US5480476A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Activated polishing compositions
Assignee: DuPont Electronic Materials Holding Inc
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Filing: 1994-09-06
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Granted: 1996-01-02
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Expires: 2014-09-06
Abstract
Abstract Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.
Inventors
- 👤 Lee M. Cook
- 👤 Scott B. Loncki
- 👤 Gregory Brancaleoni
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 05:12
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02; C09K; C09K3/00; C09K3/14; C09K3/1454
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
76 words
A composition suitable for polishing articles comprising a base abrasive activated by chemical adsorption of a cation whose oxide exhibits a higher polishing rate than said base abrasive alone onto the surface of said base abrasive, said adsorption being accomplished by subjecting said base abrasive and a compound containing said cation to cyclic impact in an aqueous medium whose pH is at level which is favorable for adsorption of said cation onto said base abrasive surface.
Claim 2
Dependent Claim
76 words
A composition suitable for polishing articles comprising a base abrasive activated by chemical adsorption of a cation whose oxide exhibits a higher polishing rate than said base abrasive alone onto the surface of said base abrasive, said adsorption being accomplished by subjecting said base abrasive and a compound containing said cation to cyclic impact in an aqueous medium whose pH is at level which is favorable for adsorption of said cation onto said base abrasive surface.
Claim 3
Dependent Claim
29 words
A composition suitable for polishing articles according to claim 1 wherein said base abrasive and said compound containing said cation are subjected to said cyclic impact by being co-milled.
Claim 4
Dependent Claim
27 words
A composition suitable for polishing articles according to claim 2 wherein said compound containing said cation is in milling abrasives which are used in the milling process.
Claim 5
Dependent Claim
21 words
A composition suitable for polishing articles according to claim 1, 2 or 3 wherein said base abrasive is SiO 2 .
Claim 6
Dependent Claim
20 words
A composition suitable for polishing articles according to claim 1, 2 or 3 wherein said cation is Ce 4+ .
Claim 7
Dependent Claim
17 words
A composition suitable for polishing articles according to claim 4 wherein said cation is Ce 4+ .
Claim 8
Dependent Claim
20 words
A composition suitable for polishing articles according to claim 1, 2 or 3 wherein said cation is Zr 4+ .
Claim 9
Dependent Claim
17 words
A composition suitable for polishing articles according to claim 4 wherein said cation is Zr 4+ .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-01-01 | 1999-07-03 | 2000-01-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-01-01 | 2003-07-03 | 2004-01-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-01-01 | 2007-07-03 | 2008-01-02 | $7700.00 | Window Closed / Lapsed |