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EP0060729A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Pattern forming apparatus

Assignee: Hitachi Ltd
•
Filing: 1982-03-17
•
Granted: —
•
Expires: 2002-03-17
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Abstract

Abstract There is disclosed a pattern forming apparatus (20) for projecting a pattern which is formed on a reticle (5) upon a photoresist layer (2) on a substrate (1) which comprises an illumination system (6) for illuminating the pattern for forming an optical image, a reduction lenses (4) for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer (2) formed on the substrate (1) for exposing the photoresist layer, and liquid sustaining means (3; 9,13) for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid (3) having a refractive index of more than 1 (one).

Inventors

  • 👤 Akihiro Takanashi
  • 👤 Tatsuo Harada
  • 👤 Masamoto Akeyama
  • 👤 Yataro Kondo
  • 👤 Toshiei Kurosaki
  • 👤 Shinji Kuniyoshi
  • 👤 Sumio Hitachiowada Apartment House D404 Hosaka
  • 👤 Yoshio Kawamura

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-31 12:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; G03F7/20; G03F7/2041; G03F7/70341

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 110 words
A pattern forming apparatus (20) for projecting a pattern which is formed on a reticle (5) upon a photoresist layer (2) on a substrate (1), comprising: an illumination system (6) for illuminating said pattern and forming an optical pattern image; reduction lenses (4) for projecting said optical pattern image at a certain reduction ratio upon the photoresist layer (2) formed on the substrate (1) for exposing the photoresist layer (2); and liquid sustaining means (3, 19; 9, 13) for filling a gap between at least a portion of said reduction lenses and said photoresist layer with an optically transparent liquid (3) having a refractive index of more than 1 (one).
Claim 2
Dependent Claim 110 words
A pattern forming apparatus (20) for projecting a pattern which is formed on a reticle (5) upon a photoresist layer (2) on a substrate (1), comprising: an illumination system (6) for illuminating said pattern and forming an optical pattern image; reduction lenses (4) for projecting said optical pattern image at a certain reduction ratio upon the photoresist layer (2) formed on the substrate (1) for exposing the photoresist layer (2); and liquid sustaining means (3, 19; 9, 13) for filling a gap between at least a portion of said reduction lenses and said photoresist layer with an optically transparent liquid (3) having a refractive index of more than 1 (one).
Claim 3
Dependent Claim 26 words
A pattern forming apparatus according to Claim 1, wherein said liquid has substantially the same refractive index as that of a material of said photoresist layer.
Claim 4
Dependent Claim 34 words
A pattern forming apparatus according to Claim 1, further comprising a pattern detector (7) interposed between said illumination system and said reticle for detecting the alignment of pattern between said reticle and said substrate.
Claim 5
Dependent Claim 16 words
. A pattern forming apparatus according to Claim 1, wherein said substrate comprises a semiconductor substrate.
Claim 6
Dependent Claim 21 words
A pattern forming apparatus according to Claim 1, wherein said liquid sustaining means comprises a nozzle for drawing in the liquid.
Claim 7
Dependent Claim 15 words
A pattern forming apparatus according to Claim 1, wherein said liquid is trichlorotrifluoroethane or chlorobenzene.

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