US4746596A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for microfabrication of pattern on substrate using X-ray sensitive resist
Assignee: Mitsubishi Electric Corp
•
Filing: 1985-12-27
•
Granted: 1988-05-24
•
Expires: 2005-12-27
Abstract
Abstract A method for microfabrication of a pattern on a substrate in accordance with the present invention comprises steps of; forming a thin film of X-ray sensitive resist of chlorinated polymethylstyrene on the substrate, wherein the chlorinated polymethylstyrene has an average molecular weight of 400,000-700,000 and a chlorine content of 20-40 wt. % and contains fundamental monomer structure of ##STR1## where at least one of the atom sites α, β and γ is occupied by chlorine instead of hydrogen; selectively exposing the film to Pdl.sub.α radiation; developing the exposed film with ethoxyethanol and/or methoxyethanol.
Inventors
- 👤 Nobuyuki Yoshioka
- 👤 Yoshiki Suzuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 02:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; Y; Y10; Y10S; Y10S430/00; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
97 words
A method for microfabrication of a pattern on a substrate comprising the steps of: forming a thin film of X-ray sensitive resist of chlorinated polymethylstyrene on said substrate, wherein said chlorinated polymethylstyrene has an average molecular weight of 400,000-700,000 and a chlorine content of 20-40 wt. % and contains fundamental monomer structure of ##STR3## where X, Y and Z are individually hydrogen or chlorine and at least one of X, Y and Z is chlorine instead of hydrogen, selectively exposing said film to PdL.sub.α radiation, and developing said exposed film with a developer comprising ethoxyethanol or methoxyethanol.
Claim 2
Independent Claim
97 words
A method for microfabrication of a pattern on a substrate comprising the steps of: forming a thin film of X-ray sensitive resist of chlorinated polymethylstyrene on said substrate, wherein said chlorinated polymethylstyrene has an average molecular weight of 400,000-700,000 and a chlorine content of 20-40 wt. % and contains fundamental monomer structure of ##STR3## where X, Y and Z are individually hydrogen or chlorine and at least one of X, Y and Z is chlorine instead of hydrogen, selectively exposing said film to PdL.sub.α radiation, and developing said exposed film with a developer comprising ethoxyethanol or methoxyethanol.
Claim 3
Dependent Claim
25 words
The method of claim 1, wherein said chlorinated polymethylstyrene preferably has an average molecular wight of 500,000-600,000 and a chlorine content of 25-35 wt. %.
Claim 4
Dependent Claim
18 words
The method of claim 1, wherein said developer is selected from the group consisting of ethoxyethanol and methoxyethanol.
References Cited (Backward Citations)
US4551417A
Cited
US4535054A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-24 | 1991-11-23 | 1992-05-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-24 | 1995-11-23 | 1996-05-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-24 | 1999-11-23 | 2000-05-24 | $7700.00 | Window Closed / Lapsed |