US4502916A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for forming fine patterns
Assignee: Hitachi Ltd
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Filing: 1984-05-03
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Granted: 1985-03-05
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Expires: 2004-05-03
Abstract
Abstract Fine patterns are formed by a process wherein a workpiece is spin coated with a heat-resistant resin layer, this resin layer is spin coated with an organotitanium or titanium oxide layer, a resist pattern is formed on the organotitanium or titanium oxide layer, the organotitanium or titanium oxide layer is etched by ion etching with the resist pattern as a mask, and finally, the resin layer is etched by using the etched organotitanium or titanium oxide layer as a mask.
Inventors
- 👤 Hiroshi Umezaki
- 👤 Naoki Koyama
- 👤 Yoozi Maruyama
- 👤 Yutaka Sugita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 19:53
CPC Classifications
H; H10; H10P; H10P50/00; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
79 words
A process for forming fine patterns which comprises (a) forming a resin layer on a workpiece; (b) forming on said resin layer a layer of a titanium or tantalum compound; (c) forming on said titanium or tantalum compound layer a resist pattern having a desired configuration; and (d) etching said titanium or tantalum compound layer using said resist pattern as a mask, and (e) etching said resin layer using the resulting titanium or tantalum compound layer as a mask.
Claim 2
Dependent Claim
79 words
A process for forming fine patterns which comprises (a) forming a resin layer on a workpiece; (b) forming on said resin layer a layer of a titanium or tantalum compound; (c) forming on said titanium or tantalum compound layer a resist pattern having a desired configuration; and (d) etching said titanium or tantalum compound layer using said resist pattern as a mask, and (e) etching said resin layer using the resulting titanium or tantalum compound layer as a mask.
Claim 3
Dependent Claim
13 words
A process according to claim 1, wherein said titanium compound is an organotitanium.
Claim 4
Dependent Claim
13 words
A process according to claim 1, wherein said titanium compound is titanium oxide.
Claim 5
Dependent Claim
17 words
A process according to claim 1, wherein said resin layer is a layer of a heat-resistant resin.
Claim 6
Dependent Claim
12 words
A process according to claim 4, wherein the heat-resistant resin is polyimide.
Claim 7
Dependent Claim
28 words
A process according to claim 1, wherein the etching of said titanium or tantalum compound layer is conducted with an ion etching gas containing a CF 4 gas.
Claim 8
Dependent Claim
21 words
A process according to claim 1, wherein the etching of said resin layer is conducted by ion etch using oxygen gas.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-03-04 | 1988-09-03 | 1989-03-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-03-04 | 1992-09-03 | 1993-03-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-03-04 | 1996-09-03 | 1997-03-05 | $7700.00 | Window Closed / Lapsed |