Patent US3372096A successfully refreshed from Google Patents.
Patent US5582534A successfully refreshed from Google Patents.
US5582534A
Expired / Lapsed
US
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Orbital chemical mechanical polishing apparatus and method
Assignee: Applied Materials Inc
•
Filing: 1993-12-27
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Granted: 1996-12-10
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Expires: 2013-12-27
Abstract
Abstract A process for polishing substrates includes a carrier which receives a substrate and positions it against a slowly rotating polishing pad. The carrier orbits the pad on the rotating pad, at a speed significantly greater than the rotational speed of the polishing pad, to ensure that the movement of the polishing pad is a very small increment of the cumulative motion between the pad and substrate.
Inventors
- 👤 Norm Shendon
- 👤 Dennis R. Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 19:06
CPC Classifications
B; B24; B24B; B24B37/00; B24B37/04; B24B37/07; B24B37/10; B24B37/105; B24B37/042; B24B37/27; B24B37/30; B24B49/00; B24B49/16
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
153 words
A method of polishing a substrate, comprising the steps of: engaging a substrate having a die thereon with a carrier to press the substrate against a surface of a polishing pad and to prevent the substrate from sliding out from between the carrier and the surface of the polishing pad when there is relative motion between the carrier and the surface of the polishing pad; rotating the polishing pad at a rotation rate to provide a rotating polishing pad contribution to the total rate of relative motion between the substrate and the polishing pad; and moving the substrate in an orbital path at an orbit rate substantially greater than the rate of rotation of the polishing pad to provide a substrate orbit contribution to a total rate of relative motion between the substrate and the polishing pad, wherein the radius of the orbit path is smaller than an edge dimension of said die.
Claim 2
Independent Claim
153 words
A method of polishing a substrate, comprising the steps of: engaging a substrate having a die thereon with a carrier to press the substrate against a surface of a polishing pad and to prevent the substrate from sliding out from between the carrier and the surface of the polishing pad when there is relative motion between the carrier and the surface of the polishing pad; rotating the polishing pad at a rotation rate to provide a rotating polishing pad contribution to the total rate of relative motion between the substrate and the polishing pad; and moving the substrate in an orbital path at an orbit rate substantially greater than the rate of rotation of the polishing pad to provide a substrate orbit contribution to a total rate of relative motion between the substrate and the polishing pad, wherein the radius of the orbit path is smaller than an edge dimension of said die.
Claim 3
Dependent Claim
20 words
A method as recited in claim 1, wherein said step of moving the substrate causes minimal rotation of said substrate.
Claim 4
Dependent Claim
45 words
A method as recited in claim 1, wherein the rotating polishing pad contribution to the total rate of relative motion between the substrate and the polishing pad is 10% or less of the total rate of relative motion between the substrate and the polishing pad.
Claim 5
Dependent Claim
45 words
A method as recited in claim 1, wherein the rotating polishing pad contribution to the total rate of relative motion between the substrate and the polishing pad is 5% or less of the total rate of relative motion between the substrate and the polishing pad.
Claim 6
Dependent Claim
45 words
A method as recited in claim 1, wherein the rotating polishing pad contribution to the total rate of relative motion between the substrate and the polishing pad is 1% or less of the total rate of relative motion between the substrate and the polishing pad.
Claim 7
Independent Claim
126 words
An apparatus for polishing a substrate, comprising: a rotating polishing pad; a carrier engaging the substrate to press the substrate against a surface of the polishing pad and prevent the substrate from sliding out from between the carrier and surface of the polishing pad when there is relative motion between the carrier and the surface of the polishing pad; and a drive member interconnected to said carrier to provide an orbital motion to said carrier; wherein said drive member orbits said carrier at an orbit rate substantially greater than the rate of rotation of said polishing pad; and wherein the substrate has at least one die thereon, and the radius of an orbit of said orbital motion is smaller than an edge dimension of said die.
Claim 8
Independent Claim
126 words
An apparatus for polishing a substrate, comprising: a rotating polishing pad; a carrier engaging the substrate to press the substrate against a surface of the polishing pad and prevent the substrate from sliding out from between the carrier and surface of the polishing pad when there is relative motion between the carrier and the surface of the polishing pad; and a drive member interconnected to said carrier to provide an orbital motion to said carrier; wherein said drive member orbits said carrier at an orbit rate substantially greater than the rate of rotation of said polishing pad; and wherein the substrate has at least one die thereon, and the radius of an orbit of said orbital motion is smaller than an edge dimension of said die.
Claim 9
Dependent Claim
15 words
The apparatus of claim 6, wherein said polishing pad is received on a rotatable platen.
Claim 10
Dependent Claim
15 words
The apparatus of claim 6, wherein said polishing pad rotates at less than 2 r.p.m.
Claim 11
Dependent Claim
19 words
The apparatus of claim 8, wherein said carrier orbits at a speed in excess of 250 orbits per minute.
Claim 12
Dependent Claim
49 words
The apparatus of claim 6, wherein the contribution to the cumulative rate of relative motion between the polishing pad and the substrate attributable to the rotational motion of the polishing pad is less than 1% of the total cumulative rate of relative motion between the substrate and polishing pad.
Claim 13
Dependent Claim
49 words
The apparatus of claim 6, wherein said polishing pad rotates about a first axis of rotation, and said carrier orbits about a second axis of rotation offset from the first axis of rotation so that the orbital path of the substrate does not cross said first axis of rotation.
Claim 14
Dependent Claim
50 words
The apparatus of claim 6 wherein said drive member interconnected to said carrier includes a central shaft fixed to an offset arm, an end of the offset arm being connected to a center of said carrier such that rotation of the central shaft provides the orbital motion to said carrier.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-10 | 2000-06-10 | 2000-12-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-10 | 2004-06-10 | 2004-12-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-10 | 2008-06-10 | 2008-12-10 | $7700.00 | Window Closed / Lapsed |