US6809794B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Immersion photolithography system and method using inverted wafer-projection optics interface
Assignee: ASML Holding NV
•
Filing: 2003-06-27
•
Granted: 2004-10-26
•
Expires: 2023-06-27
Abstract
Abstract A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.
Inventors
- 👤 Harry Sewell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 19:57
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; B; B82; B82Y; B82Y10/00; B82Y40/00; G03F7/70233
Claims Analysis
Total Claims: 48
Claim 1
Independent Claim
57 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate; and a liquid supply system that provides a liquid between the projection optical system and the substrate, wherein the projection optical system is positioned below the substrate.
Claim 2
Dependent Claim
57 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate; and a liquid supply system that provides a liquid between the projection optical system and the substrate, wherein the projection optical system is positioned below the substrate.
Claim 3
Dependent Claim
26 words
The liquid immersion photolithography system of claim 1 , wherein the liquid supply system is adapted to form a liquid meniscus above the projection optical system.
Claim 4
Dependent Claim
25 words
The liquid immersion photolithography system of claim 1 , wherein the liquid supply system is adapted to form a fountainhead above the projection optical system.
Claim 5
Dependent Claim
28 words
The liquid immersion photolithography system of claim 1 , wherein the projection optical system includes a housing with at least one catch basin positioned to capture stray liquid.
Claim 6
Dependent Claim
71 words
The liquid immersion photolithography system of claim 1 , wherein the projection optical system includes: a housing in which a plurality of lenses are mounted, the housing including a pressure region between an uppermost lens of the plurality of lenses and a top of the housing; an opening in the top of the housing; and a liquid seal between an uppermost lens of the plurality of lenses and the pressure region.
Claim 7
Dependent Claim
25 words
The liquid immersion photolithography system of claim 5 , wherein a distance between the substrate and the top of the housing is approximately 50-150 microns.
Claim 8
Dependent Claim
28 words
The liquid immersion photolithography system of claim 5 , wherein a distance between the substrate and the top of the housing is between 50 microns and 500 microns.
Claim 9
Dependent Claim
19 words
The liquid immersion photolithography system of claim 5 , wherein the top of the housing has a hydrophobic surface.
Claim 10
Dependent Claim
24 words
The liquid immersion photolithography system of claim 1 , wherein the liquid supply system selectively provides the liquid only when wet exposure is needed.
Claim 11
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 193 nanometers.
Claim 12
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 157 nanometers.
Claim 13
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 435 nanometers.
Claim 14
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 405 nanometers.
Claim 15
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 365 nanometers.
Claim 16
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 248 nanometers.
Claim 17
Dependent Claim
43 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate and includes a projection optical system; and means for providing a liquid between the projection optical system and the substrate, wherein the projection optical system is positioned below the substrate.
Claim 18
Dependent Claim
43 words
A liquid immersion photolithography system comprising: an exposure system that exposes a substrate and includes a projection optical system; and means for providing a liquid between the projection optical system and the substrate, wherein the projection optical system is positioned below the substrate.
Claim 19
Dependent Claim
28 words
The liquid immersion photolithography system of claim 16 , wherein the means for providing a liquid is adapted to form a liquid meniscus above the projection optical system.
Claim 20
Dependent Claim
27 words
The liquid immersion photolithography system of claim 16 , wherein the means for providing a liquid is adapted to form a fountainhead above the projection optical system.
Claim 21
Dependent Claim
28 words
The liquid immersion photolithography system of claim 16 , wherein the projection optical system includes a housing with at least one catch basin positioned to capture stray liquid.
Claim 22
Dependent Claim
71 words
The liquid immersion photolithography system of claim 16 , wherein the projection optical system includes: a housing in which a plurality of lenses are mounted, the housing including a pressure region between an uppermost lens of the plurality of lenses and a top of the housing; an opening in the top of the housing; and a liquid seal between an uppermost lens of the plurality of lenses and the pressure region.
Claim 23
Dependent Claim
25 words
The liquid immersion photolithography system of claim 20 , wherein a distance between the substrate and the top of the housing is approximately 50-150 microns.
Claim 24
Dependent Claim
28 words
The liquid immersion photolithography system of claim 20 , wherein a distance between the substrate and the top of the housing is between 50 microns and 500 microns.
Claim 25
Dependent Claim
19 words
The liquid immersion photolithography system of claim 20 , wherein the top of the housing has a hydrophobic surface.
Claim 26
Dependent Claim
26 words
The liquid immersion photolithography system of claim 16 , wherein the means for providing a liquid selectively provides the liquid only when wet exposure is needed.
Claim 27
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 193 nanometers.
Claim 28
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 157 nanometers.
Claim 29
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 435 nanometers.
Claim 30
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 405 nanometers.
Claim 31
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 365 nanometers.
Claim 32
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 248 nanometers.
Claim 33
Dependent Claim
45 words
A liquid immersion photolithography system comprising: an exposure system that includes a projection optical system; and a liquid supply system adapted for providing a liquid between the projection optical system and the substrate, wherein the projection optical system is adapted for positioning below the substrate.
Claim 34
Dependent Claim
45 words
A liquid immersion photolithography system comprising: an exposure system that includes a projection optical system; and a liquid supply system adapted for providing a liquid between the projection optical system and the substrate, wherein the projection optical system is adapted for positioning below the substrate.
Claim 35
Dependent Claim
50 words
A liquid immersion photolithography system comprising: an exposure system that includes a projection optical system; and a liquid supply system adapted for providing a liquid between the projection optical system and the substrate, wherein the liquid supply system is adapted for forming a liquid meniscus above the projection optical system.
Claim 36
Dependent Claim
50 words
A liquid immersion photolithography system comprising: an exposure system that includes a projection optical system; and a liquid supply system adapted for providing a liquid between the projection optical system and the substrate, wherein the liquid supply system is adapted for forming a liquid meniscus above the projection optical system.
Claim 37
Dependent Claim
21 words
The liquid immersion photolithography system of claim 32 , wherein the projection optical system is adapted for positioning below the substrate.
Claim 38
Dependent Claim
28 words
The liquid immersion photolithography system of claim 32 , wherein the projection optical system includes a housing with at least one catch basin adapted to capture stray liquid.
Claim 39
Dependent Claim
71 words
The liquid immersion photolithography system of claim 32 , wherein the projection optical system includes: a housing in which a plurality of lenses are mounted, the housing including a pressure region between an uppermost lens of the plurality of lenses and a top of the housing; an opening in the top of the housing; and a liquid seal between an uppermost lens of the plurality of lenses and the pressure region.
Claim 40
Dependent Claim
19 words
The liquid immersion photolithography system of claim 35 , wherein the top of the housing has a hydrophobic surface.
Claim 41
Dependent Claim
27 words
The liquid immersion photolithography system of claim 35 , wherein the liquid supply system is adapted to selectively provide the liquid only when wet exposure is needed.
Claim 42
Dependent Claim
58 words
An upwardly directed projection optical system comprising: a housing including a hydrophobic upper portion and having an opening formed in the hydrophobic upper portion; a catch basin around a periphery of the housing; a plurality of lenses adapted for upward exposure of a substrate; and a liquid seal around a final lens element of the projection optical system.
Claim 43
Dependent Claim
58 words
An upwardly directed projection optical system comprising: a housing including a hydrophobic upper portion and having an opening formed in the hydrophobic upper portion; a catch basin around a periphery of the housing; a plurality of lenses adapted for upward exposure of a substrate; and a liquid seal around a final lens element of the projection optical system.
Claim 44
Independent Claim
38 words
A method of exposing a substrate comprising: positioning a projection optical system below the substrate; projecting electromagnetic radiation onto the substrate using a projection optical system; and delivering a liquid between the projection optical system and the substrate.
Claim 45
Independent Claim
38 words
A method of exposing a substrate comprising: positioning a projection optical system below the substrate; projecting electromagnetic radiation onto the substrate using a projection optical system; and delivering a liquid between the projection optical system and the substrate.
Claim 46
Dependent Claim
20 words
The method of claim 39 , further comprising removing excess liquid from the substrate using at least one catch basin.
Claim 47
Dependent Claim
20 words
The method of claim 39 , further comprising forming a liquid meniscus between the projection optical system and the substrate.
Claim 48
Dependent Claim
19 words
The method of claim 39 , further comprising providing pressure to the liquid so as to maintain the meniscus.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2007-10-26 | 2008-04-26 | 2008-10-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-10-26 | 2012-04-26 | 2012-10-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-10-26 | 2016-04-26 | 2016-10-26 | $7700.00 | Window Closed / Lapsed |