US5110697A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Multifunctional photolithographic compositions
Assignee: Brewer Science Inc
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Filing: 1990-12-13
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Granted: 1992-05-05
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Expires: 2010-12-13
Abstract
Abstract A photolithographic composition having improved processability and which eliminates the need for inter layering multiple special purpose coatings in the production of micro-electronic devices is surprisingly made possible by selective dissolution of poly(vinylpyridine) and an effective light attenuating material in critical solvents.
Inventors
- 👤 James E. Lamb, III
- 👤 Terry Brewer
- 👤 J. Michael Mori
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:08
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2043; G; G03; G03F; G03F7/00; G03F7/004; G03F7/0048; G03F7/039; G03F7/085; G03F7/09; G03F7/091; G03F7/094
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
150 words
An imaged article of manufacture compromising: a) A top layer of photoresist material, b) A multifunctional sublayer consisting essentially of poly(vinylpyridine), a base-insoluble, non-photosensitive light attenuating material, inertly compatible to poly(vinylpyridine), and c) A micro-electronic substrate, and d) made by i. selective dissolution of the poly(vinylpyridine) and an effective amount of the inertly compatible, base-insoluble, non-photosensitive light attenuating material, said selective dissolution being in a polar organic solvent having a molecular weight from about 84 to about 91, and having a flash point of from 28° C. to about 35° C.; ii. Spin-coating the composition of step i onto the micro-electronic substrate; iii. Immediately subsequent thereto spin-coating the photoresist onto the composition of step i; iv. Exposing the photoresist to light and developing an image in the photoresist by using a basic developer solution; and v. Dry-etching the image through the composition of step i and onto the micro-electronic substrate.
Claim 2
Dependent Claim
150 words
An imaged article of manufacture compromising: a) A top layer of photoresist material, b) A multifunctional sublayer consisting essentially of poly(vinylpyridine), a base-insoluble, non-photosensitive light attenuating material, inertly compatible to poly(vinylpyridine), and c) A micro-electronic substrate, and d) made by i. selective dissolution of the poly(vinylpyridine) and an effective amount of the inertly compatible, base-insoluble, non-photosensitive light attenuating material, said selective dissolution being in a polar organic solvent having a molecular weight from about 84 to about 91, and having a flash point of from 28° C. to about 35° C.; ii. Spin-coating the composition of step i onto the micro-electronic substrate; iii. Immediately subsequent thereto spin-coating the photoresist onto the composition of step i; iv. Exposing the photoresist to light and developing an image in the photoresist by using a basic developer solution; and v. Dry-etching the image through the composition of step i and onto the micro-electronic substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-05-05 | 1995-11-04 | 1996-05-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-05-05 | 1999-11-04 | 2000-05-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-05-05 | 2003-11-04 | 2004-05-05 | $7700.00 | Window Closed / Lapsed |