US4491628A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
Assignee: International Business Machines Corp
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Filing: 1982-08-23
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Granted: 1985-01-01
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Expires: 2002-08-23
Abstract
Abstract Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
Inventors
- 👤 Hiroshi Ito
- 👤 Carlton G. Willson
- 👤 Jean M. J. Frechet
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 00:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/016; G03F7/021; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/109; Y10S430/111; Y10S430/114; Y10S430/115
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
96 words
A resist composition comprising: a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone, said groups being tertiary butyl esters of carboxylic acids or tertiary butyl carbonates of phenols, and said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a non-polar solvent to remove unexposed areas of the composition.
Claim 2
Dependent Claim
96 words
A resist composition comprising: a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone, said groups being tertiary butyl esters of carboxylic acids or tertiary butyl carbonates of phenols, and said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a non-polar solvent to remove unexposed areas of the composition.
Claim 3
Dependent Claim
22 words
A resist composition as claimed in claim 1 which also contains a sensitizer that absorbs radiation and transfers energy to the photoinitiator.
Claim 4
Dependent Claim
20 words
A resist composition as described in claim 1 wherein the acid labile pendant groups are tert-butyl esters of carboxylic acids.
Claim 5
Dependent Claim
18 words
A resist composition as described in claim 1 wherein the acid labile pendant groups are tert-butylcarbonates of phenols.
Claim 6
Dependent Claim
19 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (tert-butyloxycarbonyloxy-α-alkylstyrene) or a copolymer thereof.
Claim 7
Dependent Claim
19 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (p-tert-butyloxycarbonyloxy-α-methylstyrene) or a copolymer thereof.
Claim 8
Dependent Claim
18 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (tert-butyloxycarbonyloxystyrene) or copolymer thereof.
Claim 9
Dependent Claim
19 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (p-tert-butyloxycarbonyloxy-styrene) or a copolymer thereof.
Claim 10
Dependent Claim
20 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (tert-butyl vinylbenzoate) or a copolymer thereof.
Claim 11
Dependent Claim
19 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (tert-butylmethacrylate) or a copolymer thereof.
Claim 12
Dependent Claim
16 words
A resist composition as claimed in claim 1 wherein the photoinitiator is an aryl diazonium salt.
Claim 13
Dependent Claim
15 words
A resist composition as claimed in claim 1 wherein the photoinitiator is an diaryliodonium salt.
Claim 14
Dependent Claim
14 words
A resist composition as claimed in claim 1 wherein the photoinitiator is triarylsulfonium salt.
Claim 15
Dependent Claim
14 words
A resist composition as claimed in claim 2 wherein the sensitizer is a dye.
Claim 16
Dependent Claim
16 words
A resist composition as claimed in claim 2 wherein the sensitizer is a polycyclic aromatic compound.
Claim 17
Dependent Claim
13 words
A resist composition as claimed in claim 2 wherein the sensitizer is pyrene.
Claim 18
Dependent Claim
13 words
A resist composition as claimed in claim 2 wherein the sensitizer is perylene.
References Cited (Backward Citations)
US3515552A
Cited
US3536489A
Cited
US3779778A
Cited
US4210449A
Cited
US3859099A
Cited
US3984253A
Cited
US4104070A
Cited
US4193799A
Cited
JPS5381116A
Cited
US4273668A
Cited
US4250053A
Cited
US4311782A
Cited
JPS5629232A
Cited
US4405708A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-01-01 | 1988-07-02 | 1989-01-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-01-01 | 1992-07-02 | 1993-01-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-01-01 | 1996-07-02 | 1997-01-01 | $7700.00 | Window Closed / Lapsed |