Planarization method using fluid composition including chelating agents
Abstract
Abstract A planarization method including the provision of a wafer having a wafer surface. A pad is positioned for contact with the wafer surface and the wafer surface is planarized using the pad and a fluid composition that includes a chelating agent. The chelating agent is a water soluble multidentate chelating agent, preferably a water soluble bidentate ionic chelating agent, and more preferably 1,2-ethylenediphosphonic acid (EDP). A fluid composition for use in planarization of a surface of a wafer includes a chemically interactive component that interacts with the surface of the wafer and a chelating agent for reducing the metal ion contamination of the wafer during planarization. The chelating agent may be one of a water soluble multidentate chelating agent, preferably a water soluble bidentate ionic chelating agent, and more preferably 1,2-ethylenediphosphonic acid (EDP). Further, the fluid composition may include an abrasive component.
Inventors
- 👤 John Skrovan
- 👤 Scott Meikle
Bibliographic Details
Claims Analysis
Total Claims: 9References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2006-01-20 | 2006-07-22 | 2007-01-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-01-20 | 2010-07-22 | 2011-01-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-01-20 | 2014-07-22 | 2015-01-21 | $7700.00 | Window Closed / Lapsed |