US5482817A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Mid and deep-uv antireflection coatings and methods for use thereof
Assignee: International Business Machines Corp
•
Filing: 1994-09-29
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Granted: 1996-01-09
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Expires: 2014-09-29
Abstract
Abstract An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
Inventors
- 👤 Robert R. Dichiara
- 👤 Christopher F. Lyons
- 👤 Ratnasabapathy Sooriyakumaran
- 👤 Gary T. Spinillo
- 👤 Kevin M. Welsh
- 👤 Robert L. Wood
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 11:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091; Y; Y10; Y10S; Y10S522/00; Y10S522/904
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
60 words
An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer selected from the group consisting of poly(vinylnaphthalenes), poly(acenaphthalenes) and poly(vinylbiphenyls), which is highly absorbent to mid and/or deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
Claim 2
Dependent Claim
60 words
An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer selected from the group consisting of poly(vinylnaphthalenes), poly(acenaphthalenes) and poly(vinylbiphenyls), which is highly absorbent to mid and/or deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
Claim 3
Dependent Claim
124 words
A photoresist structure having at least two layers and overlaying a semiconductor substrate comprising an antireflective first layer coated upon said substrate wherein the antireflective layer comprises a polymer selected from the group consisting of poly(vinylnaphthalenes), poly(acenaphthalenes) and poly(vinylbiphenyls), wherein said layer has an optical density of at least 2.0 μm at the imaging wavelength of an overlaying photoresist layer, and wherein the antireflective layer is substantially inert to contact reactions with the photoresist layer, and wherein the antireflective layer is insoluble in the developer for the photoresist layer, and a second layer coated upon said antireflective first layer comprising a chemically amplified photoresist which is sensitive to ultraviolet radiation having a wavelength in the range from about 180 nm to about 350 nm.
Claim 4
Dependent Claim
124 words
A photoresist structure having at least two layers and overlaying a semiconductor substrate comprising an antireflective first layer coated upon said substrate wherein the antireflective layer comprises a polymer selected from the group consisting of poly(vinylnaphthalenes), poly(acenaphthalenes) and poly(vinylbiphenyls), wherein said layer has an optical density of at least 2.0 μm at the imaging wavelength of an overlaying photoresist layer, and wherein the antireflective layer is substantially inert to contact reactions with the photoresist layer, and wherein the antireflective layer is insoluble in the developer for the photoresist layer, and a second layer coated upon said antireflective first layer comprising a chemically amplified photoresist which is sensitive to ultraviolet radiation having a wavelength in the range from about 180 nm to about 350 nm.
Claim 5
Dependent Claim
32 words
The photoresist structure of claim 2 wherein the antireflective first layer has an optical density of at least 2.0 μm over the range of wavelengths from about 235 nm to 280 nm.
Claim 6
Dependent Claim
19 words
The photoresist structure of claim 2 wherein the antireflective first layer is chemically non-reactive with the photoresist second layer.
Claim 7
Dependent Claim
18 words
The photoresist structure of claim 2 wherein the antireflective first layer is immiscible with the photoresist second layer.
Claim 8
Dependent Claim
28 words
The photoresist structure of claim 2 wherein the antireflective first layer is essentially insoluble in photoresist casting solvents selected from the group consisting of alcohols, esters, ethers, ketones.
Claim 9
Dependent Claim
14 words
The photoresist structure of claim 2 wherein the antireflective first layer comprises a poly(vinylnaphthalene).
Claim 10
Dependent Claim
14 words
The photoresist structure of claim 2 wherein the antireflective first layer comprises a poly(acenaphthalene).
Claim 11
Dependent Claim
14 words
The photoresist structure of claim 2 wherein the antireflective first layer comprises a poly(vinylbiphenyl).
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-01-08 | 1999-07-10 | 2000-01-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-01-08 | 2003-07-10 | 2004-01-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-01-08 | 2007-07-10 | 2008-01-09 | $7700.00 | Window Closed / Lapsed |