Patent US834338A successfully refreshed from Google Patents.
Patent US7038760B2 successfully refreshed from Google Patents.
US7038760B2
Expired / Lapsed
US
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Lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
•
Filing: 2004-06-23
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Granted: 2006-05-02
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Expires: 2024-06-23
Abstract
Abstract The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.
Inventors
- 👤 Johannes Catharinus Hubertus Mulkens
- 👤 Antonius Theodorus Anna Maria Derksen
- 👤 Joeri Lof
- 👤 Klaus Simon
- 👤 Alexander Straaijer
- 👤 Bob Streefkerk
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 10:14
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7003; G03F9/7023; G03F9/7026; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F9/7034
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
119 words
A lithographic projection apparatus comprising: an illumination system arranged to condition a radiation beam; a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid; and a measurement device configured to obtain a pressure, height, or both of liquid in the space as a measure of height and/or tilt of the substrate table, the substrate, or both.
Claim 2
Dependent Claim
119 words
A lithographic projection apparatus comprising: an illumination system arranged to condition a radiation beam; a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid; and a measurement device configured to obtain a pressure, height, or both of liquid in the space as a measure of height and/or tilt of the substrate table, the substrate, or both.
Claim 3
Dependent Claim
37 words
Apparatus according to claim 1 , further comprising a second measurement device configured to obtain the pressure, height, or both of the liquid at a point displaced in the plane of the substrate from the measurement device.
Claim 4
Dependent Claim
42 words
Apparatus according to claim 2 , further comprises a third measurement device configured to obtain the pressure, height, or both of the liquid at a point displaced in the plane of the substrate from the measurement device and the second measurement device.
Claim 5
Dependent Claim
48 words
Apparatus according to claim 1 , wherein the measurement device comprises a tube in liquid communication with liquid in the space, the tube having an open end and extending at least in part vertically, and a sensor configured to measure a height of the liquid in the tube.
Claim 6
Dependent Claim
31 words
Apparatus according to claim 1 , wherein the sensor comprises an optical sensor, a capacitive sensor or a series of electrodes successively wetted as the liquid level rises in the tube.
Claim 7
Dependent Claim
54 words
Apparatus according to claim 1 , wherein the liquid supply system comprises: a member extending along at least a part of the boundary of the space between the projection system and the substrate table; and a gas seal device configured to form a gas seal between the member and a surface of the substrate.
Claim 8
Dependent Claim
43 words
Apparatus according to claim 1 , further comprising: a positioning device configured to position the substrate table; and a controller configured to control the positioning device on the basis of height values, tilt values or both derived from results from the measurement device.
Claim 9
Dependent Claim
40 words
Apparatus according to claim 7 , wherein the controller is configured to determine tilt values from first and second time derivatives of the pressure, height, or both measured at two or more spatial points with one or more measurement devices.
Claim 10
Independent Claim
81 words
A device manufacturing method comprising: providing a liquid to at least partly fill a space between a substrate on a substrate table of a lithographic apparatus and a projection system of the lithographic apparatus; obtaining the pressure, height or both of liquid in the space as a measure of height and/or tilt of the substrate table, the substrate, or both; and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.
Claim 11
Independent Claim
81 words
A device manufacturing method comprising: providing a liquid to at least partly fill a space between a substrate on a substrate table of a lithographic apparatus and a projection system of the lithographic apparatus; obtaining the pressure, height or both of liquid in the space as a measure of height and/or tilt of the substrate table, the substrate, or both; and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.
Claim 12
Dependent Claim
35 words
Method according to claim 9 , comprising obtaining the pressure, height or both of the liquid at two points displaced from each other in the plane of the substrate with one or more measurement devices.
Claim 13
Dependent Claim
29 words
Method according to claim 9 , comprising obtaining the pressure, height or both of the liquid at three points displaced from each other in the plane of the substrate.
Claim 14
Dependent Claim
43 words
Method according to claim 9 , wherein obtaining the pressure, height or both comprises measuring a height of liquid in a tube, the tube in liquid communication with liquid in the space, having an open end and extending at least in part vertically.
Claim 15
Dependent Claim
42 words
Method according to claim 9 , comprising forming a gas seal between a member and a surface of the substrate, the member extending along at least a part of the boundary of the space between the projection system and the substrate table.
Claim 16
Dependent Claim
42 words
Method according to claim 9 , further comprising: positioning the substrate table; and controlling the positioning on the basis of height values, tilt values or both derived from results of the obtaining the pressure, height or both of liquid in the space.
Claim 17
Dependent Claim
35 words
Method according to claim 14 , comprising determining tilt values from first and second time derivatives of the pressure, height, or both measured at two or more spatial points with one or more measurement devices.
Claim 18
Dependent Claim
158 words
A lithographic projection apparatus comprising: an illumination system arranged to condition a radiation beam; a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and a localized area of an object on the substrate table, with a liquid, said liquid supply system extending along at least part of a boundary of said localized area; a measurement device configured to obtain a pressure, height, or both of liquid in the space; a positioning device configured to position the substrate table; and a controller configured to control the positioning device on the basis of height values, tilt values or both derived from results from the measurement device.
Claim 19
Dependent Claim
158 words
A lithographic projection apparatus comprising: an illumination system arranged to condition a radiation beam; a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and a localized area of an object on the substrate table, with a liquid, said liquid supply system extending along at least part of a boundary of said localized area; a measurement device configured to obtain a pressure, height, or both of liquid in the space; a positioning device configured to position the substrate table; and a controller configured to control the positioning device on the basis of height values, tilt values or both derived from results from the measurement device.
Claim 20
Dependent Claim
37 words
Apparatus according to claim 16 , further comprising a second measurement device configured to obtain the pressure, height, or both of the liquid at a point displaced in the plane of the object from the measurement device.
Claim 21
Dependent Claim
48 words
Apparatus according to claim 16 , wherein the measurement device comprises a tube in liquid communication with liquid in the space, the tube having an open end and extending at least in part vertically, and a sensor configured to measure a height of the liquid in the tube.
Claim 22
Dependent Claim
40 words
Apparatus according to claim 16 , wherein the controller is configured to determine tilt values from first and second time derivatives of the pressure, height, or both measured at two or more spatial points with one or more measurement devices.
Claim 23
Dependent Claim
12 words
Apparatus according to claim 16 , wherein the object is a substrate.
Claim 24
Dependent Claim
12 words
Apparatus according to claim 1 , wherein the object is a substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2009-05-01 | 2009-10-31 | 2010-05-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2013-05-01 | 2013-10-31 | 2014-05-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2017-05-01 | 2017-10-31 | 2018-05-02 | $7700.00 | Window Closed / Lapsed |