependent Claim
34 words
A lithographic projection apparatus according to either claim 1 or claim 2 wherein
said liquid is bounded by a barrier, an entrance to said overflow being positioned on the
opposite side of the barrier.
Claim 4
Dependent Claim
32 words
A lithographic projection apparatus according to claim 3 wherein said overflow is
arranged such that said liquid only flows into said overflow when said liquid flows over the
top of said barrier.
Claim 5
Dependent Claim
22 words
A lithographic projection apparatus according to any one of the preceding claims
wherein said barrier forms part of the liquid supply system.
Claim 6
Dependent Claim
37 words
A lithographic projection apparatus according to any one of the preceding claims
wherein said barrier forms a ridge having an area which is not insignificant compared to the
area of the final element of the projection system.
Claim 7
Dependent Claim
24 words
A lithographic projection apparatus according to any one of the preceding claims
wherein the space above said liquid is sealed with an airtight member.
Claim 8
Dependent Claim
25 words
A lithographic projection apparatus according to any one of the preceding claims
wherein said overflow maintains the pressure above said fluid at a constant level.
Claim 9
Dependent Claim
70 words
A lithographic projection apparatus according to any one of the preceding claims
further comprising a seal member extending along at least a part of the boundary of said
space between the final element of said projection system and said substrate table, said seal
member and said projection system forming a capillary passage, said overflow being
arranged to remove liquid at the end of at least part of said capillary passage.
Claim 10
Dependent Claim
71 words
A lithographic projection apparatus according to any one of the preceding claims
further comprising a seal member extending along at least a part of the boundary of said
space between the final element of said projection system and said substrate table and an
inlet for supplying liquid to said space, said inlet being adjacent to the inner circumference
of said seal member and directed towards the target portion of said substrate.
Claim 11
Dependent Claim
116 words
A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving
to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the
substrate; and a liquid supply system for at least partly filling a space between the final element
of said projection system and said substrate with a liquid, characterized in that said liquid is bounded by a barrier having a ridge having an area which
is not insignificant compared to the area of the final element of the projection system.
Claim 12
Dependent Claim
18 words
A lithographic projection apparatus according to claim 11 wherein said barrier is
part of said liquid supply system.
Claim 13
Dependent Claim
79 words
A lithographic projection apparatus according to either claim 11 or claim 12
further comprising a seal member extending along at least a part of the boundary of said
space between the final element of said projection system and said substrate table and an
outlet for removing liquid from said space, said seal member and said projection system
forming a capillary passage, said outlet being arranged to remove liquid at the end of at
least part of said capillary passage.
Claim 14
Dependent Claim
72 words
A lithographic projection apparatus according to any one of claims 11 to 13
further comprising a seal member extending along at least a part of the boundary of said
space between the final element of said projection system and said substrate table and an
inlet for supplying liquid to said space, said inlet being adjacent to the inner circumference
of said seal member and directed towards the target portion of said substrate.
Claim 15
Dependent Claim
158 words
A lithographic projection apparatus comprising: a substrate table for holding a substrate; a radiation system for providing a projection beam of radiation directed towards a
target portion of said substrate; a support structure for supporting patterning means, the patterning means serving
to pattern the projection beam according to a desired pattern; a projection system for projecting the patterned beam onto a target portion of the
substrate; and a liquid supply system for at least partly filling a space between the final element
of said projection system and said substrate with a liquid, said liquid supply
system comprising: an inlet for supplying liquid to said space; and a seal member extending along at least a part of the boundary of said space
between the final element of said projection system and said substrate table, characterized in that said inlet is adjacent to the inner circumference of said seal member
and is directed towards the target portion of the substrate.
Claim 16
Dependent Claim
40 words
A lithographic projection apparatus according to claim 15 wherein said liquid
supply system is arranged such that a passage is formed between an element of the
projection system and said seal member for the flow of liquid towards an outlet.
Claim 17
Dependent Claim
18 words
A lithographic projection apparatus according to claim 16 wherein said outlet is at
the end of said passage.
Claim 18
Dependent Claim
41 words
A lithographic projection apparatus according to any one of claims 15 to 17
further comprising a chamber, through which said liquid is supplied to said inlet, said
chamber having a larger cross-sectional area than the cross sectional area of said inlet.
Claim 19
Dependent Claim
52 words
A lithographic projection apparatus according to any one of claims 15 to 18
further comprising an outlet for removing liquid from said space, said seal member and
said projection system forming a capillary passage, said outlet being arranged to remove
liquid at the end of at least part of said capillary passage.
Claim 20
Dependent Claim
17 words
A lithographic projection apparatus according to any one of claims 15 to 19
further comprising an overflow.
Claim 21
Dependent Claim
164 words
A lithographic projection apparatus comprising: a substrate table for holding a substrate; a radiation system for providing a projection beam of radiation directed towards a
target portion of said substrate; a support structure for supporting patterning means, the patterning means serving
to pattern the projection beam according to a desired pattern; a projection system for projecting the patterned beam onto a target portion of the
substrate; and a liquid supply system for at least partly filling a space between the final element
of said projection system and said substrate with a liquid, said liquid supply
system comprising: a seal member extending along at least a part of the boundary of said space
between the final element of said projection system and said substrate table, an outlet for removing liquid from said space, characterized in that said seal member and said projection system form a capillary passage,
said outlet being arranged to remove liquid at the end of at least part of said capillary
passage.
Claim 22
Dependent Claim
34 words
A lithographic projection apparatus according to claim 21 further comprising an
inlet for supplying liquid to said space wherein the flow rate of said outlet is greater than
the flow rate of said inlet.
Claim 23
Dependent Claim
43 words
A lithographic projection apparatus according to either claim 21 or claim 22
further comprising an inlet for supplying liquid to said space, said inlet being adjacent to
the inner circumference of said seal member and directed towards the target portion of the
substrate.
Claim 24
Dependent Claim
44 words
A lithographic projection apparatus according to any one of claims 21 to 23
further comprising an inlet for supplying liquid to said space, said inlet being adjacent to
the inner circumference of said seal member and directed towards the target portion of said
substrate
Claim 25
Dependent Claim
17 words
A lithographic projection apparatus according to any one of claims 21 to 25
further comprising an overflow.
Claim 26
Dependent Claim
111 words
A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving
to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the
substrate; and a liquid supply system for at least partly filling a space between the final element
of said projection system and said substrate with a liquid, said liquid supply system
comprising an inlet for supplying liquid to said space, characterized by further comprising means for connecting said inlet to a high vacuum
source.
Claim 27
Dependent Claim
22 words
A lithographic projection apparatus according to claim 26 wherein said inlet
operates as an outlet when connected to said high vacuum source.
Claim 28
Dependent Claim
31 words
A lithographic projection apparatus according to either claim 26 or claim 27
wherein said means for connecting said inlet to a high vacuum source is automatically
operated upon a system failure.
Claim 29
Dependent Claim
23 words
A lithographic projection apparatus according to any one of the preceding claims
wherein said liquid reservoir covers a smaller area than said substrate.
References Cited (Backward Citations)
No citation records indexed.
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