US7495744B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure method, exposure apparatus, and method for producing device
Assignee: Nikon Corp
•
Filing: 2005-11-22
•
Granted: 2009-02-24
•
Expires: 2025-11-22
Abstract
Abstract When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a determination of a liquid immersion condition to be performed to the substrate, such as a liquid type, depending on a film (SP) formed as a liquid contact surface of the substrate. The liquid type is selected by switching between a first liquid supply section (11) and a third liquid supply section (21). It is possible to smoothly perform immersion exposure for the substrate (P) on which a different photo-resist layer is provided.
Inventors
- 👤 Hiroyuki Nagaksaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 02:27
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03B; G03B27/00; G03B27/32; G03B27/42; G03F7/20; G03F7/2041; G03F7/70325; G03F7/70691; G03F7/70716; G03F7/70725; G03F7/70775; G03F7/708; G03F7/70858; G03F7/70866
Claims Analysis
Total Claims: 66
Claim 1
Independent Claim
55 words
An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure method comprising: determining a liquid immersion condition for the substrate depending on a film formed as a liquid contact surface of the substrate; and exposing the substrate under the determined liquid immersion condition.
Claim 2
Dependent Claim
55 words
An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure method comprising: determining a liquid immersion condition for the substrate depending on a film formed as a liquid contact surface of the substrate; and exposing the substrate under the determined liquid immersion condition.
Claim 3
Dependent Claim
25 words
The exposure method according to claim 1 , wherein the liquid immersion condition is determined depending on an affinity of the film for the liquid.
Claim 4
Dependent Claim
23 words
The exposure method according to claim 2 , wherein the affinity is determined by a contact angle of the liquid with the film.
Claim 5
Dependent Claim
26 words
The exposure method according to claim 1 , wherein the liquid immersion condition includes a supply condition for the liquid to be supplied onto the substrate.
Claim 6
Dependent Claim
19 words
The exposure method according to claim 4 , wherein the supply condition includes a supply position of the liquid.
Claim 7
Dependent Claim
33 words
The exposure method according to claim 5 , wherein a distance at the supply position of the liquid from a projection area of a projection optical system is adjusted depending on the film.
Claim 8
Dependent Claim
20 words
The exposure method according to claim 4 , wherein the liquid immersion condition includes a supply amount of the liquid.
Claim 9
Dependent Claim
30 words
The exposure method according to claim 1 , wherein the liquid immersion condition includes a recovery condition for the liquid for liquid immersion exposure to be recovered from the substrate.
Claim 10
Dependent Claim
20 words
The exposure method according to claim 8 , wherein the liquid immersion condition includes a recovery position of the liquid.
Claim 11
Dependent Claim
33 words
The exposure method according to claim 9 , wherein a distance at the recovery position of the liquid from a projection area of a projection optical system is adjusted depending on the film.
Claim 12
Dependent Claim
22 words
The exposure method according to claim 8 , wherein the liquid immersion condition includes adjustment of a recovery power for the liquid.
Claim 13
Dependent Claim
25 words
The exposure method according to claim 1 , wherein the liquid immersion condition includes a type of the liquid to be supplied onto the substrate.
Claim 14
Dependent Claim
21 words
The exposure method according to claim 2 , wherein an exposure condition for the substrate is determined depending on the affinity.
Claim 15
Dependent Claim
22 words
The exposure method according to claim 13 , wherein the exposure condition for the substrate includes a movement condition for the substrate.
Claim 16
Dependent Claim
43 words
The exposure method according to claim 13 , further comprising moving the substrate in a predetermined scanning direction under a predetermined scanning exposure condition during the exposure, and determining the scanning exposure condition depending on the affinity of the film for the liquid.
Claim 17
Dependent Claim
25 words
The exposure method according to claim 15 , wherein a movement velocity of the substrate in the scanning direction is determined depending on the affinity.
Claim 18
Dependent Claim
24 words
The exposure method according to claim 1 , wherein the liquid immersion condition is determined in consideration of a movement condition for the substrate.
Claim 19
Dependent Claim
25 words
The exposure method according to claim 1 , wherein the exposure is performed in a liquid immersion area formed on a part of the substrate.
Claim 20
Dependent Claim
23 words
The exposure method according to claim 1 , wherein the film formed on the substrate is specified before determining the liquid immersion condition.
Claim 21
Dependent Claim
17 words
A method for producing a device, comprising using the exposure method as defined in claim 1 .
Claim 22
Dependent Claim
71 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a liquid supply mechanism which supplies the liquid, wherein: the liquid supply mechanism changes the liquid to be supplied, depending on a film formed as a liquid contact surface of the substrate.
Claim 23
Dependent Claim
71 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a liquid supply mechanism which supplies the liquid, wherein: the liquid supply mechanism changes the liquid to be supplied, depending on a film formed as a liquid contact surface of the substrate.
Claim 24
Dependent Claim
32 words
The exposure apparatus according to claim 21 , wherein the liquid supply mechanism has a plurality of piping systems to selectively use a plurality of types of liquids for liquid immersion exposure.
Claim 25
Dependent Claim
25 words
The exposure apparatus according to claim 21 , wherein a liquid immersion condition is adjusted depending on the liquid supplied from the liquid supply mechanism.
Claim 26
Dependent Claim
23 words
The exposure apparatus according to claim 21 , further comprising a measuring unit which measures an affinity between the liquid and the film.
Claim 27
Dependent Claim
27 words
The exposure apparatus according to claim 24 , wherein an exposure condition for the substrate is determined depending on the affinity between the liquid and the film.
Claim 28
Dependent Claim
33 words
The exposure apparatus according to claim 25 , wherein the substrate is subjected to scanning exposure while being moved in a predetermined scanning direction, and the exposure condition includes a scanning exposure condition.
Claim 29
Dependent Claim
24 words
The exposure apparatus according to claim 26 , wherein the scanning exposure condition includes a movement velocity of the substrate during the scanning exposure.
Claim 30
Dependent Claim
23 words
The exposure apparatus according to claim 24 , wherein the affinity is determined by a contact angle of the liquid with the film.
Claim 31
Dependent Claim
17 words
A method for producing a device, comprising using the exposure apparatus as defined in claim 21 .
Claim 32
Dependent Claim
61 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a measuring unit which measures an affinity between the liquid and a film formed as a liquid contact surface of the substrate.
Claim 33
Dependent Claim
61 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a measuring unit which measures an affinity between the liquid and a film formed as a liquid contact surface of the substrate.
Claim 34
Dependent Claim
53 words
The exposure apparatus according to claim 30 , further comprising a storage unit which stores a plurality of relationships between the affinity between the liquid and the film and a liquid immersion condition corresponding to the affinity, wherein the liquid immersion condition is selected from the storage unit depending on the measured affinity.
Claim 35
Dependent Claim
30 words
The exposure apparatus according to claim 31 , wherein the liquid immersion condition includes a supply condition for the liquid for liquid immersion exposure to be supplied onto the substrate.
Claim 36
Dependent Claim
27 words
The exposure apparatus according to claim 32 , wherein the supply condition includes at least one of a supply position and a supply amount of the liquid.
Claim 37
Dependent Claim
30 words
The exposure apparatus according to claim 31 , wherein the liquid immersion condition includes a recovery condition for the liquid for liquid immersion exposure to be recovered from the substrate.
Claim 38
Dependent Claim
27 words
The exposure apparatus according to claim 34 , wherein the recovery condition includes at least one of a recovery position and a recovery amount of the liquid.
Claim 39
Dependent Claim
34 words
The exposure apparatus according to claim 31 , wherein the liquid immersion condition is adjusted while considering a movement condition of the substrate when a plurality of shot areas on the substrate are exposed.
Claim 40
Dependent Claim
32 words
The exposure apparatus according claim 31 , further comprising a control unit, wherein the control unit selects the liquid immersion condition from the storage unit depending on the affinity or the film.
Claim 41
Dependent Claim
27 words
The exposure apparatus according to claim 30 , wherein an exposure condition for the substrate is determined depending on the affinity between the liquid and the film.
Claim 42
Dependent Claim
33 words
The exposure apparatus according to claim 38 , wherein the substrate is subjected to scanning exposure while being moved in a predetermined scanning direction, and the exposure condition includes a scanning exposure condition.
Claim 43
Dependent Claim
24 words
The exposure apparatus according to claim 39 , wherein the scanning exposure condition includes a movement velocity of the substrate during the scanning exposure.
Claim 44
Dependent Claim
23 words
The exposure apparatus according to claim 30 , wherein the affinity is determined by a contact angle of the liquid with the film.
Claim 45
Dependent Claim
49 words
The exposure apparatus according claim 30 , further comprising a liquid supply mechanism which supplies the liquid onto the substrate, wherein at least one of a position, an opening area, an opening shape, and a supply direction of a liquid supply port of the liquid supply mechanism is variable.
Claim 46
Dependent Claim
17 words
A method for producing a device, comprising using the exposure apparatus as defined in claim 30 .
Claim 47
Dependent Claim
87 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a storage unit which stores a plurality of relationships between an affinity for the liquid and a liquid immersion condition corresponding to the affinity, wherein the liquid immersion condition is selected from the storage unit depending on a film formed as a liquid contact surface of the substrate.
Claim 48
Dependent Claim
87 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a storage unit which stores a plurality of relationships between an affinity for the liquid and a liquid immersion condition corresponding to the affinity, wherein the liquid immersion condition is selected from the storage unit depending on a film formed as a liquid contact surface of the substrate.
Claim 49
Dependent Claim
30 words
The exposure apparatus according to claim 44 , wherein the liquid immersion condition includes a supply condition for the liquid for liquid immersion exposure to be supplied onto the substrate.
Claim 50
Dependent Claim
27 words
The exposure apparatus according to claim 45 , wherein the supply condition includes at least one of a supply position and a supply amount of the liquid.
Claim 51
Dependent Claim
30 words
The exposure apparatus according to claim 44 , wherein the liquid immersion condition includes a recovery condition for the liquid for liquid immersion exposure to be recovered from the substrate.
Claim 52
Dependent Claim
27 words
The exposure apparatus according to claim 47 , wherein the recovery condition includes at least one of a recovery position and a recovery amount of the liquid.
Claim 53
Dependent Claim
34 words
The exposure apparatus according to claim 44 , wherein the liquid immersion condition is adjusted while considering a movement condition of the substrate when a plurality of shot areas on the substrate are exposed.
Claim 54
Dependent Claim
23 words
The exposure apparatus according to claim 44 , wherein the affinity is determined by a contact angle of the liquid with the film.
Claim 55
Dependent Claim
33 words
The exposure apparatus according to claim 44 , further comprising a control unit, wherein the control unit selects the liquid immersion condition from the storage unit depending on the affinity or the film.
Claim 56
Dependent Claim
49 words
The exposure apparatus according claim 44 , further comprising a liquid supply mechanism which supplies the liquid onto the substrate, wherein at least one of a position, an opening area, an opening shape, and a supply direction of a liquid supply port of the liquid supply mechanism is variable.
Claim 57
Dependent Claim
17 words
A method for producing a device, comprising using the exposure apparatus as defined in claim 44 .
Claim 58
Dependent Claim
68 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a storage unit which stores relationships between a variety of films formable as a liquid contact surface of the substrate and liquid immersion conditions suitable for the respective films.
Claim 59
Dependent Claim
68 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a storage unit which stores relationships between a variety of films formable as a liquid contact surface of the substrate and liquid immersion conditions suitable for the respective films.
Claim 60
Dependent Claim
44 words
The exposure apparatus according claim 54 , further comprising a control unit which sets a liquid immersion condition by selecting the liquid immersion condition among the liquid immersion conditions from the storage unit depending on a film to be used for liquid immersion exposure.
Claim 61
Dependent Claim
24 words
The exposure apparatus according claim 55 , wherein the control unit adjusts the liquid immersion condition depending on a physical property of the liquid.
Claim 62
Dependent Claim
70 words
The exposure apparatus according claim 55 , further comprising a liquid supply mechanism which selectively supplies a plurality of types of liquids onto the substrate, wherein the control unit selects a liquid type from the storage unit depending on a film to be used for liquid immersion exposure, and the control unit controls the liquid supply mechanism so that the liquid supply mechanism supplies the selected liquid onto the substrate.
Claim 63
Dependent Claim
47 words
The exposure apparatus according claim 54 , wherein the liquid immersion conditions include at least one of a condition for supplying the liquid onto the substrate, a condition for recovering the liquid from the substrate, and a type of the liquid to be supplied onto the substrate.
Claim 64
Dependent Claim
54 words
The exposure apparatus according claim 58 , further comprising a liquid supply mechanism which supplies the liquid onto the substrate, wherein the condition for supplying the liquid includes at least one of a position, an opening area, an opening shape, and a supply direction of a liquid supply port of the liquid supply mechanism.
Claim 65
Dependent Claim
51 words
The exposure apparatus according claim 58 , further comprising a liquid recovery mechanism which recovers the liquid from the substrate, wherein the condition for recovering the liquid includes at least one of a position, an opening area, and an opening shape of a liquid recovery port of the liquid recovery mechanism.
Claim 66
Dependent Claim
17 words
A method for producing a device, comprising using the exposure apparatus as defined in claim 54 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2012-02-24 | 2012-08-25 | 2013-02-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2016-02-24 | 2016-08-25 | 2017-02-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2020-02-24 | 2020-08-25 | 2021-02-24 | $7700.00 | Window Closed / Lapsed |