US5876490A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Polish process and slurry for planarization
Assignee: Versum Materials US LLC
•
Filing: 1997-01-24
•
Granted: 1999-03-02
•
Expires: 2017-01-24
Abstract
Abstract A slurry containing abrasive particles and exhibiting normal stress effects. The slurry further contains non-polishing particles resulting in reduced polishing rate at recesses, while the abrasive particles maintain high polish rates at elevations. This leads to improved planarization.
Inventors
- 👤 Maria Ronay
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 18:00
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02; H; H10; H10P; H10P52/00; H10P52/40; H10P52/402; Y; Y10; Y10S; Y10S977/00; Y10S977/70; Y10S977/773
Claims Analysis
Total Claims: 38
Claim 1
Independent Claim
64 words
A polish slurry comprising abrasive particles and exhibiting normal stress effect and further comprising polyelectrolyte having ionic moieties of a charge that differs from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles and wherein said polyelectrolyte has a molecular weight of about 500 to about 10,000.
Claim 2
Dependent Claim
64 words
A polish slurry comprising abrasive particles and exhibiting normal stress effect and further comprising polyelectrolyte having ionic moieties of a charge that differs from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles and wherein said polyelectrolyte has a molecular weight of about 500 to about 10,000.
Claim 3
Dependent Claim
11 words
The slurry of claim 1 wherein said polyelectrolyte comprises acidic groups.
Claim 4
Dependent Claim
11 words
The slurry of claim 1 wherein said polyelectrolyte comprises basic groups.
Claim 5
Dependent Claim
11 words
The slurry of claim 1 wherein said polyelectrolyte is a polyampholyte.
Claim 6
Dependent Claim
10 words
The slurry of claim 1 wherein said polyelectrolyte is polyethylenimine.
Claim 7
Dependent Claim
22 words
The slurry of claim 1 wherein said polyelectrolyte is selected from the group consisting of poly(acrylic acid), poly(methacrylic acid) and polymaleic acid.
Claim 8
Dependent Claim
22 words
The slurry of claim 1 wherein a fraction of said abrasive particles are pretreated to enhance their ability to adsorb said polyelectrolyte.
Claim 9
Dependent Claim
29 words
The slurry of claim 1 wherein a fraction of said abrasive particles are pretreated with an oxidant in an amount sufficient to enhance their ability to adsorb said polyelectrolyte.
Claim 10
Dependent Claim
11 words
The slurry of claim 8 wherein said oxidant is ferric nitrate.
Claim 11
Dependent Claim
11 words
The slurry of claim 1 which further comprises water-insoluble polymer particles.
Claim 12
Dependent Claim
10 words
The slurry of claim 1 which further comprises surfactant micelles.
Claim 13
Dependent Claim
20 words
The slurry of claim 1 wherein the particle size of said abrasive particles is about 30 to about 200 nm.
Claim 14
Dependent Claim
20 words
The slurry of claim 1 wherein the particle size of said abrasive particles is about 75 to about 100 nm.
Claim 15
Dependent Claim
21 words
The slurry of claim 1 wherein said abrasive particles are selected from the group consisting of alumina- ceria, silica and zirconia.
Claim 16
Dependent Claim
9 words
The slurry of claim 1 being an aqueous slurry.
Claim 17
Dependent Claim
20 words
The slurry of claim 1 which further includes a dual valent rare earth ion or suspension of its colloidal hydroxide.
Claim 18
Dependent Claim
9 words
The slurry of claim 1 being a non-aqueous slurry.
Claim 19
Dependent Claim
14 words
The slurry of claim 1 wherein said polyelectrolyte is capable of dispersing polishing debris.
Claim 20
Dependent Claim
21 words
The slurry of claim 1 wherein said polyelectrolyte is anionic and has a molecular weight of about 1,000 to about 5,000.
Claim 21
Dependent Claim
18 words
The slurry of claim 1 wherein said polyelectrolyte is anionic and has a molecular weight of about 2,000.
Claim 22
Dependent Claim
21 words
The slurry of claim 1 wherein said polyelectrolyte has a molecular weight of about 1,000 to about 5.000 and is cationic.
Claim 23
Dependent Claim
14 words
The slurry of claim 1 wherein said concentration is 15 to about 25 percent.
Claim 24
Dependent Claim
58 words
An abrasive composition comprising abrasive particles and a polyelectrolyte having ionic moieties of a charge that differs from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles and wherein said polyelectrolyte has a molecular weight of about 1000 to about 5000.
Claim 25
Dependent Claim
58 words
An abrasive composition comprising abrasive particles and a polyelectrolyte having ionic moieties of a charge that differs from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles and wherein said polyelectrolyte has a molecular weight of about 1000 to about 5000.
Claim 26
Dependent Claim
31 words
A process for preparing the slurry of claim 1 which comprises adding said polyelectrolyte to a slurry containing said particles to thereby coat a fraction of said abrasive particles in situ.
Claim 27
Dependent Claim
41 words
A process for preparing the slurry of claim 1 which comprises precoating a portion of said abrasive particles and then admixing the precoated abrasive particles with a slurry of the remaining portion of said abrasive particles to thereby produce said slurry.
Claim 28
Dependent Claim
31 words
A process for preparing the slurry of claim 1 which comprises pretreating a portion of the abrasive particles to render them more susceptible to adsorption of a polyelectrolyte from the slurry.
Claim 29
Independent Claim
76 words
A method for polishing a surface which comprises providing on said surface a slurry comprising abrasive particles and exhibiting normal stress effect and further comprising a polyelectrolyte having ionic moieties of a charge that differs from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles and wherein said polyelectrolyte has a molecular weight of about 500 to about 10,000.
Claim 30
Independent Claim
76 words
A method for polishing a surface which comprises providing on said surface a slurry comprising abrasive particles and exhibiting normal stress effect and further comprising a polyelectrolyte having ionic moieties of a charge that differs from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles and wherein said polyelectrolyte has a molecular weight of about 500 to about 10,000.
Claim 31
Dependent Claim
14 words
The method of claim 27 wherein said polishing pad is a stiff polishing pad.
Claim 32
Independent Claim
79 words
A method for polishing a surface which comprises providing on said surface a slurry comprising abrasive particles and a polyelectrolyte having ionic moieties of a charge different from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles; and planarizing said surface by contacting it with a polishing pad and wherein said polyelectrolyte has a molecular weight of about 500 to about 10,000.
Claim 33
Independent Claim
79 words
A method for polishing a surface which comprises providing on said surface a slurry comprising abrasive particles and a polyelectrolyte having ionic moieties of a charge different from that associated with said abrasive particles and wherein the concentration of said polyelectrolyte is about 5 to about 50 percent by weight of said abrasive particles; and planarizing said surface by contacting it with a polishing pad and wherein said polyelectrolyte has a molecular weight of about 500 to about 10,000.
Claim 34
Dependent Claim
14 words
The method of claim 29 wherein said polishing pad is a stiff polishing pad.
Claim 35
Dependent Claim
20 words
The method of claim 29 wherein said polyelectrolyte further disperses polishing debris to thereby reduce scratching caused by said debris.
Claim 36
Dependent Claim
12 words
The method of claim 29 wherein said surface is a microelectronic wafer.
Claim 37
Dependent Claim
13 words
The method of claim 29 wherein said surface is a mirror or lens.
Claim 38
Dependent Claim
29 words
The method of claim 29 wherein a fraction of said abrasive particles are pretreated with an oxidant in an amount sufficient to enhance their ability to adsorb said polyelectrolyte.
References Cited (Backward Citations)
US2556615A
Cited
US4478883A
Cited
US4554182A
Cited
US4752628A
Cited
EP0373501A2
Cited
US5304284A
Cited
US5262354A
Cited
US5636296A
Cited
US5445996A
Cited
US5225034A
Cited
US5480476A
Cited
WO1996038262A1
Cited
US5603739A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-01 | 2002-08-31 | 2003-03-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-01 | 2006-08-31 | 2007-03-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-01 | 2010-08-31 | 2011-03-02 | $7700.00 | Window Closed / Lapsed |