US5476606A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Compositions and methods for polishing
Assignee: DuPont Electronic Materials Holding Inc
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Filing: 1994-06-27
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Granted: 1995-12-19
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Expires: 2014-06-27
Abstract
Abstract Improved compositions for polishing silicon, silica or silicon-containing articles is provided which consists of an aqueous medium, abrasive particles and an anion which controls the rate of removal of silica. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.
Inventors
- 👤 Gregory Brancaleoni
- 👤 Lee M. Cook
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 13:25
CPC Classifications
C; C23; C23F; C23F1/00; H; H10; H10P; H10P52/00; H10P52/40; H10P52/403; C09; C09G; C09G1/00; C09G1/02; H10P50/00; H10P95/00; H10P95/06; H10P95/062; Y; Y10; Y10S; Y10S451/00; Y10S451/905
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
62 words
A composition for polishing a composite of metal and silica, comprising: an aqueous medium, abrasive particles and a compound or compounds which suppress the rate of removal of silica, wherein each of said compound or compounds contains at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition.
Claim 2
Dependent Claim
62 words
A composition for polishing a composite of metal and silica, comprising: an aqueous medium, abrasive particles and a compound or compounds which suppress the rate of removal of silica, wherein each of said compound or compounds contains at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition.
Claim 3
Dependent Claim
23 words
A composition according to claim 1 where said compound or compounds which suppress the rate of removal of silica contain a benzene ring.
Claim 4
Dependent Claim
42 words
A composition according to claim 1 where said compound or compounds which suppress the rate of removal of silica are straight chain mono- and di-carboxylic acids and salts which have secondary hydroxyl groups in an alpha position relative to the carboxylate group.
Claim 5
Dependent Claim
42 words
A composition according to claim 1 where said compound or compounds which suppress the rate of removal of silica are tri- or polycarboxylic acids and salts which have secondary or tertiary hydroxyl groups in an alpha position relative to a carboxylate group.
Claim 6
Dependent Claim
31 words
A composition according to claim 2 consisting essentially of water, abrasive particles, hydrogen peroxide and potassium hydrogen phthalate, where the solution concentration of the phthalate component is at least 0.1 molar.
Claim 7
Dependent Claim
30 words
A composition according to claim 5 consisting essentially of, in parts by weight; 3.2 parts water, 0.33 parts abrasive particles, 1.5 parts hydrogen peroxide and 0.22 parts potassium hydrogen phthalate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-12-18 | 1999-06-19 | 1999-12-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-12-18 | 2003-06-19 | 2003-12-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-12-18 | 2007-06-19 | 2007-12-19 | $7700.00 | Window Closed / Lapsed |