US4737425A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Patterned resist and process
Assignee: International Business Machines Corp
•
Filing: 1986-06-10
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Granted: 1988-04-12
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Expires: 2006-06-10
Abstract
Abstract A patterned image including on a substrate, a patterned image of a first resist polymeric material and patterned image of a second and different resist material on the first resist polymeric material. The polymeric material contains reactive hydrogen functional groups and/or reactive hydrogen precursor groups. At least the surface layer of the delineated and uncovered first resist polymer material is reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of the polymeric material.
Inventors
- 👤 Burn J. Lin
- 👤 Bea-Jane L. Yang
- 👤 Jer-Mind Yang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 11:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/38; G03F7/40; G03F7/405
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
110 words
A patterned image comprising a substrate, a patterned image of a first resist polymeric material on said substrate wherein said polymeric material contains at least one of reactive hydrogen functional groups or reactive hydrogen precursor groups wherein at least the surface layer of the exposed and uncovered first resist polymeric material being reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of said polymeric material; and a patterned image of a second and different resist material on said first resist polymeric material, and wherein said first resist polymeric material is intermediate said substrate and said second and different resist material.
Claim 2
Dependent Claim
110 words
A patterned image comprising a substrate, a patterned image of a first resist polymeric material on said substrate wherein said polymeric material contains at least one of reactive hydrogen functional groups or reactive hydrogen precursor groups wherein at least the surface layer of the exposed and uncovered first resist polymeric material being reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of said polymeric material; and a patterned image of a second and different resist material on said first resist polymeric material, and wherein said first resist polymeric material is intermediate said substrate and said second and different resist material.
Claim 3
Dependent Claim
13 words
The image of claim 1 wherein said organometallic material is an organosilicon material.
Claim 4
Dependent Claim
12 words
The image of claim 1 wherein said organometallic material if 3-aminopropyltriethoxy silane.
Claim 5
Dependent Claim
17 words
The image of claim 1 wherein said first resist is about 1 to about 4 microns thick.
Claim 6
Dependent Claim
17 words
The image of claim 4 wherein said second resist is about 0.5 to about 2 microns thick.
Claim 7
Dependent Claim
26 words
The image of claim 1 wherein about 100 to about 2000 angstroms into the surface layer of the first resist is reacted with said organometallic material.
Claim 8
Dependent Claim
21 words
The image of claim 1 wherein said first resist polymeric material is a terpolymer of methylmethacrylate, methacrylic acid and methacrylic anhydride.
Claim 9
Dependent Claim
16 words
The image of claim 7 wherein second resist is a phenolic formaldehyde positive or negative resist.
Claim 10
Dependent Claim
17 words
The image of claim 7 wherein said second resist is a cresol formaldehyde positive or negative resist.
Claim 11
Dependent Claim
16 words
The image of claim 1 wherein second resist is a phenolic formaldehyde positive or negative resist.
Claim 12
Dependent Claim
17 words
The image of claim 1 wherein said second resist is a cresol formaldehyde positive or negative resist.
Claim 13
Dependent Claim
29 words
The patterned image of claim 1 wherein the surface layer of only the uncovered side walls of said first resist polymeric material is reacted with said multifunctional organometallic material.
Claim 14
Independent Claim
174 words
A method for providing an image which comprises: a. providing a first resist polymeric material on a substrate wherein said polymeric material contains at least one of reactive hydrogen functional groups or reactive hydrogen precursor groups; b. providing a second and different resist material on said first resist polymeric material with said first resist polymeric material being intermediate said second and different resist material and said substrate; c. exposing said second and different resist material to imaging radiation and developing said second and different resist material, thereby providing a resist image mask; d. exposing said first resist polymeric material to imaging radiation through the said resist image mask; e. then developing said first resist polymeric material; and f. then reacting at least the surface layer of the exposed and uncovered first resist polymeric material with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of said polymeric material, wherein said second and different resist material is present at the time of the reacting in step f.
Claim 15
Independent Claim
174 words
A method for providing an image which comprises: a. providing a first resist polymeric material on a substrate wherein said polymeric material contains at least one of reactive hydrogen functional groups or reactive hydrogen precursor groups; b. providing a second and different resist material on said first resist polymeric material with said first resist polymeric material being intermediate said second and different resist material and said substrate; c. exposing said second and different resist material to imaging radiation and developing said second and different resist material, thereby providing a resist image mask; d. exposing said first resist polymeric material to imaging radiation through the said resist image mask; e. then developing said first resist polymeric material; and f. then reacting at least the surface layer of the exposed and uncovered first resist polymeric material with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of said polymeric material, wherein said second and different resist material is present at the time of the reacting in step f.
Claim 16
Dependent Claim
19 words
The method of claim 13 wherein said first resist polymeric material is about 1 to about 4 microns thick.
Claim 17
Dependent Claim
17 words
The method of claim 14 wherein said second resist is about 0.5 to about 2 microns thick.
Claim 18
Dependent Claim
21 words
The method of claim 13 wherein said first resist polymeric material is a terpolymer of methylmethacrylate, methacrylic acid and methacrylic anhydride.
Claim 19
Dependent Claim
17 words
The method of claim 16 wherein said second resist is a phenolic formaldehyde positive or negative resist.
Claim 20
Dependent Claim
16 words
The method of claim 16 wherein said second resist is a cresol-formaldehyde positive or negative resist.
Claim 21
Dependent Claim
17 words
The method of claim 13 wherein said second resist is a phenolic formaldehyde positive or negative resist.
Claim 22
Dependent Claim
16 words
The method of claim 13 wherein said second resist is a cresol-formaldehyde positive or negative resist.
Claim 23
Dependent Claim
13 words
The method of claim 13 wherein said organometallic material is an organosilicon material.
Claim 24
Dependent Claim
12 words
The method of claim 13 wherein said organometallic material is 3-aminopropyltriethoxy silane.
Claim 25
Dependent Claim
26 words
The method of claim 13 wherein about 100 to about 2000 angstroms into the surface layer of the first resist is reacted with said organometallic material.
Claim 26
Dependent Claim
26 words
The method of claim 13 wherein about 200 to about 1000 angstroms into the surface layer of the first resist is reacted with said organometallic material.
Claim 27
Dependent Claim
28 words
The method of claim 13 which further includes hardening said second and different resist material after developing such and prior to exposing the first resist to imaging radiation.
Claim 28
Dependent Claim
17 words
The method of claim 13 which further includes removing the first resist polymeric material from the substrate.
Claim 29
Dependent Claim
16 words
The method of claim 13 which further includes removing said second resist layer after step f.
Claim 30
Dependent Claim
13 words
The method of claim 13 which further includes retaining said second resist layer.
Claim 31
Dependent Claim
24 words
The method of claim 13 wherein the imaging radiation for said second and different resist material is in the mid to near U.V. ranges.
Claim 32
Dependent Claim
21 words
The method of claim 29 wherein the imaging radiation for said first resist polymeric material is in the deep U.V. range.
Claim 33
Dependent Claim
28 words
The method of claim 13 wherein the surface layer of only the uncovered side walls of said first resist polymeric material is reacted with said multifunctional organometallic material.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-04-12 | 1991-10-12 | 1992-04-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-04-12 | 1995-10-12 | 1996-04-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-04-12 | 1999-10-12 | 2000-04-12 | $7700.00 | Window Closed / Lapsed |