US4180604A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Two layer resist system
Assignee: International Business Machines Corp
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Filing: 1977-12-30
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Granted: 1979-12-25
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Expires: 1997-12-30
Abstract
Abstract A resist mask comprising two layers of resist, one of which is saturated with a dilutant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. The second layer is said saturated resist and the first layer is non-saturated. This composite is preferaly used to form a relief mask with recessed sidewalls used in lift-off processes.
Inventors
- 👤 Bai-Cwo Feng
- 👤 George C. Feng
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 20:34
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/50; G03F7/00; G03F7/004; G03F7/09; G03F7/095; H; H05; H05K; H05K3/00; H05K3/10; H05K3/14; H05K3/143
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
79 words
A method for forming a composite layer of resist materials comprising: providing first and second resist materials, each resist material being a sensitized organic polymer capable of forming a patterned resist mask to protect the underlying portions of a substrate; saturating said second resist material with a dilutant which does not dissolve said first resist material; applying said first resist material atop said substrate; and applying said saturated resist material atop said first material, thereby forming said composite layer.
Claim 2
Independent Claim
79 words
A method for forming a composite layer of resist materials comprising: providing first and second resist materials, each resist material being a sensitized organic polymer capable of forming a patterned resist mask to protect the underlying portions of a substrate; saturating said second resist material with a dilutant which does not dissolve said first resist material; applying said first resist material atop said substrate; and applying said saturated resist material atop said first material, thereby forming said composite layer.
Claim 3
Dependent Claim
14 words
A method as in claim 1 wherein said resists include a phenol formaldehyde resin.
Claim 4
Dependent Claim
14 words
A method as in claim 2 wherein said resists include a diazo oxide sensitizer.
Claim 5
Dependent Claim
12 words
A method as in claim 3 wherein said resists include cellosolve solvent.
Claim 6
Dependent Claim
21 words
A method as in claim 4 wherein said dilutant is selected from the group consisting of xylene, toluene, chlorobenzene and freon.
Claim 7
Dependent Claim
13 words
A method as in claim 1 wherein said resists include poly-cis-isoprene cyclized rubber.
Claim 8
Dependent Claim
12 words
A method as in claim 6 wherein said resists include xylene solvent.
Claim 9
Dependent Claim
38 words
A method as in claim 1 further comprising: providing a third resist material which is a sensitized organic polymer; saturating said third resist material with said dilutant; applying said third saturated resist material atop said second resist material.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-12-24 | 1983-06-25 | 1983-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-12-24 | 1987-06-25 | 1987-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-12-24 | 1991-06-25 | 1991-12-25 | $7700.00 | Window Closed / Lapsed |