US5902129A
Expired / Lapsed
US
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Process for forming improved cobalt silicide layer on integrated circuit structure using two capping layers
Assignee: Bell Semiconductor LLC
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Filing: 1997-04-07
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Granted: 1999-05-11
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Expires: 2017-04-07
Abstract
Abstract The formation of a cobalt silicide layer of uniform thickness over the source/drain regions and the polysilicon gate electrode of an MOS structure, which does not thin out adjacent the edges of the top surface of the polysilicon gate electrode, i.e., adjacent the oxide spacers, is achieved by first forming a titanium capping layer over a cobalt layer deposited over the MOS structure prior to formation of the cobalt silicide, and while excluding oxygen-bearing gases from the cobalt surface prior to the deposition of the titanium capping layer. Oxygen-bearing gases are then excluded from contact with the titanium capping layer prior to at least the initial annealing step to form cobalt silicide, by forming a protective titanium nitride layer over the titanium layer, either: (1) in the same chamber used to deposit the titanium layer, or (2) while still maintaining the titanium-coated semiconductor substrate in an oxygen-free atmosphere during transfer of the titanium-coated semiconductor substrate from the titanium deposition chamber to a separate titanium nitride deposition chamber. In either event, the titanium capping layer is deposited over the cobalt layer, and the protective titanium nitride layer is then formed over the titanium capping layer, prior to the first annealing step, to thereby protect the cobalt layer from oxygen-bearing gases, resulting in the formation of cobalt silicide of substantially uniform thickness over the top surface of the polysilicon gate electrode.
Inventors
- 👤 Stephanie A. Yoshikawa
- 👤 Zhihai Wang
- 👤 Wilbur G. Catabay
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 15:31
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0212; H10D64/00; H10D64/01; H10D64/011; H10D64/0111; H10D64/0112; H10D64/013; H10D64/01302; H10D64/01304; H10D64/01306; H10D64/01308; H10D64/0131; Y; Y10; Y10S; Y10S438/00; Y10S438/976
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
108 words
A process for forming an MOS structure on a silicon substrate comprising cobalt silicide contacts formed over the source/drain regions of said MOS structure and over a polysilicon gate electrode of said MOS structure which comprises: a) forming a cobalt layer over said MOS structure; b) forming a titanium layer over said cobalt layer without exposing said cobalt layer to oxygen-bearing gases; c) forming a titanium nitride layer over said titanium layer without exposing said titanium layer to oxygen-bearing gases; d) thereafter annealing said MOS structure at a first temperature to form cobalt silicide over said silicon source/drain regions and said polysilicon gate electrode of said MOS structure.
Claim 2
Dependent Claim
108 words
A process for forming an MOS structure on a silicon substrate comprising cobalt silicide contacts formed over the source/drain regions of said MOS structure and over a polysilicon gate electrode of said MOS structure which comprises: a) forming a cobalt layer over said MOS structure; b) forming a titanium layer over said cobalt layer without exposing said cobalt layer to oxygen-bearing gases; c) forming a titanium nitride layer over said titanium layer without exposing said titanium layer to oxygen-bearing gases; d) thereafter annealing said MOS structure at a first temperature to form cobalt silicide over said silicon source/drain regions and said polysilicon gate electrode of said MOS structure.
Claim 3
Dependent Claim
25 words
The process of claim 1 including the additional step of removing unreacted cobalt, titanium, and titanium nitride from said MOS structure after said annealing step.
Claim 4
Dependent Claim
54 words
The process of claim 2 including the further step of annealing said MOS structure at a second temperature higher than said first temperature after said step of removing said unreacted cobalt, titanium, and titanium nitride, to convert the initial low temperature cobalt silicide formed at said first annealing temperature to high temperature cobalt silicide.
Claim 5
Dependent Claim
29 words
The process of claim 3 wherein said first temperature at which said MOS structure is initially annealed comprises a temperature ranging from about 350° C. to about 600° C.
Claim 6
Dependent Claim
27 words
The process of claim 3 wherein said second temperature at which said MOS structure is subsequently annealed comprises a temperature ranging of at least about 700° C.
Claim 7
Dependent Claim
224 words
A process for forming an MOS structure on a silicon substrate comprising cobalt silicide contacts formed over the source/drain regions of said MOS structure and over a polysilicon gate electrode of said MOS structure and further characterized by a uniform thickness of cobalt silicide formed over said polysilicon gate electrode which comprises: a) forming a cobalt layer over said MOS structure; b) forming a titanium layer over said cobalt layer without exposing said cobalt layer to oxygen-bearing gases; c) forming a titanium nitride layer over said titanium layer without exposing said titanium layer to oxygen-bearing gases; d) thereafter annealing said MOS structure at a first temperature of from about 350° C. to about 600° C. to form low temperature cobalt silicide over said silicon source/drain regions and said polysilicon gate electrode of said MOS structure without exposing said titanium layer to oxygen-bearing gases; e) then removing from said MOS structure after said annealing step at said first temperature, unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal; and f) then annealing said MOS structure at a second temperature of at least about 700° C., after said step of removing said unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal, to convert the initial low temperature cobalt silicide formed at said first annealing temperature to high temperature cobalt silicide.
Claim 8
Dependent Claim
224 words
A process for forming an MOS structure on a silicon substrate comprising cobalt silicide contacts formed over the source/drain regions of said MOS structure and over a polysilicon gate electrode of said MOS structure and further characterized by a uniform thickness of cobalt silicide formed over said polysilicon gate electrode which comprises: a) forming a cobalt layer over said MOS structure; b) forming a titanium layer over said cobalt layer without exposing said cobalt layer to oxygen-bearing gases; c) forming a titanium nitride layer over said titanium layer without exposing said titanium layer to oxygen-bearing gases; d) thereafter annealing said MOS structure at a first temperature of from about 350° C. to about 600° C. to form low temperature cobalt silicide over said silicon source/drain regions and said polysilicon gate electrode of said MOS structure without exposing said titanium layer to oxygen-bearing gases; e) then removing from said MOS structure after said annealing step at said first temperature, unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal; and f) then annealing said MOS structure at a second temperature of at least about 700° C., after said step of removing said unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal, to convert the initial low temperature cobalt silicide formed at said first annealing temperature to high temperature cobalt silicide.
Claim 9
Dependent Claim
41 words
The process of claim 6 wherein said step of forming said layer of cobalt over said MOS structure further comprises sputtering at least about 30 Å of cobalt over said silicon source/drain regions and polysilicon gate electrode of said MOS structure.
Claim 10
Dependent Claim
41 words
The process of claim 6 wherein said step of forming said layer of cobalt over said MOS structure further comprises sputtering at least about 100 Å of cobalt over said silicon source/drain regions and polysilicon gate electrode of said MOS structure.
Claim 11
Dependent Claim
32 words
The process of claim 6 wherein said step of forming said layer of titanium over said cobalt layer further comprises sputtering at least about 10 Å of titanium over said cobalt layer.
Claim 12
Dependent Claim
32 words
The process of claim 6 wherein said step of forming said layer of titanium over said cobalt layer further comprises sputtering at least about 50 Å of titanium over said cobalt layer.
Claim 13
Dependent Claim
34 words
The process of claim 6 wherein said step of forming said layer of titanium nitride over said titanium layer further comprises sputtering at least about 10 Å of titanium nitride over said titanium layer.
Claim 14
Dependent Claim
34 words
The process of claim 6 wherein said step of forming said layer of titanium nitride over said titanium layer further comprises sputtering at least about 50 Å of titanium nitride over said titanium layer.
Claim 15
Dependent Claim
41 words
The process of claim 6 wherein said step of forming said layer of titanium nitride over said titanium layer further comprises reactive sputtering said titanium nitride over said titanium layer using a titanium sputtering target and a gaseous source of nitrogen.
Claim 16
Dependent Claim
39 words
The process of claim 6 wherein said step of annealing said MOS structure at said first annealing temperature further comprises annealing said MOS structure at said first temperature for a period of from 10 seconds to about 120 seconds.
Claim 17
Dependent Claim
39 words
The process of claim 6 wherein said step of annealing said MOS structure at said first annealing temperature further comprises annealing said MOS structure at said first temperature for a period of from 10 seconds to about 60 seconds.
Claim 18
Dependent Claim
40 words
The process of claim 6 wherein said step of removing unreacted cobalt and all titanium-containing containing materials and/or compounds including unreacted titanium metals further comprises removing all cobalt compounds formed on said substrate during said first anneal except cobalt silicide.
Claim 19
Dependent Claim
39 words
The process of claim 6 wherein said step of annealing said MOS structure at said second annealing temperature further comprises annealing said MOS structure at said second temperature for a period of from 10 seconds to about 120 seconds.
Claim 20
Dependent Claim
39 words
The process of claim 6 wherein said step of annealing said MOS structure at said second annealing temperature further comprises annealing said MOS structure at said second temperature for a period of from 10 seconds to about 60 seconds.
Claim 21
Dependent Claim
252 words
A process for forming an MOS structure on a silicon substrate comprising cobalt silicide contacts formed over the source/drain regions of said MOS structure and over a polysilicon gate electrode of said MOS structure and further characterized by a uniform thickness of cobalt silicide formed over said polysilicon gate electrode which comprises: a) sputtering a cobalt layer of at least about 30 Å over said MOS structure; b) sputtering a titanium layer of at least about 10 Å over said cobalt layer without exposing said cobalt layer to oxygen-bearing gases; c) sputtering a titanium nitride layer of at least about 10 Å over said titanium layer without exposing said titanium layer to oxygen-bearing gases; d) thereafter annealing said MOS structure for about 10 seconds to about 120 seconds at a first temperature of from about 350° C. to about 600° C. to form low temperature cobalt silicide over said silicon source/drain regions and said polysilicon gate electrode of said MOS structure; e) then removing from said MOS structure after said annealing step at said first temperature, unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal; f) then annealing said MOS structure for about 10 seconds to about 120 seconds, at a second temperature of from about 700° C. to about 800° C., after said step of removing said unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal, to convert the initial low temperature cobalt silicide formed at said first annealing temperature to high temperature cobalt silicide.
Claim 22
Dependent Claim
252 words
A process for forming an MOS structure on a silicon substrate comprising cobalt silicide contacts formed over the source/drain regions of said MOS structure and over a polysilicon gate electrode of said MOS structure and further characterized by a uniform thickness of cobalt silicide formed over said polysilicon gate electrode which comprises: a) sputtering a cobalt layer of at least about 30 Å over said MOS structure; b) sputtering a titanium layer of at least about 10 Å over said cobalt layer without exposing said cobalt layer to oxygen-bearing gases; c) sputtering a titanium nitride layer of at least about 10 Å over said titanium layer without exposing said titanium layer to oxygen-bearing gases; d) thereafter annealing said MOS structure for about 10 seconds to about 120 seconds at a first temperature of from about 350° C. to about 600° C. to form low temperature cobalt silicide over said silicon source/drain regions and said polysilicon gate electrode of said MOS structure; e) then removing from said MOS structure after said annealing step at said first temperature, unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal; f) then annealing said MOS structure for about 10 seconds to about 120 seconds, at a second temperature of from about 700° C. to about 800° C., after said step of removing said unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal, to convert the initial low temperature cobalt silicide formed at said first annealing temperature to high temperature cobalt silicide.
Claim 23
Dependent Claim
39 words
The process of claim 19 wherein said step of removing unreacted cobalt and all titanium-containing materials and/or compounds including unreacted titanium metal further comprises removing all cobalt compounds formed on said substrate during said first anneal except cobalt silicide.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-05-10 | 2002-11-09 | 2003-05-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-05-10 | 2006-11-09 | 2007-05-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-05-10 | 2010-11-09 | 2011-05-11 | $7700.00 | Window Closed / Lapsed |